Patents by Inventor Kaoru Ishikawa
Kaoru Ishikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240136517Abstract: A non-aqueous electrolyte secondary battery that is one aspect of the present disclosure is provided with a positive electrode, a negative electrode, and a non-aqueous electrolyte, the positive electrode having a positive electrode current collector and a positive electrode mixture layer that contains a positive electrode active material and that is formed on the surface of the positive electrode current collector, the positive electrode active material including a lithium-containing composite oxide represented by a prescribed general formula, the lithium-containing composite oxide having secondary particles formed by aggregation of primary particles, Ca being present on the surfaces and in the interiors of the secondary particles, and the proportion of Ca present on the surfaces of the secondary particles being 12-58% relative to the total amount of Ca present on the surfaces and in the interiors of the secondary particles.Type: ApplicationFiled: February 22, 2022Publication date: April 25, 2024Applicant: Panasonic Energy Co., Ltd.Inventors: Takayuki Ishikawa, Kaoru Nagata, Masanori Maekawa
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Publication number: 20240085250Abstract: There is provided an information processing apparatus that enables a more effective reduction in a load imposed on a user, with the use of force applied to the user in relation to a tangible object. The information processing apparatus includes a control unit configured to estimate, on the basis of a state of a user, a first amount that is predicted by the user with regard to force applied to the user in relation to a tangible object, and control presentation of information to the user on the basis of the first amount and a second amount that is preliminarily registered with regard to the force.Type: ApplicationFiled: November 26, 2021Publication date: March 14, 2024Applicant: Sony Group CorporationInventors: Shingo UTSUKI, Tsuyoshi ISHIKAWA, Junki INOUE, Takayuki KURIHARA, Takanobu OMATA, Shin SHIROMA, Kaoru KOIKE
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Patent number: 10243198Abstract: A method for forming a pattern, a structural body, a method for producing a comb-shaped electrode, and a secondary cell. The pattern forming method, in which n patterns (n?2) are formed on a support, includes forming a first resist layer on the support surface; and repeating: forming a guide hole through a kth resist layer by exposure and development, filling a kth pattern material into the guide hole by a screen printing process, removing the kth resist layer, and forming a (k+1)th resist layer on the support and all pattern materials, regarding kth (k=1 to n?1) pattern material and resist layer in order of k=1 to n?1; forming a guide hole and nth pattern material filling similarly, and removing the nth resist layer.Type: GrantFiled: March 28, 2014Date of Patent: March 26, 2019Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Takahiro Asai, Kaoru Ishikawa
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Patent number: 10189968Abstract: Provided are a varnish for porous polyimide film production, providing an unburned composite film that is less likely to have a sea-island structure, and a method for producing a porous polyimide film using the same. The varnish according to the present invention comprises a resin including polyamide acid and/or polyimide, fine particles, and a solvent, and has a fine particle content of not less than 65% by volume relative to the total of the resin and the fine particles and a viscosity at 25° C. of not less than 550 mPa·s. Preferably, the varnish further comprises a dispersant. The method for producing a porous polyimide film according to the present invention comprises: forming an unburned composite film using the varnish; burning the unburned composite film to obtain a polyimide-fine particle composite film; and removing the fine particles from the polyimide-fine particle composite film.Type: GrantFiled: August 19, 2015Date of Patent: January 29, 2019Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Mitsuharu Tobari, Masanori Ichikawa, Kaoru Ishikawa, Tsukasa Sugawara
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Patent number: 10177357Abstract: Provided is a method for producing a porous polyimide film with which it is possible to suppress the occurrence of curling in the polyimide-fine particle composite film obtained by firing the unfired composite film. The method for producing a porous polyimide film of the present invention includes, in the following order: forming an unfired composite film using a varnish that contains a resin including polyamide acid and/or polyimide, fine particles, and a solvent; immersing the unfired composite film in a solvent including water; firing the unfired composite film to obtain a polyimide-fine particle composite film; and removing the fine particles from the polyimide-fine particle composite film.Type: GrantFiled: September 7, 2015Date of Patent: January 8, 2019Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Mitsuharu Tobari, Yoshitsugu Kawamura, Kaoru Ishikawa, Tsukasa Sugawara
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Patent number: 10141547Abstract: A nonaqueous secondary battery which can be made thinner without deterioration of battery performance, and a method for manufacturing the battery. The nonaqueous secondary battery includes a positive electrode and a negative electrode which are substantially arranged in the same plane so that respective end surfaces face each other at a distance; a substrate by which the positive electrode and the negative electrode are affixed and supported; a cover member having gas barrier properties, which defines an airtight chamber together with the substrate, in the chamber in which the positive electrode and the negative electrode are contained; and an electrolyte which is contained in the airtight chamber so as to be positioned at least between the facing end surfaces of the positive electrode and the negative electrode, and which relates to the battery reaction between the positive electrode and the negative electrode.Type: GrantFiled: June 19, 2014Date of Patent: November 27, 2018Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Takahiro Asai, Kaoru Ishikawa, Mitsuo Hagihara
