Patents by Inventor Karel van der Mast
Karel van der Mast has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7777861Abstract: A method, system, and computer program product are provided for printing a pattern on a photosensitive surface using a maskless lithography system including a spatial light modulator (SLM). The method, system, and computer program product define two or more exposure areas within a predetermined region of the surface, each area corresponding to selected pixels of the SLM. An overlap region is formed between the two or more exposure areas, the overlapping region being defined by respective overlapping edges of the exposure areas, the overlapping edges corresponding to overlapping pairs of the selected pixels from each area. The pixels within each pair are alternately activated such that only one of the pixels within the pair is used to produce the pattern.Type: GrantFiled: August 9, 2007Date of Patent: August 17, 2010Assignee: ASML Holding N.V.Inventors: Azat Latypov, Karel Van Der Mast
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Publication number: 20070279742Abstract: A metrology tool is arranged to measure a parameter of a substrate that has been provided with a pattern in a lithographic apparatus. The metrology tool includes a base frame, a substrate table constructed and arranged to hold the substrate, a sensor constructed and arranged to measure a parameter of the substrate, a displacement system configured to displace the substrate table or the sensor with respect to the other in a first direction, a balance mass, and a bearing configured to movably support the first balance mass so as to be substantially free to translate in a direction opposite of the first direction in order to counteract a displacement of the substrate table or sensor in the first direction.Type: ApplicationFiled: May 21, 2007Publication date: December 6, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Reinder Plug, Arie Den Boef, Karel Van Der Mast
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Patent number: 7259831Abstract: A method and system are provided for printing a pattern on a photosensitive surface using a maskless lithography system including a spatial light modulator (SLM). The method includes defining two or more exposure areas within a predetermined region of the surface, each area corresponding to selected pixels of the SLM. An overlap region is formed between the two or more exposure areas, the overlapping region being defined by respective overlapping edges of the exposure areas, the overlapping edges corresponding to overlapping pairs of the selected pixels from each area. The pixels within each pair are alternately activated such that only one of the pixels within the pair is used to produce the pattern.Type: GrantFiled: April 4, 2006Date of Patent: August 21, 2007Assignee: ASML Holding, N.V.Inventors: Azat Latypov, Karel Van der Mast
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Publication number: 20070141191Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.Type: ApplicationFiled: December 21, 2005Publication date: June 21, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Yvonne Kruijt-Stegeman, Raymond Knaapen, Johan Dijksman, Krassimir Krastev, Sander Wuister, Aleksey Kolesnychenko, Karel Van Der Mast, Klaus Simon
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Publication number: 20070102844Abstract: A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is moveable between a first position located at or adjacent to the imprintable medium dispenser, and a second position located at or adjacent to the imprint template holder, and the second substrate table is moveable between the first and second positions, such that the first and second substrate tables swap positions.Type: ApplicationFiled: March 1, 2006Publication date: May 10, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Klaus Simon, Karel Van Der Mast, Johan Dijksman
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Patent number: 7167231Abstract: An aspect of the present invention includes a method for patterning a workpiece covered at least partly with a layer sensitive to electromagnetic radiation, comprising the actions of, providing a data representation of at least one image to be imaged onto a plurality of locations of said workpiece, fracturing said data representation into a plurality of field stripes, repeating the actions of rasterizing a first field stripe of said data representation, modulating a modulator according to said rasterized field stripe, imaging said first field stripe onto a plurality of locations of said workpiece, rasterizing a second field stripe of said data representation while imaging said first field stripe onto said plurality of locations of said workpiece, terminating the repetition when a predetermined amount of said image is imaged onto said plurality of locations of said workpiece. Other aspects of the present invention are reflected in the detailed description, figures and claims.Type: GrantFiled: March 19, 2003Date of Patent: January 23, 2007Assignee: Micronic Laser Systems ABInventors: Anders Thurén, Karel Van Der Mast, Arno Bleeker
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Publication number: 20060132742Abstract: A system and method are provided including different moveable lenses within a projection system that can be placed in the path of a radiation beam to change a magnification of the projection system. By changing the magnification of the projection system an area of a substrate exposed per pixel can be adjusted, and a throughput of the system optimized.Type: ApplicationFiled: December 17, 2004Publication date: June 22, 2006Applicant: ASML Netherland B.V.Inventors: Karel Van Der Mast, Kars Troost
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Patent number: 7046413Abstract: A system and method are used for pulse to pulse dose control in an illumination system, used, for example, in a lithography or a maskless lithography machine. The system and method can be used to decrease effective laser pulse-to-pulse variability in lithographic lasers, allowing adequate dose control using a minimum number of pulses (e.g. as little as one pulse).Type: GrantFiled: July 29, 2005Date of Patent: May 16, 2006Assignee: ASML Holding N.V.Inventors: Jason D. Hintersteiner, Karel van der Mast, Arno Jan Bleeker
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Patent number: 7023526Abstract: A method and system are provided for printing a pattern on a photosensitive surface using a maskless lithography system including a spatial light modulator (SLM). The method includes defining two or more exposure areas within a predetermined region of the surface, each area corresponding to selected pixels of the SLM. An overlap region is formed between the two or more exposure areas, the overlapping region being defined by respective overlapping edges of the exposure areas, the overlapping edges corresponding to overlapping pairs of the selected pixels from each area. The pixels within each pair are alternately activated such that only one of the pixels within the pair is used to produce the pattern.Type: GrantFiled: September 30, 2003Date of Patent: April 4, 2006Assignee: ASML Holding N.V.Inventors: Azat Latypov, Karel van der Mast
