Abstract: Provided are a curable composition and an application thereof. The curable composition contains: a compound A having a polymerizable group (a) and an oxyfluoroalkylene group; a polymerization initiator; and a compound B having a polymerizable group different from the polymerizable group (a). The polymerizable group (a) in the compound A is at least one selected from the group consisting of a vinylphenyl group, a vinylphenyloxy group, a vinylbenzyloxy group, a vinyloxy group, a vinyloxycarbonyl group, a vinylamino group, a vinylaminocarbonyl group, a vinylthio group, an allyloxy group, an allyloxycarbonyl group, an allylamino group, an allylaminocarbonyl group, an allylthio group, an epoxy group, and an epoxycycloalkyl group.

Abstract: Provided is a process in which a cyclobutanediol compound having a high cis:trans ratio can be stably obtained. The cyclobutanediol compound having a cis:trans ratio of 1.5:1 to 5000:1 is produced by using at least one compound selected from a group consisting of a cyclobutanedione compound, a cyclobutane ketol compound, and a cyclobutanediol compound as a raw material, and performing a catalytic hydrogenation reaction and an isomerization reaction in the cyclobutanediol compound in a solid phase state in the presence of a metal catalyst without adding a solvent.

Abstract: To provide a novel conductive film having two regions differing in the light transmittance, an optoelectronic device having such a conductive film, and a method for producing a conductive film by which such a conductive film can readily be produced. A conductive film, which has a first region and a second region having a light transmittance higher than the first region, the conductive film having a first film formed of a conductive material as a material and a resin film formed of a fluorinated polymer as a material, the first film being disposed to overlap with at least the first region among the first region and the second region, the resin film being disposed to overlap with the second region, and the fluorinated polymer satisfying the following (1) and (2): (1) when the temperature is increased at a temperature-increasing rate of 2° C./min under a pressure of 1×10?3 Pa, the temperature at which the thermogravimetric loss rate substantially reaches 100% is 400° C.

Abstract: A fluorinated polymer suitable for deposition and capable of favorable metal patterning, is provided. A resin film containing such a fluorinated polymer as a material is provided. Further, a photoelectronic element having such a resin film in its structure is provided. A fluorinated polymer which satisfies the following requirements (1) to (3): (1) the melting point is less than 200° C., or no melting point is observed, (2) the thermogravimetric loss rate when the temperature is increased at a temperature-increasing rate of 2° C./min under a pressure of 1×10?3 Pa, substantially reaches 100% at 400° C. or lower, (3) when the temperature is increased at a temperature-increasing rate of 2° C./min under a pressure of 1×10?3 Pa, the temperature width from a temperature at which the thermogravimetric loss rate is 10% to a temperature at which it is 90%, is within 200° C.

Abstract: A fluorinated polymer suitable for deposition is provided. A film containing such a fluorinated polymer as a material is provided. A method for producing a film, by which such a film can readily be produced, is provided. Further, an organic photoelectronic element having such a film in its structure is provided. A fluorinated polymer which satisfies the following requirements (1) to (3): (1) the melting point is 200° C. or higher, (2) the thermogravimetric loss rate when the temperature is increased at a temperature-increasing rate of 2° C./min under a pressure of 1×10?3 Pa, substantially reaches 100% at 400° C. or lower, (3) when the temperature is increased at a temperature-increasing rate of 2° C./min under a pressure of 1×10?3 Pa, the temperature width from a temperature at which the thermogravimetric loss rate is 10% to a temperature at which it is 90%, is within 100° C.

Abstract: To provide an organic photoelectronic element excellent in light emitting characteristics and long-term reliability. The organic photoelectronic element comprises a substrate, an anode provided on the substrate, a cathode facing the anode, a light emitting layer disposed between the anode and the cathode, a hole transport layer disposed between the light emitting layer and the anode, and an electron blocking layer provided in contact with the light emitting layer and the hole transport layer between the light emitting layer and the hole transport layer, wherein the hole transport layer contains a fluorinated polymer and an organic semiconductor material, and has a refractive index in the wavelength range of from 450 nm to 800 nm, of at most 1.

Abstract: To provide an organic photoelectronic element, of which the external quantum efficiency is improved, the power consumption is low and the service life is prolonged. The organic photoelectronic element comprises a substrate, an anode provided on the substrate, a cathode facing the anode, a light emitting layer disposed between the anode and the cathode, and a hole transport layer provided in contact with the light emitting layer between the light emitting layer and the anode, wherein the hole transport layer contains an organic semiconductor material and a fluorinated polymer, and at the surface of the hole transport layer in contact with the light emitting layer, the fluorinated polymer is present.

Abstract: Provided is a process in which a cyclobutanediol compound having a high cis:trans ratio can be stably obtained. The cyclobutanediol compound having a cis:trans ratio of 1.5:1 to 5000:1 is produced by using at least one compound selected from a group consisting of a cyclobutanedione compound, a cyclobutanketol compound, and a cyclobutanediol compound as a raw material, and performing a catalytic hydrogenation reaction and an isomerization reaction in the cyclobutanediol compound in a solid phase state in the presence of a metal catalyst without adding a solvent.

Abstract: To provide a charge injection layer in which the refractive index is sufficiently low and unbalance in the composition of materials is less likely to occur, and a method for its production as well as an organic photoelectronic element and a method for its production. The charge injection layer contains a fluorinated polymer and a semiconductor material, and has a refractive index in the wavelength range of from 450 to 800 nm, of at most 1.60.

Abstract: To provide an organic photoelectronic element, of which the external quantum efficiency is improved, the power consumption is low and the service life is prolonged. The organic photoelectronic element comprises a substrate, an anode provided on the substrate, a cathode facing the anode, a light emitting layer disposed between the anode and the cathode, and a hole transport layer provided in contact with the light emitting layer between the light emitting layer and the anode, wherein the hole transport layer contains an organic semiconductor material and a fluorinated polymer, and at the surface of the hole transport layer in contact with the light emitting layer, the fluorinated polymer is present.

