Patents by Inventor Kalyan Siddabattula

Kalyan Siddabattula has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9536656
    Abstract: Example embodiments of the systems and methods of reduction of parasitic losses in a wireless power system disclosed herein provide a practical means of accurately estimating parasitic losses in a wireless power transfer system irrespective of coupling. Such systems and methods may be used to generate an equation which predicts parasitic losses in a wireless power system. In an offset case, in which the transmitter and receiver are not directly coupled, losses associated with the recirculating current in the primary LC tank dominate the loss, and the transmitted power may be better estimated by measuring the power inputs, power outputs, and injected losses in a controlled environment; making a mathematical fit to an equation, which from the various power measurements and injected loss, predicts the expected transmitter losses; and then, in an operational environment, using the equation to predict parasitic losses based on the power inputs, power outputs and expected loss equation.
    Type: Grant
    Filed: May 9, 2013
    Date of Patent: January 3, 2017
    Assignee: TEXAS INSTRUMENTS INCORPORATED
    Inventors: Eric Gregory Oettinger, Vladimir Alexander Muratov, Ravindra Krishna Patil, Kalyan Siddabattula, William Ford Waters, III
  • Publication number: 20130307348
    Abstract: Example embodiments of the systems and methods of reduction of parasitic losses in a wireless power system disclosed herein provide a practical means of accurately estimating parasitic losses in a wireless power transfer system irrespective of coupling. Such systems and methods may be used to generate an equation which predicts parasitic losses in a wireless power system. In an offset case, in which the transmitter and receiver are not directly coupled, losses associated with the recirculating current in the primary LC tank dominate the loss, and the transmitted power may be better estimated by measuring the power inputs, power outputs, and injected losses in a controlled environment; making a mathematical fit to an equation, which from the various power measurements and injected loss, predicts the expected transmitter losses; and then, in an operational environment, using the equation to predict parasitic losses based on the power inputs, power outputs and expected loss equation.
    Type: Application
    Filed: May 9, 2013
    Publication date: November 21, 2013
    Applicant: Texas Instruments Incorporated
    Inventors: Eric Gregory Oettinger, Vladimir Alexander Muratov, Ravindra Krishna Patil, Kalyan Siddabattula, William Ford Waters, III
  • Publication number: 20060054601
    Abstract: There is provided by this invention an apparatus and method of supplying to ignite a plasma wherein in the event of an arc a shunt switch is used to divert the power away from the plasma that is incorporated into an over-voltage protection circuit that controls the shunt switch to act as a boost switch when the arc is extinguished such that the stored inductor energy is used to boost the ignition voltage for reigniting the plasma if it is extinguished. When the arc is extinguished, the inductor current is diminished, and the plasma is ignited, then the switch S1 is turned OFF and the inductor energy goes to the plasma and the power supply operates in its normal operating mode.
    Type: Application
    Filed: August 24, 2004
    Publication date: March 16, 2006
    Inventors: Milan Ilic, Vladislav Shilo, Kalyan Siddabattula
  • Publication number: 20060012308
    Abstract: There is provided by this invention an apparatus and method for controlling a dc magnetron plasma processing system that automatically adjusts the control signal to the power supply based upon the dynamic impedance of the load to control the output power to the plasma. The output voltage and the output current of the power supply that supplies power to the plasma is sampled over at a sampling frequency at least four to five times higher than the switching frequency and the dynamic impedance of the plasma is calculated based upon the sampled voltage and current from the algorithm R plasma = ? ? ? ? V n ? ? ? ? I n wherein ?Vn and ?In is the maximum difference among samples on one switching cycle. If the dynamic impedance seen is negative in nature then the control signal is compensated accordingly.
    Type: Application
    Filed: July 2, 2004
    Publication date: January 19, 2006
    Inventors: Milan Ilic, Kalyan Siddabattula, Gerald Roop, David Christie