Abstract: The invention provides a cleaning method and a cleaning apparatus in which the quantity of cleaning solvent used may be reduced, and high cleaning property is achieved. The cleaning method of the invention includes a first step of transporting a plate-shaped object to be processed on a support stand by a transporting unit and making hydrophiling preparation on at least one surface thereof, a second step of forming a liquid film on a surface of the object to be processed, on which hydrophiling preparation has made, and a third step of irradiating ultrasonic energy from an ultrasonically oscillating surface provided in the vicinity of the liquid film formed on the surface of the object to be processed so as to be capable of coming into contact therewith onto the object to be processed for cleaning.