Abstract: A programmable analog-to-digital converter (ADC) for use in a CMOS imaging system, the CMOS imaging system having an array of pixels, and the ADC configured to provide a enhanced conversion resolution for pixels providing a low analog voltage level and a relatively coarser conversion resolution for pixels providing a relatively higher analog voltage level.

Abstract: A method for fabricating a color image sensor for scanning and converting an optical image into electrical signals, includes the steps of: (a) forming a P-type semiconductor layer on a substrate; (b) forming field oxide layers on the P-type semiconductor layer to define regions for red, green and blue photodiodes; (c) providing an ion implantation mask having different mask patterns for the red, the green and the blue photodiodes; (d) implanting impurity ions into the P-type semiconductor layer through the use of said ion implantation mask to form N-type diffusion regions in the P-type semiconductor layer; and (e) applying a thermal process to the resulting structure to form different first, second and third depletion regions corresponding to the red, the green and the blue photodiodes.

Abstract: A CMOS image sensor based on a correlated double sampling method includes a pixel array having M×N unit pixels, arranged in a matrix, for sensing an image to generate an analog image data with a reset voltage level and a data voltage level as an output signal, a ramp voltage generator for generating a updated reference voltage in response to a control signal, a comparator for comparing the reset voltage level with the reference voltage level, a double buffer for storing the digital value, and a reference voltage control means for comparing the reference voltage with the reset voltage level to generate the control signal.

Abstract: A programmable analog-to-digital converter (ADC) for use in a CMOS imaging system, the CMOS imaging system having an array of pixels, and the ADC configured to provide a enhanced conversion resolution for pixels providing a low analog voltage level and a relatively coarser conversion resolution for pixels providing a relatively higher analog voltage level.

Abstract: A method for fabricating a color image sensor for scanning and converting an optical image into electrical signals, includes the steps of: (a) forming a P-type semiconductor layer on a substrate; (b) forming field oxide layers on the P-type semiconductor layer to define regions for red, green and blue photodiodes; (c) providing an ion implantation mask having different mask patterns for the red, the green and the blue photodiodes; (d) implanting impurity ions into the P-type semiconductor layer through the use of said ion implantation mask to form N-type diffusion regions in the P-type semiconductor layer; and (e) applying a thermal process to the resulting structure to form different first, second and third depletion regions corresponding to the red, the green and the blue photodiodes.