Patents by Inventor Kaoru Ohmura
Kaoru Ohmura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 4401521Abstract: A method for manufacturing a fine-patterned thick film conductor structure free from ununiformity in film thickness comprises steps of forming resist on a thin metal plate at areas other than land areas, electroplating the thin metal plate using the thin metal plate as a cathode electrode to form conductors having a circuit density of no less than three lines/mm and a thickness of 15-200 .mu.m, bonding the electroplated thin metal plate to an insulative substrate with the thin metal plate side facing up and etching the thin metal plate. The fine-patterned conductors are suited for use in small-sized coils, high density connectors and high density wirings.Further disclosed is a method for manufacturing a fine-patterned thick film printed circuit board free from side protrusion comprising steps of forming resist on a thin metal plate at areas other than land areas, electroplating the thin metal plate to a thickness of 0.3-10 .mu.m at a current density of 0.05-2 A/dm.sup.Type: GrantFiled: November 20, 1981Date of Patent: August 30, 1983Assignee: Asahi Kasei Kogyo Kabushiki KaishaInventors: Kaoru Ohmura, Ryohei Koyama, Takeo Kimura
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Patent number: 4401966Abstract: A mold-packaged magnetoelectric transducer element such as a Hall element or a magnetoresistance element comprises a magnetosensitive thin layer, electrodes formed on the thin layer for lead-out connection, an unwindowed film support, leads formed on one surface of the film support, conductive resin for connecting the electrodes and the leads, mold resin packaging on the one surface of the film support the remaining except parts of the leads.Type: GrantFiled: June 16, 1981Date of Patent: August 30, 1983Assignee: Asahi Kasei Kogyo Kabushiki KaishaInventors: Kaoru Ohmura, Masaru Matsuura, Takeki Matsui, Takeo Kimura
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Patent number: 4392013Abstract: In manufacturing a fine-patterned thick film conductor structure, a thin film conductor layer having a film thickness of 0.1-10 .mu.m is formed on an insulating substrate and conductive material is then electroplated on the thin film conductor layer to the thickness of 34.9-190 .mu.m under the condition of a cathode current density of no less than 5 A/dm.sup.2. In patterning the conductors, a film thickness-to-conductor interspacing ratio is selected to be no less than 1.4 to prevent widthwise thickening of the conductors in the electroplating process. Resulting conductor structure has a circuit density of no less than 5 lines/mm and a film thickness of 35-200 .mu.m. It is useful for a high density printed circuit board and a miniature coil.Type: GrantFiled: December 22, 1980Date of Patent: July 5, 1983Assignee: Asahi Kasei Kogyo Kabushiki KaishaInventors: Kaoru Ohmura, Takeo Kimura, Tetsuhiro Kusunose
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Patent number: 4377652Abstract: An article for electrical use such as insulative substrates, electrical circuit borads and electrical elements, wholly or partly consisting out of an aromatic polyamide-imide having a reduced viscosity of from about 0.3 to 1.5, which polyamide-imide may contain a granular material dispersed therein, and a composition comprising 100 parts by weight of said polyamide-imide and additional about 100 to 4,000 parts by weight of a granular material and optionally about 10 to 10,000 parts by weight of a polar organic solvent.Type: GrantFiled: February 8, 1979Date of Patent: March 22, 1983Assignee: Asahi Kasei Kogyo Kabushiki KaishaInventors: Kaoru Ohmura, Ichiro Shibasaki, Takeo Kimura
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Patent number: 4316974Abstract: An organic polar solvent-soluble aromatic polyamide-imide having therein aromatic nuclei linked at their respective 1 - and 3 - positions and having therein amide linkages and terminal groups unsubstituted or partially substituted with acrylate or methacrylate groups is found to impart excellent heat resistance and insulating property to a photoresist composition produced therefrom.Type: GrantFiled: December 17, 1979Date of Patent: February 23, 1982Assignee: Asahi Kasei Kogyo Kabushiki KaishaInventors: Kaoru Ohmura, Ichiro Shibasaki, Takeo Kimura
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Patent number: 4310641Abstract: An organic polar solvent-soluble aromatic polyamide-imide having therein aromatic nuclei linked at their respective 1 - and 3 -positions and having therein amide linkages and terminal groups partially substituted with cinnamate groups is found to impart excellent heat resistance and insulating property to a photoresist composition produced therefrom.Type: GrantFiled: August 1, 1979Date of Patent: January 12, 1982Assignee: Asahi Kasei Kogyo Kabushiki KaishaInventors: Kaoru Ohmura, Ichiro Shibasaki, Takeo Kimura, Muneaki Kimura
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Patent number: 4296424Abstract: In a compound semiconductor device such as a magnetoresistance element or Hall element having a compound semiconductor portion such as of InSb and an electrode portion, a portion of the compound semiconductor portion is exposed to energy irradiation to be converted into an alloy state or amorphous state and rendered conductive to form the electrode portion. The portion rendered conductive is contiguous to and in ohmic contact with the unexposed portion of the compound semiconductor and used as a shorting bar electrode or an external lead bonding pad.Type: GrantFiled: March 22, 1979Date of Patent: October 20, 1981Assignee: Asahi Kasei Kogyo Kabushiki KaishaInventors: Ichiro Shibasaki, Kaoru Ohmura, Takeo Kimura