Abstract: To provide a charge injection layer in which the refractive index is sufficiently low and unbalance in the composition of materials is less likely to occur, and a method for its production as well as an organic photoelectronic element and a method for its production. The charge injection layer contains a fluorinated polymer and a semiconductor material, and has a refractive index in the wavelength range of from 450 to 800 nm, of at most 1.60.

Abstract: To provide an organic photoelectronic element excellent in light emitting characteristics and long-term reliability. The organic photoelectronic element comprises a substrate, an anode provided on the substrate, a cathode facing the anode, a light emitting layer disposed between the anode and the cathode, a hole transport layer disposed between the light emitting layer and the anode, and an electron blocking layer provided in contact with the light emitting layer and the hole transport layer between the light emitting layer and the hole transport layer, wherein the hole transport layer contains a fluorinated polymer and an organic semiconductor material, and has a refractive index in the wavelength range of from 450 nm to 800 nm, of at most 1.

Abstract: To provide a charge transport layer excellent in the external quantum efficiency, and an organic photoelectronic element comprising the charge transport layer. A charge transport layer comprising a film containing a fluorinated polymer and a semiconductor material, wherein the film has a material composition such that ?Eth is within a range of from 0.010 to 0.080 MV/cm. An organic photoelectronic element comprising the charge transport layer.

Abstract: To provide a charge transport layer excellent in the external quantum efficiency, and an organic photoelectronic element comprising the charge transport layer. A charge transport layer comprising a film containing a fluorinated polymer and a semiconductor material, wherein the film has a material composition such that ?Eth is within a range of from 0.010 to 0.080 MV/cm. An organic photoelectronic element comprising the charge transport layer.

Abstract: To provide a curable composition from which a cured film having lipophilicity to such an extent that application of an organic solvent-based coating liquid is possible while maintaining water repellency, having sufficient insulating properties and having a low dielectric constant, is obtained, a method for producing a cured film using the curable composition, and a semiconductor device using a cured film obtained by curing the curable composition. A curable composition comprising a fluorinated polyarylene prepolymer (A) having crosslinkable functional groups, a compound (B) having at least two crosslinkable functional groups, having no fluorine atom and having a number average molecular weight of from 140 to 3,000, a compound (C) having a C6-24 alkyl group which may have an etheric oxygen atom between carbon atoms, having crosslinkable functional groups, having no fluorine atom and having a number average molecular weight higher than 3,000 and at most 50,000, and a radical polymerization initiator (D).

Abstract: A cured film is formed by using a curable composition comprising a liquid repellent polymer having units (u1) based on a liquid repellent compound represented by the following formula (m1): wherein Cf is a C1-20 fluoroalkyl group or a C1-20 fluoroalkyl group having an etheric oxygen atom between carbon atoms, each of R1 and R2 which are independent of each other, is a hydrogen atom, a C1-6 alkyl group or a phenyl group, X is an oxygen atom, a sulfur atom, a nitrogen atom or NH, n in an integer of from 0 to 4, m is 1 when X is an oxygen atom, a sulfur atom or NH, or 2 when X is a nitrogen atom, Z is R4R5C?CR3—CO—, and each of R3, R4 and R5 which are independent of one another, is a hydrogen atom or a methyl group.

Abstract: To provide a curable composition which has favorable insulating property and liquid repellency, and from which a cured film having liquid repellency capable of being sufficiently converted to be liquid-philic even by irradiation with ultraviolet light having a wavelength of at least 300 nm, can be formed; an article having a cured film obtained by curing the curable composition and its production process. A cured film is formed by using a curable composition comprising a polymer having units (u1) based on a compound represented by the following formula (m1): wherein R1=a hydrogen atom, a methyl group or the like; R2=a bivalent organic group or the like; Cf=a C1-20 fluoroalkyl group or the like, X?O, S, N or NH; m=1 to 2; n=0 to 4; k=0 to 1; and Z=a (meth)acryloyl group or the like.

Abstract: A curable composition that is sufficiently cured even without a heating step at high temperature and from which a low dielectric constant cured film excellent in solvent resistance is obtained. A curable composition containing a fluorinated polyarylene prepolymer (A) having a crosslinkable functional group, a compound (B) having a number average molecular weight of from 140 to 5,000, having at least two crosslinkable functional groups and having no fluorine atoms, a copolymer (C) having the following units (c1) and (c2) and a radical polymerization initiator (D): unit (c1): a unit having a fluoroalkyl group having at most 20 carbon atoms, which may have an etheric oxygen atom between carbon atoms, and having no crosslinkable functional group; unit (c2): a unit having a crosslinkable functional group.

Abstract: To provide a curable composition from which a cured film having a low dielectric constant and a low water-absorption and being capable of laser processing, is obtained a laser processing method of the cured film, and a process for producing a multilayer wiring structure. A curable composition comprising a fluorinated polyarylene prepolymer (A) having a crosslinkable functional group, a laser processing method comprising irradiating a cured film obtained by curing the composition with laser light to remove a part of the cured film, and a process for producing a multilayer wiring structure, comprising a step of forming a via hole in an insulation film made of the cured film by the processing method.

Abstract: To provide a prepolymer which is excellent in heat resistance and which can form a cured product excellent in oil repellency and water repellency. A crosslinkable prepolymer having a polyaryl ether structure on its main chain, which has a crosslinkable functional group and a side chain represented by “Rf-CH2—O—” wherein Rf is a C3-50 fluorinated alkyl group (which may contain an oxygen atom forming an ether bond).