Abstract: A zero power identical pair of oppositely-oriented meniscus lens elements mounted in the projection light path, serves as curved mask support while compensating for optical anomalies such as beam shift and beam deviations produced by other transparent supports for the curved mask. The zero-power meniscus lens pair, without affecting the transmission beam characteristics, lets the beam diffract as efficiently as does a regular planar mask, thus preserving the partial coherence effects and resolution concepts of projection lithography. This simple but novel optics device is not only expected to clear several barriers for curved mask projection lithography but also find place in other applications where collimated or converging light beams have to travel extra paths without significant aberration.

Abstract: Compositions of matter are described which contain restricted cancer cells. When so restricted, the cells produce an unexpectedly high amount of material which suppresses cancer cell proliferation. The phenomenon crosses cancer type and species lines. Processes for making these compositions, and their use, are also described.

Abstract: A versatile maskless patterning system with capability for selecting rapidly among a plurality of projection lenses mounted on a turret. This provides the ability to rapidly select multiple choices for resolution and enables optimization of the combination of the imaging resolution and exposure throughput, making possible cost-effective fabrication of microelectronics packaging products. A preferred embodiment uses a digital micromirror device array spatial light modulator as a virtual mask. Another preferred embodiment use multiple closely spaced digital micromirror device array spatial light modulators to enhance throughput.

Abstract: An optimized illumination system that efficiently produces uniform illumination for exposure, photoablation, and laser crystallization systems. The illumination system includes a homogenizer that uniformizes and shapes a light beam, which is directed onto a mask by condenser optics. The illumination system recycles radiation by directing light reflected by the mask back into the illumination system, where an apertured mirror situated at the input end re-directs it back toward the mask. The relative areas of the mirror and aperture affect recycling efficiency and system throughput, so the system features a larger-diameter recycling segment enabling greater mirror-to-aperture area ratios. An added segment at the output end of the homogenizer matches the homogenizer diameter to the projection imaging system object field size. This standardizes the homogenizer and condenser lens integration, reducing the need for customized parts and thus reducing manufacturing time and expense.

Abstract: Low mass-per-unit-area plastic film, preferably polyimide, prepared by a process of controlled treating of a supply of plastic film, possibly with one surface reflectively coated, at a microlithography workstation with included photoablation optics. This treatment achieves significant controlled removal of material in a selected pattern by providing relative motion between untreated plastic film and the workstation's photoablation optics while controlling photoablation of a pattern in the film. The material has a significant quantity of the mass of its plastic removed by photoablation, leaving a tessellated pattern of ridges surrounding individual wells. The resulting low-mass, rip-resistant film retains the general attributes of a large-area plastic film. The treated film also retains its reflective surface, on which amorphous silicon may be deposited. The silicon may be thereafter crystallized, utilizing the same optics, and used for fabrication of microelectronics.

Abstract: A compact, high-brightness, integrated illuminator in which collection of light from a point-arc source is maximized by a multi-curvature reflector section configuration of elliptical reflector and segmented spherical retroreflector directing all light rays into a well-defined numerical aperture. The invention also integrates a homogenizer and other optical elements with the multi-curvature reflector section, constructs any or all of these components in a single block of optical material, or, alternatively, constructs these components with molded hollow reflective cavities fabricated in metal or plastic blocks. Cooling is provided by internal fluid channels within the block.

Abstract: A compact light-beam homogenizer is realized by multiple reflections within internally-reflecting optical channels which are arranged in a folded configuration. The optical channels may be hollow with mirrored walls, or made of a solid transparent optical material. Light enters through an apertured mirror whose internally reflective surface sends back-reflected rays forward for recycling. Multiple entry ports may be provided for combining several beams or for reducing the intensity in the channels. The homogenizer may be used in reverse as a beam divider. Different shapes of the optical channels are provided for obtaining an effective emission surface of different shapes. Due to reflections from surfaces that are parallel to the optical axis, the numerical aperture of the input beams is preserved.

Abstract: A Zerogon, a zero power identical pair of oppositely-oriented meniscus lens elements mounted in the illumination light path, serves as curved mask support while compensating for optical anomalies such as beam shift and beam deviations produced by other transparent supports for the curved mask. The Zerogon, without affecting the transmission beam characteristics, lets the beam diffract as efficiently as does a regular planar mask, thus preserving the partial coherence parameters and resolution capabilities of projection lithography. This novel optical device is not only expected to clear several barriers for curved mask projection lithography but also find place in other applications where collimated or converging light beams have to travel extra paths without significant aberration in any generic optical system.

Abstract: Significant advances in semiconductor microelectronics technologies have resulted in greatly enhanced chip performance. Systems studies have continuously shown that on-board interconnects between chips are the bottleneck in achieving board level performance that is comparable with this chip performance. This invention provides a multiple-layer photonic-electronic circuit board family that solves this interconnect performance problem. Multiple layers of patterned optical channel waveguides and patterned electrical conductors co-exist in a single circuit board structure, with optical vias to transport light between different photonics layers and electrical vias to transport electrical signals and power between different electronics layers. An all-lithographic fabrication technology is used to build the entire board structure with mutually compatible planar processing steps.

Abstract: Imaging systems that use a spatial light modulator (SLM), such as maskless lithography systems using a digital micromirror device (DMD), suffer from low throughput at high resolution because of the increase in the number of pixels to be imaged. A possible solution to this problem is provided by using multiple SLMs. However, packaging multiple SLMs on a suitable base is inefficient because, in an SLM, surrounding the active region, a large inactive region is required for the chip kerf and the connector fan-in; these inactive regions thus prevent close packing of the SLMs. This invention enables close packing of a large number of SLMs by arranging them in twin planes, such that the kerf and fan-in regions overlap substantially.