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Patent number: 4251795Abstract: A semiconductor magnetoresistive element with at least one intermediate terminal comprises first and second electrodes formed at opposite ends of a magnetosensitive portion of the semiconductor magnetoresistive element, a third electrode interposed between the first and second electrodes, and a plurality of shorting bars disposed, with electrical isolation from each other, on at least one of respective sections of the magnetosensitive portion between the first and third electrodes and between the second and third electrodes, whereby the magnetic sensitivity characteristic of the magnetosensitive section between the first and third electrodes is rendered different from that of the magnetosensitive section between the second and third electrodes.Type: GrantFiled: November 29, 1978Date of Patent: February 17, 1981Assignee: Asahi Kasei Kogyo Kabushiki KaishaInventors: Ichiro Shibasaki, Kaoru Ohmura, Takeo Kimura
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Patent number: 4227039Abstract: Deposited on a glass or ceramic substrate for a thin-film microcircuit board such as a hybrid IC board or a transparent electrode is a thin-film laminate, which comprises a dispersion metal thin-film dispersible and evaporable upon application of an energy above a threshold value and an electrical property-imparting film defining a conductor or a resistor. Then a high intensity of light having an energy sufficient to cause dispersion is applied selectively on the thin-film laminate, thereby removing exposed portions of the thin-film laminate as a result of dispersion and evaporation thereof. Unexposed portions of the thin-film laminate provide a desired pattern. The electrical property-imparting film is a thin-film of noble metal such as gold, silver or platinum or a thin film of transparent electrode material such as SnO.sub.2 or In.sub.2 O.sub.3, which is not easily dispersible upon application of the above energy.Type: GrantFiled: October 23, 1978Date of Patent: October 7, 1980Assignee: Asahi Kasei Kogyo Kabushiki KaishaInventors: Ichiro Shibasaki, Kaoru Ohmura, Takeo Kimura, Hidehiko Kobayashi
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Patent number: 4220707Abstract: An epoxy resin composition comprising an epoxy compound having an average of one or more epoxy groups per molecule, an amine curing agent and a reductive metal compound or complex can produce excellent developed color images, and concave-convex images by energy irradiation. The epoxy resin composition can give excellent physical, chemical and electrical properties to the formed images and various inorganic and organic materials can be used as substrate.Type: GrantFiled: April 24, 1978Date of Patent: September 2, 1980Assignee: Asahi Kasei Kogyo Kabushiki KaishaInventors: Kaoru Ohmura, Kiichiro Sasaguri, Kazuo Toyomoto
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Patent number: 4208477Abstract: An organic polar solvent-soluble aromatic polyamide-imide having therein aromatic nuclei linked at their respective 1- and 3-positions and having therein amide linkages and terminal groups unsubstituted or partially substituted with acrylate or methacrylate groups is found to impart excellent heat resistance and insulating property to a photoresist composition produced therefrom.Type: GrantFiled: November 16, 1978Date of Patent: June 17, 1980Assignee: Asahi Kasei Kogyo Kabushiki KaishaInventors: Kaoru Ohmura, Ichiro Shibasaki, Takeo Kimura
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Patent number: 4180404Abstract: An organic polar solvent-soluble aromatic polyamide-imide having therein aromatic nuclei linked at their respective 1- and 3- positions and having therein amide linkages and terminal groups partially substituted with cinnamate groups is found to impart excellent heat resistance and insulating property to a photoresist composition produced therefrom.Type: GrantFiled: November 16, 1978Date of Patent: December 25, 1979Assignee: Asahi Kasei Kogyo Kabushiki KaishaInventors: Kaoru Ohmura, Ichiro Shibasaki, Takeo Kimura, Muneaki Kimura
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Patent number: 4121007Abstract: A novel printed circuit board with a circuit of high precision having a polymer coat layer between a base and a dispersion imaging material layer and a pattern circuit on undispersed portions of the dispersion imaging material layer. Such a printed circuit board is prepared by a simplified process which comprises essentially two steps, namely, exposure of the dispersion imaging material through a circuit pattern mask to obtain a pattern circuit of the unexposed portions and conductive metal plating wherein said unexposed portions are selectively deposited with the conductive metal due to the specific effect of provision of the polymer coat layer directly under the dispersion imaging material layer.Type: GrantFiled: August 10, 1976Date of Patent: October 17, 1978Assignee: Asahi Kasei Kogyo Kabushiki KaishaInventors: Hidehiko Kobayashi, Tatsumi Arakawa, Tetsuo Shiga, Kaoru Ohmura, Sakae Ito
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Patent number: 3956239Abstract: An epoxy resin composition having excellent curability comprising 100 parts by weight of an epoxy resin having at least two epoxy groups per molecule and about 1 to 300 parts by weight of an amide derivative of 4-aminomethyl-1,8-diaminooctane.Type: GrantFiled: October 25, 1974Date of Patent: May 11, 1976Assignee: Asahi Kasei Kogyo Kabushiki KaishaInventors: Hiroshi Komoto, Kazuo Toyomoto, Kaoru Ohmura, Kenji Ito, Hideo Sekiguchi