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Publication number: 20180009962Abstract: Provided are a varnish for porous polyimide film production, providing an unburned composite film that is less likely to have a sea-island structure, and a method for producing a porous polyimide film using the same. The varnish according to the present invention comprises a resin including polyamide acid and/or polyimide, fine particles, and a solvent, and has a fine particle content of not less than 65% by volume relative to the total of the resin and the fine particles and a viscosity at 25° C. of not less than 550 mPa·s. Preferably, the varnish further comprises a dispersant. The method for producing a porous polyimide film according to the present invention comprises: forming an unburned composite film using the varnish; burning the unburned composite film to obtain a polyimide-fine particle composite film; and removing the fine particles from the polyimide-fine particle composite film.Type: ApplicationFiled: August 19, 2015Publication date: January 11, 2018Applicant: Tokyo Ohka Kogyo Co., Ltd.Inventors: Mitsuharu TOBARI, Masanori ICHIKAWA, Kaoru ISHIKAWA, Tsukasa SUGAWARA
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Publication number: 20170256766Abstract: Provided is a method for producing a porous polyimide film with which it is possible to suppress the occurrence of curling in the polyimide-fine particle composite film obtained by firing the unfired composite film. The method for producing a porous polyimide film of the present invention includes, in the following order: forming an unfired composite film using a varnish that contains a resin including polyamide acid and/or polyimide, fine particles, and a solvent; immersing the unfired composite film in a solvent including water; firing the unfired composite film to obtain a polyimide-fine particle composite film; and removing the fine particles from the polyimide-fine particle composite film.Type: ApplicationFiled: September 7, 2015Publication date: September 7, 2017Applicant: Tokyo Ohka Kogyo Co., Ltd.Inventors: Mitsuharu TOBARI, Yoshitsugu KAWAMURA, Kaoru ISHIKAWA, Tsukasa SUGAWARA
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Publication number: 20170061135Abstract: According to one embodiment, an electronic apparatus includes a hardware processor and a memory connected to the hardware processor. The hardware processor is configured to determine whether the electronic apparatus is vulnerable, shut down the electronic apparatus if the electronic apparatus is determined as vulnerable, and the electronic apparatus executes a first operation, and lock the electronic apparatus to prohibit startup of the electronic apparatus in a Basic Input Output System (BIOS) which runs on the electronic apparatus.Type: ApplicationFiled: February 25, 2016Publication date: March 2, 2017Inventor: Kaoru Ishikawa
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Publication number: 20170018369Abstract: First, there is provided a crystal growth control agent which is capable of suppressing an increase in a crystal size of a p-type semiconductor, and performing chemical modification on a surface of p-type semiconductor microparticle. Second, there is provided a composition for forming a hole transport layer which is capable of prompting crystallization and fine pulverization of the p-type semiconductor and performing the chemical modification on the surface of the p-type semiconductor microparticle even in the case where an organic salt (an ionic liquid) containing an anion other than the thiocyanate ion is used. According to the present invention, the crystal growth control agent contains at least one of sulfur-containing compounds (except for thiocyanate) selected from the group consisting of a compound, which generates a thiolate anion due to dissociation of a proton or a cation, and a disulfide compound, and controls crystal growth of a p-type semiconductor.Type: ApplicationFiled: March 10, 2015Publication date: January 19, 2017Applicant: Tokyo Ohka Kogyo Co., Ltd.Inventors: Akimasa NAKAMURA, Atsushi YAMANOUCHI, Takahiro ASAI, Kaoru ISHIKAWA
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Patent number: 9478791Abstract: A method for forming a pattern multiple patterns of identical or different pattern materials can be formed on a support in a short time, a structural body, a method for producing a comb-shaped electrode, and a secondary cell. The pattern forming method, in which n patterns (n?2) are formed on a support, includes forming a first resist layer on the support surface; repeating: forming a guide hole through all resist layers by exposure and development, filling a kth pattern material into the guide hole by a screen printing process, and forming a (k+1)th resist layer on the kth resist layer and the pattern materials, regarding kth (k=1 to n?1) pattern material and resist layer in order of k=1 to n?1; performing guide hole formation and nth pattern material filling similarly, and removing all of the resist layers.Type: GrantFiled: August 28, 2013Date of Patent: October 25, 2016Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Kaoru Ishikawa, Takahiro Asai
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Publication number: 20160149170Abstract: A nonaqueous secondary battery which can be made thinner without deterioration of battery performance, and a method for manufacturing the battery. The nonaqueous secondary battery includes a positive electrode and a negative electrode which are substantially arranged in the same plane so that respective end surfaces face each other at a distance; a substrate by which the positive electrode and the negative electrode are affixed and supported; a cover member having gas barrier properties, which defines an airtight chamber together with the substrate, in the chamber in which the positive electrode and the negative electrode are contained; and an electrolyte which is contained in the airtight chamber so as to be positioned at least between the facing end surfaces of the positive electrode and the negative electrode, and which relates to the battery reaction between the positive electrode and the negative electrode.Type: ApplicationFiled: June 19, 2014Publication date: May 26, 2016Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Takahiro Asai, Kaoru Ishikawa, Mitsuo Hagihara