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Publication number: 20060055903Abstract: An aspect of the present invention includes a method for patterning a workpiece covered at least partly with a layer sensitive to electromagnetic radiation, comprising the actions of, providing a data representation of at least one image to be imaged onto a plurality of locations of said workpiece, fracturing said data representation into a plurality of field stripes, repeating the actions of rasterizing a first field stripe of said data representation, modulating a modulator according to said rasterized field stripe, imaging said first field stripe onto a plurality of locations of said workpiece, rasterizing a second field stripe of said data representation while imaging said first field stripe onto said plurality of locations of said workpiece, terminating the repetition when a predetermined amount of said image is imaged onto said plurality of locations of said workpiece. Other aspects of the present invention are reflected in the detailed description, figures and claims.Type: ApplicationFiled: March 19, 2003Publication date: March 16, 2006Applicants: Micronic Laser Systems AB, ASML Netherlands B.V.Inventors: Anders Thuren, Karel Van Der Mast, Arno Bleeker
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Publication number: 20060040187Abstract: Grayscale Optical Proximity Correction device features are added to a mask pattern by convoluting the device features with a two-dimensional correction kernel or two one-dimensional correction kernels to generate grayscale OPC features. The resulting pattern may be used in a projection lithography apparatus having a programmable patterning means that is adapted to generate three or more intensity levels.Type: ApplicationFiled: August 17, 2004Publication date: February 23, 2006Inventors: Kars Troost, Johannes Jacobus Baselmans, Karel Van Der Mast
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Patent number: 6989920Abstract: A system and method are used for pulse to pulse dose control in an illumination system, used, for example, in a lithography or a maskless lithography machine. The system and method can be used to decrease effective laser pulse-to-pulse variability in lithographic lasers, allowing adequate dose control using a minimum number of pulses (e.g. as little as one pulse).Type: GrantFiled: May 29, 2003Date of Patent: January 24, 2006Assignee: ASML Holding N.V.Inventors: Jason D. Hintersteiner, Karel van der Mast, Arno Bleeker
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Publication number: 20050286035Abstract: Lithographic apparatus providing a patterned beam of radiation in which radiation that is linearly polarized in a first direction has a first pattern and radiation that is linearly polarized in an orthogonal direction has a second pattern.Type: ApplicationFiled: June 28, 2004Publication date: December 29, 2005Inventors: Kars Troost, Karel Van Der Mast
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Publication number: 20050270613Abstract: A system and method are used for pulse to pulse dose control in an illumination system, used, for example, in a lithography or a maskless lithography machine. The system and method can be used to decrease effective laser pulse-to-pulse variability in lithographic lasers, allowing adequate dose control using a minimum number of pulses (e.g. as little as one pulse).Type: ApplicationFiled: July 29, 2005Publication date: December 8, 2005Applicant: ASML Holding N.V.Inventors: Jason Hintersteiner, Karel van der Mast, Arno Bleeker
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Publication number: 20050068509Abstract: A method and system are provided for printing a pattern on a photosensitive surface using a maskless lithography system including a spatial light modulator (SLM). The method includes defining two or more exposure areas within a predetermined region of the surface, each area corresponding to selected pixels of the SLM. An overlap region is formed between the two or more exposure areas, the overlapping region being defined by respective overlapping edges of the exposure areas, the overlapping edges corresponding to overlapping pairs of the selected pixels from each area. The pixels within each pair are alternately activated such that only one of the pixels within the pair is used to produce the pattern.Type: ApplicationFiled: September 30, 2003Publication date: March 31, 2005Inventors: Azat Latypov, Karel van der Mast
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Publication number: 20050062948Abstract: An imaging apparatus comprising: a radiation system for providing a projection beam of radiation; a support structure for supporting programmable patterning means, the programmable patterning means serving to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; a projection system for projecting the patterned beam onto a target portion of the substrate, wherein the apparatus further comprises: beam splitting means, provided between the programmable patterning means and the substrate table, serving to divert aside a portion of the patterned beam; image detection means, for analyzing said portion of the patterned beam.Type: ApplicationFiled: November 27, 2002Publication date: March 24, 2005Inventors: Karel Van Der Mast, Arno Bleeker
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Publication number: 20050012916Abstract: A lithographic projection apparatus comprises a microlens array for generating a plurality of source images in a two-dimensional array, a programmable patterning means having a plurality of addressable elements acting as shutters for the source images and a projection subsystem for projecting a n image of the array of source images onto a substrate.Type: ApplicationFiled: May 21, 2004Publication date: January 20, 2005Inventors: Karel Van Der Mast, Arno Bleeker, Cheng-Qun Gui, Johan Hoefnagels
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Publication number: 20040239907Abstract: A system and method are used for pulse to pulse dose control in an illumination system, used, for example, in a lithography or a maskless lithography machine. The system and method can be used to decrease effective laser pulse-to-pulse variability in lithographic lasers, allowing adequate dose control using a minimum number of pulses (e.g. as little as one pulse).Type: ApplicationFiled: May 29, 2003Publication date: December 2, 2004Applicant: ASML Holding N.V.Inventors: Jason D. Hintersteiner, Karel van der Mast, Arno Bleeker