Patents by Inventor Kaoro Iwato

Kaoro Iwato has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Positive resist composition and pattern forming method using the same
    Publication number: 20070218406
    Abstract: A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation: wherein AR represents an aryl group; Rn represents an alkyl group, a cycloalkyl group or an aryl group; and A represents an atom or group selected from the group consisting of a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group, and a pattern forming method using the resist composition.
    Type: Application
    Filed: March 14, 2007
    Publication date: September 20, 2007
    Applicant: FUJIFILM Corporation
    Inventors: Kazuyoshi Mizutani, Kaoro Iwato, Kunihiko Kodama, Masaomi Makino, Toru Tsuchihashi