Abstract: There is provided a technique that includes a process chamber configured to be capable of processing a substrate; a main controller configured to be capable of controlling the processing of the substrate; a storage configured to be capable of storing start-up condition execution status information used to determine whether or not a start-up condition is executed when the main controller is started, start-up condition management information for managing the start-up condition, and a state of the start-up condition management information; and a start-up condition controller configured to be capable of validating the start-up condition execution status information when the start-up condition management information satisfies a predetermined condition.

Abstract: According to one aspect of a technique the present disclosure, there is provided a method of manufacturing a semiconductor device, including: (a) processing a substrate accommodated in a process chamber by supplying a process gas to the substrate; and (b) removing deposits adhering to a structure in the process chamber by supplying a cleaning gas to the process chamber, wherein a period T2 from a completion of (b) to a start of an (n+1)th execution of (a) is set to be shorter than a period T1 from a completion of an nth execution of (a) to a start of (b), and wherein n is an integer equal to or greater than 1.

Abstract: A substrate processing apparatus includes: an operation unit, which is provided with a storage unit that stores a plurality of recipes including a recipe for processing a member that constitutes the inside of a reactor in which substrate processing is performed, and a recipe for processing an exhaust pipe through which a gas released from the inside of the reactor flows, the operation unit further being provided with a display unit that displays a setting condition for executing the recipes on an operation screen; and a control unit that executes the recipe that meets the setting condition. The operation unit includes a recipe control unit, which controls, based on the setting condition, execution of the recipe for processing the member constituting the inside of the reactor in which the substrate processing is performed, and the recipe for processing the exhaust pipe, among the recipes stored in the storage unit.

Abstract: A maintenance method of a substrate processing apparatus includes a first processing step of carrying a first substrate holder holding a substrate into a process chamber and processing the substrate held by the first substrate holder within the process chamber, a second processing step of carrying a second substrate holder holding a substrate into the process chamber and processing the substrate held by the second substrate holder within the process chamber, a determination step of determining a replacement timing of the first substrate holder and the second substrate holder, and a maintenance step of, at the replacement timing determined at the determination step, replacing the first substrate holder and the second substrate holder respectively with a third substrate holder and a fourth substrate holder, if at least one of the first substrate holder and the second substrate holder reaches the replacement timing.

Abstract: Provided is a method of automatically setting, in a recipe, a process parameter (PP) according to the number of substrates to be processed. The method includes (a) displaying a process parameter of a process recipe on a display unit; (b) displaying a parameter name in a process parameter file on the display unit; (c) generating a first recipe by substituting the process parameter with the parameter name; (d) downloading the first recipe and one of a plurality of condition tables corresponding to the selected number of substrates when the number of substrates to be processed in a processing chamber is selected; and (e) generating a second recipe by substituting the process parameter of the downloaded one of the condition tables for the parameter name in the downloaded first recipe.

Abstract: A maintenance method of a substrate processing apparatus includes a first processing step of carrying a first substrate holder holding a substrate into a process chamber and processing the substrate held by the first substrate holder within the process chamber, a second processing step of carrying a second substrate holder holding a substrate into the process chamber and processing the substrate held by the second substrate holder within the process chamber, a determination step of determining a replacement timing of the first substrate holder and the second substrate holder, and a maintenance step of, at the replacement timing determined at the determination step, replacing the first substrate holder and the second substrate holder respectively with a third substrate holder and a fourth substrate holder, if at least one of the first substrate holder and the second substrate holder reaches the replacement timing.

Abstract: A substrate processing apparatus includes: an operation unit, which is provided with a storage unit that stores a plurality of recipes including a recipe for processing a member that constitutes the inside of a reactor in which substrate processing is performed, and a recipe for processing an exhaust pipe through which a gas released from the inside of the reactor flows, the operation unit further being provided with a display unit that displays a setting condition for executing the recipes on an operation screen; and a control unit that executes the recipe that meets the setting condition. The operation unit includes a recipe control unit, which controls, based on the setting condition, execution of the recipe for processing the member constituting the inside of the reactor in which the substrate processing is performed, and the recipe for processing the exhaust pipe, among the recipes stored in the storage unit.

Abstract: Provided is a method of automatically setting, in a recipe, a process parameter (PP) according to the number of substrates to be processed. The method includes (a) displaying a process parameter of a process recipe on a display unit; (b) displaying a parameter name in a process parameter file on the display unit; (c) generating a first recipe by substituting the process parameter with the parameter name; (d) downloading the first recipe and one of a plurality of condition tables corresponding to the selected number of substrates when the number of substrates to be processed in a processing chamber is selected; and (e) generating a second recipe by substituting the process parameter of the downloaded one of the condition tables for the parameter name in the downloaded first recipe.

Abstract: It is intended to provide a substrate processing apparatus capable of reliably informing a running state of the apparatus. The substrate processing apparatus having a signal indicator for indicating the running state, including a signal indicator capable of setting at least one operation condition under which the signal indicator operates as well as of operating under anyone of a plurality of operation conditions and a display unit capable of displaying that a cause of the operation is anyone of the operation conditions during the operation of the signal indicator.

Abstract: It is intended to provide a substrate processing apparatus capable of reliably informing a running state of the apparatus. The substrate processing apparatus having a signal indicator for indicating the running state, including a signal indicator capable of setting at least one operation condition under which the signal indicator operates as well as of operating under anyone of a plurality of operation conditions and a display unit capable of displaying that a cause of the operation is anyone of the operation conditions during the operation of the signal indicator.

Abstract: It is intended to provide a substrate processing apparatus capable of reliably informing a running state of the apparatus. The substrate processing apparatus 100 having a signal indicator for indicating the running state, including a signal indicator 306 capable of setting at least one operation condition under which the signal indicator 306 operates as well as of operating under any one of a plurality of operation conditions and a display unit 314 capable of displaying that a cause of the operation is any one of the operation conditions during the operation of the signal indicator 306.

Abstract: It is intended to provide a substrate processing apparatus capable of reliably informing a running state of the apparatus. The substrate processing apparatus 100 having a signal indicator for indicating the running state, including a signal indicator 306 capable of setting at least one operation condition under which the signal indicator 306 operates as well as of operating under any one of a plurality of operation conditions and a display unit 314 capable of displaying that a cause of the operation is any one of the operation conditions during the operation of the signal indicator 306.