Patents by Inventor Karen Elizabeth Petrillo
Karen Elizabeth Petrillo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11688636Abstract: A method of manufacturing a semiconductor device is provided. The method includes forming a plurality of metal lines on substrate, forming a sacrificial dielectric material layer between the metal lines, forming a hardmask over at least one of the metal lines, etching at least one of the metal lines that is not covered by the hardmask, treating the sacrificial dielectric material layer to soften the layer. The method also includes removing the treated sacrificial dielectric material layer.Type: GrantFiled: June 18, 2021Date of Patent: June 27, 2023Assignee: International Business Machines CorporationInventors: Somnath Ghosh, Karen Elizabeth Petrillo, Cody J. Murray, Ekmini Anuja De Silva, Chi-Chun Liu, Dominik Metzler, John Christopher Arnold
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Publication number: 20220406657Abstract: A method of manufacturing a semiconductor device is provided. The method includes forming a plurality of metal lines on substrate, forming a sacrificial dielectric material layer between the metal lines, forming a hardmask over at least one of the metal lines, etching at least one of the metal lines that is not covered by the hardmask, treating the sacrificial dielectric material layer to soften the layer. The method also includes removing the treated sacrificial dielectric material layer.Type: ApplicationFiled: June 18, 2021Publication date: December 22, 2022Inventors: SOMNATH GHOSH, Karen Elizabeth Petrillo, Cody J. Murray, Ekmini Anuja De Silva, Chi-Chun LIU, Dominik METZLER, John Christopher Arnold
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Patent number: 11067896Abstract: A method of optimizing a lithographic process for semiconductor fabrication includes determining that a semiconductor wafer experienced a photoresist exposure delay. At least one operating parameter of a post exposure baking process is adjusted based on the semiconductor wafer having experienced the photoresist exposure delay. The post exposure baking process is performed on the semiconductor wafer utilizing the adjusted at least one operating parameter.Type: GrantFiled: December 17, 2019Date of Patent: July 20, 2021Assignee: International Business Machines CorporationInventors: Cody John Murray, Ekmini Anuja De Silva, Alex Richard Hubbard, Karen Elizabeth Petrillo, Nelson Felix
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Publication number: 20200379354Abstract: A method of optimizing a lithographic process for semiconductor fabrication includes determining that a semiconductor wafer experienced a photoresist exposure delay. At least one operating parameter of a post exposure baking process is adjusted based on the semiconductor wafer having experienced the photoresist exposure delay. The post exposure baking process is performed on the semiconductor wafer utilizing the adjusted at least one operating parameter.Type: ApplicationFiled: December 17, 2019Publication date: December 3, 2020Applicant: International Business Machines CorporationInventors: Cody John MURRAY, Ekmini Anuja DE SILVA, Alex Richard HUBBARD, Karen Elizabeth PETRILLO, Nelson FELIX
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Patent number: 10545409Abstract: A method of optimizing a lithographic process for semiconductor fabrication includes determining that a semiconductor wafer experienced a photoresist exposure delay. At least one operating parameter of a post exposure baking process is adjusted based on the semiconductor wafer having experienced the photoresist exposure delay. The post exposure baking process is performed on the semiconductor wafer utilizing the adjusted at least one operating parameter.Type: GrantFiled: May 30, 2019Date of Patent: January 28, 2020Assignee: International Business Machines CorporationInventors: Cody John Murray, Ekmini Anuja De Silva, Alex Richard Hubbard, Karen Elizabeth Petrillo, Nelson Felix
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Patent number: 7807335Abstract: A method of forming an image in a photoresist layer. The method includes, providing a substrate; forming the photoresist layer over the substrate; forming a contamination gettering topcoat layer over the photoresist layer, the contamination gettering topcoat layer including one or more polymers and one or more cation complexing agents; exposing the photoresist layer to actinic radiation through a photomask having opaque and clear regions, the opaque regions blocking the actinic radiation and the clear regions being transparent to the actinic radiation, the actinic radiation changing the chemical composition of regions of the photoresist layer exposed to the radiation forming exposed and unexposed regions in the photoresist layer; and removing either the exposed regions of the photoresist layer or the unexposed regions of the photoresist layer. The contamination gettering topcoat layer includes one or more polymers, one or more cation complexing agents and a casting solvent.Type: GrantFiled: June 3, 2005Date of Patent: October 5, 2010Assignee: International Business Machines CorporationInventors: Daniel A. Corliss, Dario Gil, Dario Leonardo Goldfarb, Steven John Holmes, David Vaclav Horak, Kurt Rudolf Kimmel, Karen Elizabeth Petrillo, Dmitriy Shneyder
