Abstract: A conductive coating comprising polymers of meso-meso, ?-? doubly linked fused and/or meso-?, ?-meso doubly linked fused and/or meso-meso, ?-?, ?-?triply linked fused (poly)porphyrins. A method for forming on a substrate a thin conductive coating of polymers of meso-meso, ?-? doubly and/or meso-?, ?-meso doubly and/or meso- meso, ?-?, ?-? triply linked fused (poly)porphyrins, the method comprising the steps of providing a substrate in a vacuum chamber, performing on the substrate an oxidative chemical vapour deposition reaction with an oxidant and at least one porphyrin monomer.

Abstract: A multiply fused, conjugated, porphyrin polymer film coated on a substrate, wherein the porphyrin monomer repeating units are di-meso-substituted porphyrins; and including a metal cation selected from the group consisting of Mg(II), Fe(III), Co(II), Ni(II), Cu(II), Zn(II), Ru(II), Pd(II), Ag(II), Pt(II) and Au(III), or mixtures thereof; the porphyrin units are multiply fused, including doubly-fused and/or triply-fused; including a substituent R attached to the meso position of the porphyrin monomer, the substituent R being an aromatic group presenting at least one free ortho position among; at least one of the two free ortho positions of the aromatic substituent is fused to the 13 position of the porphyrin monomer, the porphyrin polymer film being a porous porphyrin polymer film with mean pore diameters within the range of from 2 nm to 100 nm, and exhibiting a density not greater than 2 g/cm3.

Abstract: A conductive coating comprising polymers of meso-meso, ?-? doubly linked fused and/or meso-?, ?-meso doubly linked fused and/or meso-meso, ?-?, ?-? triply linked fused (poly)porphyrins. A method for forming on a substrate a thin conductive coating of polymers of meso-meso, ?-? doubly and/or meso-?, ?-meso doubly and/or meso-meso, ?-?, ?-? triply linked fused (poly)porphyrins, the method comprising the steps of providing a substrate in a vacuum chamber, performing on the substrate an oxidative chemical vapour deposition reaction with an oxidant and at least one porphyrin monomer.

Abstract: A plasma post-discharge deposition device for depositing crystalline metal oxide derivative on a substrate, the device comprising a gas source with a substrate inlet, a post-discharge deposition chamber with a substrate outlet, the substrate inlet and the substrate outlet defining a longitudinal central axis, and a dielectric tube placed between the gas source and the deposition chamber on the longitudinal central axis; configured to confine a plasma discharge and comprising a discharge zone lying on the internal surface of the dielectric tube and a central zone centred on the longitudinal central axis. The deposition device is remarkable in that the central zone is located at a distance comprised between 1 mm and 2.5 mm from the internal surface of the dielectric tube. Also a plasma-enhanced chemical vapour deposition method.