Patents by Inventor Kaliappan Muthukumar

Kaliappan Muthukumar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Aluminum content control of TiAIN films
    Patent number: 10170321
    Abstract: Described are methods of depositing a titanium aluminum nitride film on a substrate surface with a controlled amount of carbon. The methods include exposing a substrate surface to a titanium precursor, a nitrogen reactant and an aluminum precursor with purges of the unreacted titanium and aluminum precursors and unreacted nitrogen reactants between each exposure.
    Type: Grant
    Filed: March 17, 2017
    Date of Patent: January 1, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Wenyu Zhang, Wei V. Tang, Yixiong Yang, Chen-Han Lin, Yi Xu, Yu Lei, Naomi Yoshida, Lin Dong, Drew Phillips, Srividya Natarajan, Atashi Basu, Kaliappan Muthukumar, David Thompson, Paul F. Ma
  • Aluminum Content Control of TiAIN Films
    Publication number: 20180269065
    Abstract: Described are methods of depositing a titanium aluminum nitride film on a substrate surface with a controlled amount of carbon. The methods include exposing a substrate surface to a titanium precursor, a nitrogen reactant and an aluminum precursor with purges of the unreacted titanium and aluminum precursors and unreacted nitrogen reactants between each exposure.
    Type: Application
    Filed: March 17, 2017
    Publication date: September 20, 2018
    Inventors: Wenyu Zhang, Wei V. Tang, Yixiong Yang, Chen-Han Lin, Yi Xu, Yu Lei, Naomi Yoshida, Lin Dong, Drew Phillips, Srividya Natarajan, Atashi Basu, Kaliappan Muthukumar, David Thompson, Paul F. Ma