Abstract: Compositions of matter are described which contain restricted cancer cells. When so restricted, the cells produce an unexpectedly high amount of material which suppresses cancer cell proliferation. The phenomenon crosses cancer type and species lines. Processes for making these compositions, and their use, are also described.

Abstract: Compositions of matter are described which contain restricted cancer cells. When so restricted, the cells produce an unexpectedly high amount of material which suppresses cancer cell proliferation. The phenomenon crosses cancer type and species lines. Processes for making these compositions, and their use, are also described.

Abstract: Compositions of matter are described which contain restricted cancer cells. When so restricted, the cells produce an unexpectedly high amount of material which suppresses cancer cell proliferation. The phenomenon crosses cancer type and species lines. Processes for making these compositions, and their use, are also described.

Abstract: Compositions of matter are described which contain restricted cancer cells. When so restricted, the cells produce an unexpectedly high amount of material which suppresses cancer cell proliferation. The phenomenon crosses cancer type and species lines. Processes for making these compositions, and their use, are also described.

Abstract: Imaging systems that use a spatial light modulator (SLM), such as maskless lithography systems using a digital micromirror device (DMD), suffer from low throughput at high resolution because of the increase in the number of pixels to be imaged. A possible solution to this problem is provided by using multiple SLMs. However, packaging multiple SLMs on a suitable base is inefficient because, in an SLM, surrounding the active region, a large inactive region is required for the chip kerf and the connector fan-in; these inactive regions thus prevent close packing of the SLMs. This invention enables close packing of a large number of SLMs by arranging them in twin planes, such that the kerf and fan-in regions overlap substantially.

Abstract: Maskless microlithography provides a sub-pixel voting system using multiple, slightly-offset, digitally-controlled, unit-pixel, partial exposures with cumulative voting to identify regions of full exposure for sub-pixel-selection. Computer control of a virtual-mask pixel-selection device of unit-pixel resolution usually provides pixel-resolution patterns. To achieve sub-pixel resolution, the virtual mask, after a first partial exposure, is offset by less than a pixel-width and a second partial exposure is made. If the offset is ½ pixel-width, the result is a half-pixel size image region of full exposure. Finer voting can be defined by number of pulses, by significantly changing the offset, by offset in another dimension, and by increasing the multiplicity of exposures, thus enabling resolution enhancement by large multiples. The offsetting techniques can also be used to drill controlled-depth vias or to provide topography controls for laser-milling.

Abstract: Maskless patterning of high-resolution microelectronics features onto large curved substrates. A computer controls individual pixel elements in a spatial light modulator array (SLM) which provides the pattern. Maintaining optical track length constant is by software control of SLM vertical positioning, surface configuration and tilt. SLMs are on/off devices, either reflective or transmissive, such as digital micromirror devices (DMD) and liquid crystal light modulator arrays (LCLM). High-resolution spatial light modulator arrays currently have no capacity for changing or control of their average surface configurations. It is proposed to segment the SLM into smaller array chips, each mounted on a vertical positioner, such as a piezo-actuator, to provide the desired configuration to the surface defined by the spatial light modulator arrays.

Abstract: Maskless patterning of high-resolution microelectronics features onto large curved substrates. A computer controls individual pixel elements in a spatial light modulator array (SLM) which provides the pattern. Maintaining optical track length constant is by software control of SLM vertical positioning, surface configuration and tilt. SLMs are on/off devices, either reflective or transmissive, such as digital micromirror devices (DMD) and liquid crystal light modulator arrays (LCLM). High-resolution spatial light modulator arrays currently have no capacity for changing or control of their average surface configurations. It is proposed to segment the SLM into smaller array chips, each mounted on a vertical positioner, such as a piezo-actuator, to provide the desired configuration to the surface defined by the spatial light modulator arrays.

Abstract: Sub-pixel digital resolution is provided in a maskless microlithography system by a sub-pixel voting system using multiple, slightly-offset, digitally-controlled, unit-pixel, partial exposures with cumulative voting identifying regions of full exposure for sub-pixel-selection. Computer control of a virtual-mask pixel-selection device of unit-pixel resolution usually provides pixel-resolution patterns. To achieve sub-pixel resolution, the virtual mask, after a first partial exposure, is offset by less than a pixel-width and a second partial exposure is made. If the offset is {fraction (1/2 )} pixel-width, then an image region of half-pixel size with full exposure is realized. Finer voting can be defined by number of pulses, by significantly changing the offset, and by offset in another dimension, and by increasing the multiplicity of exposures, thus enabling resolution enhancement by large multiples.

Abstract: Apparatus and method for patterned sequential lateral solidification of a substrate surface, avoiding the need for demagnification to avoid mask damage from fluence sufficient to overcome the threshold for sequential lateral solidification, while using the high throughput of a common stage presenting both 1:1 mask and substrate simultaneously for patterning. The radiation source provides imaging beam and non-imaging beam, each of fluence below the threshold of sequential lateral solidification, but with aggregate fluence above the threshold. The imaging beam path includes a relatively delicate 1:1 mask and 1:1 projection subsystem, with optical elements including a final fold mirror proximate to the substrate surface, put the below-threshold mask pattern on the substrate surface. The non-imaging beam bypasses the delicate elements of imaging beam path, passing through or around the final fold mirror, to impinge on the substrate surface at the same location.