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Patent number: 9203078Abstract: An object of the present invention is to provide a negative electrode for a lithium ion secondary battery, capable of obtaining a lithium ion secondary battery which is excellent in initial charge characteristics and is also excellent in charge/discharge cycle characteristics, and a method for producing the same, as well as a lithium ion secondary battery comprising the negative electrode for a lithium ion secondary battery. A negative electrode for a lithium ion secondary battery according to the present invention comprises a current collector layer, and a negative electrode active material layer composed of a tin structure, the tin structure includes a plurality of protrusions which protrude approximately perpendicularly to a main surface of the current collector layer, and a cross-sectional area of the tip portion parallel to the main surface of the current collector layer of the protrusion is smaller than that of the base end portion.Type: GrantFiled: March 29, 2013Date of Patent: December 1, 2015Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Kaoru Ishikawa, Takahiro Asai
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Publication number: 20150243965Abstract: A method for forming a pattern multiple patterns of identical or different pattern materials can be formed on a support in a short time, a structural body, a method for producing a comb-shaped electrode, and a secondary cell. The pattern forming method, in which n patterns (n?2) are formed on a support, includes forming a first resist layer on the support surface; repeating: forming a guide hole through all resist layers by exposure and development, filling a kth pattern material into the guide hole by a screen printing process, and forming a (k+1)th resist layer on the kth resist layer and the pattern materials, regarding kth (k=1 to n?1) pattern material and resist layer in order of k=1 to n?1; performing guide hole formation and nth pattern material filling similarly, and removing all of the resist layers.Type: ApplicationFiled: August 28, 2013Publication date: August 27, 2015Inventors: Kaoru Ishikawa, Takahiro Asai
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Publication number: 20140295264Abstract: A method for forming a pattern, a structural body, a method for producing a comb-shaped electrode, and a secondary cell. The pattern forming method, in which n patterns (n?2) are formed on a support, includes forming a first resist layer on the support surface; and repeating: forming a guide hole through a kth resist layer by exposure and development, filling a kth pattern material into the guide hole by a screen printing process, removing the kth resist layer, and forming a (k+1)th resist layer on the support and all pattern materials, regarding kth (k=1 to n?1) pattern material and resist layer in order of k=1 to n?1; forming a guide hole and nth pattern material filling similarly, and removing the nth resist layer.Type: ApplicationFiled: March 28, 2014Publication date: October 2, 2014Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Takahiro Asai, Kaoru Ishikawa
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Publication number: 20140152571Abstract: According to one embodiment, an electronic device includes: a display; a touch panel configured to detect a position on a display region of the display; a connection module configured to be connected to a device comprising a keyboard module, and a controller configured to deactivate a position detection function on the touch panel when the device is connected to the connection module and to activate the position detection function on the touch panel when the device is not connected to the connection module.Type: ApplicationFiled: August 27, 2013Publication date: June 5, 2014Applicant: Kabushiki Kaisha ToshibaInventor: Kaoru Ishikawa
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Patent number: 7871758Abstract: This process for producing a resist pattern is a process for producing a resist pattern including: the step of laminating (a) a support having an upper surface on which copper exists, (b) an inorganic substance layer consisting of an inorganic substance supplied from an inorganic substance source, and (c) a photoresist layer consisting of a chemically amplified type negative photoresist composition, to obtain a photoresist laminate, the step of selectively irradiating active light or radioactive rays to the photoresist laminate, and the step of developing the (c) photoresist layer together with the (b) inorganic substance layer to form a resist pattern.Type: GrantFiled: November 29, 2005Date of Patent: January 18, 2011Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Koichi Misumi, Koji Saito, Kaoru Ishikawa
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Patent number: 7754416Abstract: This process for producing a resist pattern includes: the step of laminating (a) a support having an upper surface on which copper exists, (b) an inorganic substance layer consisting of an inorganic substance supplied from an inorganic substance source, and (c) a photoresist layer consisting of a chemically amplified type positive photoresist composition, to obtain a photoresist laminate, the step of selectively irradiating active light or radioactive rays to said photoresist laminate, and the step of developing said (c) photoresist layer together with said (b) inorganic substance layer to form a resist pattern.Type: GrantFiled: November 28, 2005Date of Patent: July 13, 2010Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Koichi Misumi, Koji Saito, Kaoru Ishikawa
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Publication number: 20090226850Abstract: This process for producing a resist pattern includes: the step of laminating (a) a support having an upper surface on which copper exists, (b) an inorganic substance layer consisting of an inorganic substance supplied from an inorganic substance source, and (c) a photoresist layer consisting of a chemically amplified type positive photoresist composition, to obtain a photoresist laminate, the step of selectively irradiating active light or radioactive rays to said photoresist laminate, and the step of developing said (c) photoresist layer together with said (b) inorganic substance layer to form a resist pattern.Type: ApplicationFiled: November 28, 2005Publication date: September 10, 2009Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Koichi Misumi, Koji Saito, Kaoru Ishikawa
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Patent number: D705144Type: GrantFiled: August 8, 2012Date of Patent: May 20, 2014Assignee: Toyota Jidosha Kabushiki KaishaInventors: Kaoru Ishikawa, Takashi Ueshin, Ben Uk Chang