Patents by Inventor Kang-Ping Peng

Kang-Ping Peng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220085194
    Abstract: The invention provides a self-organized quantum dot semiconductor structure. The quantum dot semiconductor structure includes: a conductive ridge on a substrate; an insulative layer covering the substrate and the conductive ridge, wherein the insulative layer includes a top portion and two sidewalls over the conductive ridge; a semiconductor mechanism of etching back and thermal oxidation, implemented on a semiconductor-alloyed layer set on the insulative layer; a plurality of quantum dots respectively embedded within a plurality of silicon dioxide spacer islands based on the semiconductor mechanism, the quantum dots and the silicon dioxide spacer islands adhered to the sidewalls of the insulative layer; and a plurality of conductive ledges adhered to the silicon dioxide spacer islands, wherein each of the conductive ledges is a portion of an electrode self-alignment to the quantum dot.
    Type: Application
    Filed: November 19, 2021
    Publication date: March 17, 2022
    Applicant: National Yang Ming Chiao Tung University
    Inventors: Pei-Wen Li, Kang-Ping Peng, Ching-Lun Chen, Tsung-Lin Huang
  • Publication number: 20220020588
    Abstract: The invention provides a quantum dot manufacturing method and related quantum dot semiconductor structure. The quantum dot semiconductor structure includes: a conductive ridge on a substrate; an insulative layer covering the substrate and the conductive ridge, wherein the insulative layer includes a top portion and two sidewalls over the conductive ridge; a plurality of quantum dots respectively embedded within a plurality of silicon dioxide spacer islands, which are adhered to the sidewalls of the insulative layer; and a plurality of conductive ledges adhered to the silicon dioxide spacer islands, wherein each of the conductive ledges is a portion of an electrode with alignment to the corresponding quantum dot.
    Type: Application
    Filed: July 17, 2020
    Publication date: January 20, 2022
    Applicant: National Chiao Tung University
    Inventors: Pei-Wen Li, Kang-Ping Peng, Ching-Lun Chen, Tsung-Lin Huang
  • Patent number: 11227765
    Abstract: The invention provides a quantum dot manufacturing method and related quantum dot semiconductor structure. The quantum dot semiconductor structure includes: a conductive ridge on a substrate; an insulative layer covering the substrate and the conductive ridge, wherein the insulative layer includes a top portion and two sidewalls over the conductive ridge; a plurality of quantum dots respectively embedded within a plurality of silicon dioxide spacer islands, which are adhered to the sidewalls of the insulative layer; and a plurality of conductive ledges adhered to the silicon dioxide spacer islands, wherein each of the conductive ledges is a portion of an electrode with alignment to the corresponding quantum dot.
    Type: Grant
    Filed: July 17, 2020
    Date of Patent: January 18, 2022
    Assignee: NATIONAL YANG MING CHIAO TUNG UNIVERSITY
    Inventors: Pei-Wen Li, Kang-Ping Peng, Ching-Lun Chen, Tsung-Lin Huang