Abstract: In an exposure apparatus, a buffer that can stock a plurality of masks and can be loaded/unloaded is disposed in a mask carrier route ranging from the load/unload ports of an SMIF pod to a mask stage RST. Furthermore, a mask carrier system carries the masks between the load/unload ports, the buffer, and the mask stage. The masks can be housed to the maximum, since the masks, which are loaded into the apparatus housed in the SMIF pod, are sequentially loaded into the buffer by the carrier system. Accordingly, the apparatus can keep the number of masks necessary for exposure at all times inside itself. In addition, since the carrier system carries the masks between the load/unload ports, the buffer, and the mask stage, the operator does not have to manually exchange the mask container.

Abstract: This mask case is a mask case for accommodating a reticle formed with a pattern to be transferred to a substrate, in which one outer wall face of the mask case is formed with first and second depressions and the form of the first depression is one of conical and triangular pyramidal forms, whereas the second depression has a V-groove form.

Abstract: An exposure method, which exposes a pattern of a mask carried on a mask stage onto a substrate, includes transferring the mask to the mask stage by a transfer device, and moving the transfer device to a position in which it does not hinder an exposure.

Abstract: A laser unit is arranged in an area of a floor surface, the width of which area is defined by maintenance areas, on both sides of an exposure-apparatus main body, inclusive. Furthermore, the exposure-apparatus main body and the laser unit are arranged on the floor surface such that maintenance areas of the both overlap each other at least partially. Moreover, a C/D is connected in-line with the front surface of the exposure-apparatus main body, and in the side of the exposure-apparatus main body, which side is in front of the optical axis of the projection optical system and which is connected with the C/D, a housing is provided which has a delivery port into and from which a mask container is loaded and unloaded by a ceiling-transport system that moves along a rail.

Abstract: An exposure method, which exposes a pattern of a mask carried on a mask stage onto a substrate, includes transferring the mask to the mask stage by a transfer device, and moving the transfer device to a position in which it does not hinder an exposure.

Abstract: A master plate transporting system automatically detects the presence/absence of master plates accommodated in a container and also detects the position of each master plate in the container as well as the type of the container being used. In this arrangement, the master plate transporting system executes the automatic transporting operation without transport errors. Containers each holding one or more reticles, are positioned in a semiconductor manufacturing apparatus. A reticle detection sensor detects the presence and the position of the reticle in each container. A controller controls the transporting operation of a reticle transporting mechanism based on the detection results of the detection sensor to reliably retrieve the reticle, transport it to an exposure system, and return it to the container.

Abstract: An apparatus for carrying a substrate having a substrate storage part for storing substrate casings that encase substrates, and a carrier system for carrying the substrate to a substrate stage from the substrate storage part. The apparatus a first carrier device, a temporary storage part and a second carrier device. The first carrier device carries the substrate to a first substrate carry position from the substrate storage part. The temporary storage unit incorporates a holding mechanism for individually adsorptively holding the substrate by vacuum in a predetermined state and is provided between the first substrate carry position and the substrate stage. The second carrier device is capable of carrying the substrate to the substrate stage from the first carry position and also carrying the substrate between the temporary storage unit and the substrate stage.

Abstract: A case for housing a substrate which limits the accumulation of dust, due to static electricity, while allowing visual access to the substrate. A box-like case portion has an open front end and a front lid pivotally provided on the case portion to close the front end and in which a predetermined substrate is housed in the case portion. A predetermined portion of the box-like case portion and the front lid are made of synthetic resin formed with electrically conductive copolymer. A predetermined position of the box-like case is formed of transparent electrically conductive material.

Abstract: An apparatus for carrying a substrate having a substrate storage part for storing substrate casings that encase substrates, and a carrier system for carrying the substrate to a substrate stage from the substrate storage part. The apparatus comprises a first carrier device, a temporary storage part and a second carrier device. The first carrier device carries the substrate to a first substrate carry position from the substrate storage part. The temporary storage unit incorporates a holding mechanism for individually adsorptively holding the substrate by vacuum in a predetermined state and is provided between the first substrate carry position and the substrate stage. The second carrier device is capable of carrying the substrate to the substrate stage from the first carry position and also carrying the substrate between the temporary storage unit and the substrate stage.

Abstract: An exposure apparatus equipped with a substrate supervisory device is contained in an air-conditioned chamber with a front door. The device has a library for storing a plurality of reticle cases with respective reticles therein, a bar code reader for reading respective bar codes of the reticle cases and shifting means for shifting the bar code reader for the reading. When an operator stores the cases in the library by opening the door of the chamber, the bar code reader is retreated to a predetermined position and the shifting means will not be activated for the operator's safety.