Abstract: A display device includes a display area, a peripheral area disposed outside the display area, and a sealing area disposed outside the peripheral area, a first base substrate, a second base substrate facing the first base substrate, a color filter layer disposed under the first base substrate, a bank layer disposed under the color filter layer, and a sealing member disposed between the bank layer and the second base substrate in the sealing area. The bank layer includes bank patterns defining an opening disposed at least in the sealing area, and the sealing member fills the opening. Each of the bank patterns includes a first surface adjacent to the color filter layer and a second surface opposite to the first surface and adjacent to the sealing member. A width of the second surface is greater than a width of the first surface.

Abstract: A memory device includes a substrate having first and second active patterns adjacent to each other and separated by a trench, the first and second active patterns including a first source/drain region; the second active pattern includes a second source/drain region. The second source/drain region includes first and second sidewall surfaces adjacent the first source/drain region and a connecting surface that connects the first and second sidewall surfaces. The second sidewall surface is set back from the first sidewall surface. An isolation layer is included in the trench and on the first sidewall surface. A bit line includes a contact part connected to the first source/drain region. A contact is coupled to the second source/drain region with a lower spacer between the contact and the contact part of the bit line, a landing pad on the contact, and a data storage element on the landing pad.

Abstract: Disclosed is a moving robot capable of recognizing a waiting line and a method for controlling the same. One embodiment provides a method for operating a moving robot, the method comprising: starting moving from a predefined moving start point toward a predefined moving end point; acquiring a waiting line region image by photographing a predefined waiting line region during the moving; searching for an end point of a waiting line formed in the waiting line region using the waiting line region image; terminating the moving when the end point of the waiting line is detected; setting an operation mode based on a length of the waiting line calculated using the end point of the waiting line; and operating in the set operation mode while returning to the moving start point.

Abstract: A semiconductor device includes a substrate including an active cell region, a boundary region, and a dummy cell region therebetween, bit lines disposed on the active cell region, extended in a first direction, and spaced apart from each other in a second direction, the bit lines including first and second bit lines alternately arranged in the second direction, bitline pads spaced apart from each other in the second direction on the boundary region, the second bit lines being extended to the dummy cell region and the boundary region in the first direction and being connected to the bitline pads, respectively, and an insulating separation pattern on the boundary region and between the bitline pads. A portion of the insulating separation pattern is extended into a region between the second bit lines on the boundary region and is in contact with an end portion of a corresponding first bit line.

Abstract: A semiconductor device may include a substrate including a cell region and a peripheral region, bit lines on the cell region and extending in a first direction parallel to a top surface of the substrate, a lower capping pattern on a top surface of each of the bit lines, a bit line spacer on a side surface of each of the bit lines and extending to a side surface of the lower capping pattern, and a respective upper capping pattern on a top surface of the lower capping pattern. The respective upper capping pattern is on at least a portion of a top surface of the bit line spacer.

Abstract: An embodiment provides a display device including: a first pixel, a second pixel, and a third pixel that form one dot and display different colors; a first light emitting element disposed in the first pixel, a second light emitting element disposed in the second pixel, and a third light emitting element disposed in the third pixel; and a first color conversion area in which a first color conversion layer overlapping the first light emitting element is disposed, a second color conversion area in which a second color conversion layer overlapping the second light emitting element is disposed, and a third color conversion area in which a third color conversion layer overlapping the third light emitting element is disposed, wherein the first color conversion area, the second color conversion area, and the third color conversion area have polygonal planar shapes having at least 5 sides.

Abstract: A display device and a method for manufacturing the same. A display device includes: a first substrate; a partition wall which is disposed on the first substrate to define a first space and includes a top portion and side portions extending from the top portion; a reflective layer which covers the top portion and the side portions; an organic layer which is disposed on the reflective layer to overlap the top portion and has liquid repellency; and a wavelength conversion layer which is disposed in the first space.

Abstract: A display device includes: a first substrate including a display area to emit a light having a peak wavelength from light emitting areas and a non-display area surrounding the display area; and a second substrate including transparent areas overlapping the light emitting areas and to convert the peak wavelength of the light or to transmit the light through the transparent areas. The second substrate includes: a base layer including the transparent areas, an inner light blocking area arranged between the transparent areas, and an outer light blocking area arranged outside the transparent areas; a color filter on the base layer; and a light blocking layer above the color filter and including an outer light blocking layer overlapping the outer light blocking area and an inner light blocking layer overlapping the inner light blocking area.

Abstract: A display device and a method of manufacturing a display device, the display device having a plurality of pixels defined therein and including: a first substrate; a partition wall disposed on the first substrate to define openings corresponding to the plurality of pixels; and color conversion patterns disposed in the openings. The partition wall includes a light-transmitting structure having a groove and a first partition wall portion disposed in the groove and having a higher optical density than the light-transmitting structure.

Abstract: A color conversion panel for a display device includes: a substrate including a first region, a second region, and a third region; a light-blocking partition disposed on the substrate and having a plurality of openings via which the first region, the second region and the third region are exposed; color conversion patterns disposed on the substrate in the openings in the first region and in the second region, respectively; and a light-transmitting layer containing scattering particles and including a first portion disposed in the opening in the third region and a second portion disposed to cover the color conversion patterns on the substrate. The scattering particles increase the efficiency of color conversion, such that color gamut may be increased.

