Patents by Inventor Kaoru KAIBUKI

Kaoru KAIBUKI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220254607
    Abstract: There is provided a plasma etching method having a high etching rate of a silicon nitride film. A plasma etching method includes an etching step of etching a silicon nitride film formed on a substrate (20) using plasma obtained by converting an etching gas containing iodine heptafluoride into plasma.
    Type: Application
    Filed: May 22, 2020
    Publication date: August 11, 2022
    Applicant: SHOWA DENKO K.K.
    Inventors: Daisuke SATO, Kaoru KAIBUKI, Yuki OKA