Abstract: Disclosed is a vapor deposition apparatus, comprising: a reactor for housing a target substrate on which a thin film is to be formed by vapor deposition; a shower head having: a gas inlet for introducing a gas; a gas distribution space for diffusing the gas; and a shower plate having a plurality of gas channels for supplying the gas from the gas distribution space into the reactor; and a gas outlet for externally discharging the gas from the reactor, the gas distribution space of the shower head having the shower plate as a bottom face thereof, the gas distribution space having a first space located relatively far from the gas outlet of the reactor and a second space located relatively close to the gas outlet of the reactor, the first space being formed so as to be taller than the second space.