Patents by Inventor Kam-Shui Chan

Kam-Shui Chan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for sloping the profile of an opening in resist
    Patent number: 4912022
    Abstract: A lithography method for forming an opening in a resist layer with a sloped profile is disclosed which requires no additional processing steps or equipment. A scattering element, for example a ground glass diffuser, is placed in the optical path of radiation passing through a standard lithography apparatus. The scattering element modifies the radiation passing through the lithography apparatus with the result that the developed resist profile exhibits sloped edges. The slope modification can be conveniently changed by exchanging the optical scattering element used.
    Type: Grant
    Filed: December 27, 1988
    Date of Patent: March 27, 1990
    Assignee: Motorola, Inc.
    Inventors: Andy Urquhart, Kam-Shui Chan, Gregory D. Anderson