Patents by Inventor Kakihana Masato

Kakihana Masato has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10144869
    Abstract: Provided are a blue phosphor and a method of easily producing the phosphor, the phosphor being excited at a wavelength of about 400 nm, which is an emission wavelength of a near-ultraviolet LED, to emit high-intensity light and having a small change of emission intensity due to a change of an excitation wavelength. The phosphor is silicate phosphor that is represented by a composition formula of Ba1?xEuxZrSiyO3+2y (where 0.001?x?5 and 2.5?y?3); has a diffraction pattern of BaZrSi3O9 as a powder x-ray diffraction pattern; has an emission intensity at an excitation wavelength of 400 nm, the emission intensity being 40% or higher of an emission intensity at an excitation wavelength of 300 nm; and has an emission intensity change ratio represented by (Iex380 nm?Iex420 nm)/Iex380 nm×100, emission intensity change ratio being 30% or lower in a range of excitation wavelengths of 380 nm to 420 nm.
    Type: Grant
    Filed: July 6, 2012
    Date of Patent: December 4, 2018
    Assignees: SUMITOMO METAL MINING CO., LTD., TOHOKU UNIVERSITY
    Inventors: Komukai Tetsufumi, Takatsuka Yuji, Kakihana Masato, Tezuka Satoko, Kato Hideki
  • Publication number: 20150299565
    Abstract: Provided are a blue phosphor and a method of easily producing the phosphor, the phosphor being excited at a wavelength of about 400 nm, which is an emission wavelength of a near-ultraviolet LED, to emit high-intensity light and having a small change of emission intensity due to a change of an excitation wavelength. The phosphor is silicate phosphor that is represented by a composition formula of Ba1-xEuxZrSiyO3+2y (where 0.001?x?0.5 and 2.5?y?3); has a diffraction pattern of BaZrSi3O9 as a powder X-ray diffraction pattern; has an emission intensity at an excitation wavelength of 400 nm, the emission intensity being 40% or higher of an emission intensity at an excitation wavelength of 300 nm; and has an emission intensity change ratio represented by (Iex380 nm?Iex420 nm)/Iex380 nm×100, emission intensity change ratio being 30% or lower in a range of excitation wavelengths of 380 nm to 420 nm.
    Type: Application
    Filed: July 6, 2012
    Publication date: October 22, 2015
    Applicants: TOHOKU UNIVERSITY, SUMITOMO METAL MINING CO., LTD.
    Inventors: Komukai Tetsufumi, Takatsuka Yuji, Kakihana Masato, Tezuka Satoko, Kato Hideki