Abstract: Disclosed is a moving robot capable of recognizing a waiting line and a method for controlling the same. One embodiment provides a method for operating a moving robot, the method comprising: starting moving from a predefined moving start point toward a predefined moving end point; acquiring a waiting line region image by photographing a predefined waiting line region during the moving; searching for an end point of a waiting line formed in the waiting line region using the waiting line region image; terminating the moving when the end point of the waiting line is detected; setting an operation mode based on a length of the waiting line calculated using the end point of the waiting line; and operating in the set operation mode while returning to the moving start point.

Abstract: A display device and a method of manufacturing a display device, the display device having a plurality of pixels defined therein and including: a first substrate; a partition wall disposed on the first substrate to define openings corresponding to the plurality of pixels; and color conversion patterns disposed in the openings. The partition wall includes a light-transmitting structure having a groove and a first partition wall portion disposed in the groove and having a higher optical density than the light-transmitting structure.

Abstract: A color conversion panel for a display device includes: a substrate including a first region, a second region, and a third region; a light-blocking partition disposed on the substrate and having a plurality of openings via which the first region, the second region and the third region are exposed; color conversion patterns disposed on the substrate in the openings in the first region and in the second region, respectively; and a light-transmitting layer containing scattering particles and including a first portion disposed in the opening in the third region and a second portion disposed to cover the color conversion patterns on the substrate. The scattering particles increase the efficiency of color conversion, such that color gamut may be increased.

Abstract: A display device and a method for manufacturing the same. A display device includes: a first substrate; a partition wall which is disposed on the first substrate to define a first space and includes a top portion and side portions extending from the top portion; a reflective layer which covers the top portion and the side portions; an organic layer which is disposed on the reflective layer to overlap the top portion and has liquid repellency; and a wavelength conversion layer which is disposed in the first space.

Abstract: Semiconductor devices, and methods for forming the same, include forming a first wiring film and an etching buffer film in a cell array region and a peripheral circuit region of a substrate, and forming a contact hole by selectively etching the etching buffer film and the first wiring film so as to expose an active region of the cell array region and at least a part of a field isolation region adjacent thereto. A bit line contact is formed in the contact hole to be in contact with the active region, and a second wiring film is formed over the substrate. By patterning the second wiring film, the bit line contact, the etching buffer film, and the first wiring film, a bit line is formed in the cell array region and a peripheral gate is formed in the peripheral circuit region.

Abstract: A semiconductor device may include a substrate having a first region and a second region on a surface thereof, and a first semiconductor fin on the first region of the substrate with the first semiconductor fin including a first trench therethrough. A first gate electrode may be provided in the first trench, and first and second source/drain regions may be provided in the first semiconductor fin, with the first gate electrode between the first and second source/drain regions. A second semiconductor fin may be provided on the second region of the substrate with the second semiconductor fin including a second trench therethrough, a second gate electrode may be provided in the second trench, and third and fourth source/drain regions may be provided in the second semiconductor fin with the second gate electrode being between the third and fourth source/drain regions.

Abstract: A method of fabricating a semiconductor device includes providing a semiconductor substrate having a first surface and a second surface opposite the first surface, forming an alignment key and a connection contact that penetrate a portion of the semiconductor substrate and extend from the first surface toward the second surface, forming a first circuit on the first surface of the semiconductor substrate such that the first circuit is electrically connected to the connection contact, recessing the second surface of the semiconductor substrate to form a third surface exposing the alignment key and the connection contact, and forming a second circuit on the third surface of the semiconductor substrate such that the second circuit is electrically connected to the connection contact.

Abstract: Semiconductor devices, and methods for forming the same, include forming a first wiring film and an etching buffer film in a cell array region and a peripheral circuit region of a substrate, and forming a contact hole by selectively etching the etching buffer film and the first wiring film so as to expose an active region of the cell array region and at least a part of a field isolation region adjacent thereto. A bit line contact is formed in the contact hole to be in contact with the active region, and a second wiring film is formed over the substrate. By patterning the second wiring film, the bit line contact, the etching buffer film, and the first wiring film, a bit line is formed in the cell array region and a peripheral gate is formed in the peripheral circuit region.

Abstract: A semiconductor device may include a substrate having a first region and a second region on a surface thereof, and a first semiconductor fin on the first region of the substrate with the first semiconductor fin including a first trench therethrough. A first gate electrode may be provided in the first trench, and first and second source/drain regions may be provided in the first semiconductor fin, with the first gate electrode between the first and second source/drain regions. A second semiconductor fin may be provided on the second region of the substrate with the second semiconductor fin including a second trench therethrough, a second gate electrode may be provided in the second trench, and third and fourth source/drain regions may be provided in the second semiconductor fin with the second gate electrode being between the third and fourth source/drain regions.

Abstract: A method of fabricating a semiconductor device includes providing a semiconductor substrate having a first surface and a second surface opposite the first surface, forming an alignment key and a connection contact that penetrate a portion of the semiconductor substrate and extend from the first surface toward the second surface, forming a first circuit on the first surface of the semiconductor substrate such that the first circuit is electrically connected to the connection contact, recessing the second surface of the semiconductor substrate to form a third surface exposing the alignment key and the connection contact, and forming a second circuit on the third surface of the semiconductor substrate such that the second circuit is electrically connected to the connection contact.