Abstract: Apparatus for adjusting the position of lamp modules of a processing chamber are disclosed herein. Implementations generally include a process chamber comprising an enclosure defining an internal volume, a substrate support disposed in the internal volume of the process chamber, and a plurality of adjustable lamp modules. Each adjustable lamp module can include a radiation source, a lamp connector in connection with the radiation source, an adjustable mounting bracket connected to the lamp connector, the adjustable mounting bracket being pivotably connected to the process chamber; and a adjustable force device mounted in connection with the adjustable mounting bracket.

Abstract: A method for defining magnetic domains in a magnetic thin film on a substrate, includes: coating the magnetic thin film with a resist; patterning the resist, wherein areas of the magnetic thin film are substantially uncovered; and exposing the magnetic thin film to a plasma, wherein plasma ions penetrate the substantially uncovered areas of the magnetic thin film, rendering the substantially uncovered areas non-magnetic.