Patents by Inventor Kais Jameel Maayah

Kais Jameel Maayah has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Automated repetitive array microstructure defect inspection
    Patent number: 7065239
    Abstract: A method and system for defect inspection of microfabricated structures such as semiconductor wafers, masks or reticles for micro-fabrication, flat panel displays, micro-electro-mechanical (MEMs) having repetitive array regions such as memories or pixels. In one embodiment a method of inspection of microfabricated structures includes the steps of acquiring contrast data or images from the microfabricated structures, analyzing automatically the contrast data or images to find repetitive regions of the contrast data and comparing the repetitive regions of the contrast data with reference data to detect defects in the microfabricated structures. In the analyzing step, a cell-metric such as the range, or mean or other statistical or mathematical measure of the contrast data is used to find the repetitive regions. Image or contrast data acquisition can be performed with an optical, e-beam or other microscope suited for microfabricated structures.
    Type: Grant
    Filed: October 24, 2001
    Date of Patent: June 20, 2006
    Assignee: Applied Materials, Inc.
    Inventors: Kais Jameel Maayah, Harry Stanton Gallarda, Jr., Lakshman Srinivasan, Richard Barnard, Jun Liu
  • Automated repetitive array microstructure defect inspection
    Publication number: 20030076989
    Abstract: A method and system for defect inspection of microfabricated structures such as semiconductor wafers, masks or reticles for micro-fabrication, flat panel displays, micro-electro-mechanical (MEMs) having repetitive array regions such as memories or pixels. In one embodiment a method of inspection of microfabricated structures includes the steps of acquiring contrast data or images from the microfabricated structures, analyzing automatically the contrast data or images to find repetitive regions of the contrast data and comparing the repetitive regions of the contrast data with reference data to detect defects in the microfabricated structures. In the analyzing step, a cell-metric such as the range, or mean or other statistical or mathematical measure of the contrast data is used to find the repetitive regions. Image or contrast data acquisition can be performed with an optical, e-beam or other microscope suited for microfabricated structures.
    Type: Application
    Filed: October 24, 2001
    Publication date: April 24, 2003
    Inventors: Kais Jameel Maayah, Harry Stanton Gallarda, Lakshman Srinivasan, Richard Barnard, Jun Liu