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Patent number: 7638266Abstract: A barrier layer for fabricating at least one of a device and a mask includes a polymeric photoacid generator formed between a substrate and a resist layer. The barrier layer may be used, for example, in forming a resist image, and forming a patterned material feature on a substrate.Type: GrantFiled: August 12, 2004Date of Patent: December 29, 2009Assignee: International Business Machines CorporationInventors: Marie Angelopoulos, Gregory Breyta, Wu-Song Huang, Robert Neal Lang, Wenjie Li, David R. Medeiros, Wayne Martin Moreau, Karen Elizabeth Petrillo
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Patent number: 7168224Abstract: The present invention includes a packaged coated workpiece. The packaged coated workpiece has: (1) a workpiece coated with a resist film sensitive to optical radiation, particulates or chemical contaminants; (2) an inner barrier sealed to enclose the coated workpiece and optionally a first getter agent, to produce a sealed first enclosure; and (3) an outer barrier sealed to enclose the sealed first enclosure and optionally a second getter agent, provided that the packaged coated workpiece has at least one getter agent, to produce a packaged coated workpiece suitable for storage for a period of at least one week without substantial loss of sensitivity, resolution or performance. The present invention also includes a process for preparing a packaged coated workpiece and a method of increasing the storage time of a coated workpiece to at least one week without substantial loss of sensitivity, resolution or performance.Type: GrantFiled: November 15, 2002Date of Patent: January 30, 2007Assignee: International Business Machines CorporationInventors: Marie Angelopoulos, Wu-Song Huang, Ranee Wai-Ling Kwong, David Robert Medeiros, Wayne Martin Moreau, Karen Elizabeth Petrillo, Herman Russell Wendt, Christopher Karl Magg
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Publication number: 20040045866Abstract: The present invention includes a packaged coated workpiece. The packaged coated workpiece has: (1) a workpiece coated with a resist film sensitive to optical radiation, particulates or chemical contaminants; (2) an inner barrier sealed to enclose the coated workpiece and optionally a first getter agent, to produce a sealed first enclosure; and (3) an outer barrier sealed to enclose the sealed first enclosure and optionally a second getter agent, provided that the packaged coated workpiece has at least one getter agent, to produce a packaged coated workpiece suitable for storage for a period of at least one week without substantial loss of sensitivity, resolution or performance. The present invention also includes a process for preparing a packaged coated workpiece and a method of increasing the storage time of a coated workpiece to at least one week without substantial loss of sensitivity, resolution or performance.Type: ApplicationFiled: November 15, 2002Publication date: March 11, 2004Applicant: International Business Machines CorporationInventors: Marie Angelopoulos, Wu-Song Huang, Ranee Wai-Ling Kwong, David Robert Medeiros, Wayne Martin Moreau, Karen Elizabeth Petrillo, Herman Russell Wendt, Christopher Karl Magg
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Patent number: 6543617Abstract: The present invention includes a packaged coated workpiece. The packaged coated workpiece has: (1) a workpiece coated with a resist film sensitive to optical radiation, particulates or chemical contaminants; (2) an inner barrier sealed to enclose the coated workpiece and optionally a first getter agent, to produce a sealed first enclosure; and (3) an outer barrier sealed to enclose the sealed first enclosure and optionally a second getter agent, provided that the packaged coated workpiece has at least one getter agent, to produce a packaged coated workpiece suitable for storage for a period of at least one week without substantial loss of sensitvity, resolution or performance. The present invention also includes a process for preparing a packaged coated workpiece and a method of increasing the storage time of a coated workpiece to at least one week without substantial loss of sensitivity, resolution or performance.Type: GrantFiled: March 9, 2001Date of Patent: April 8, 2003Assignee: International Business Machines CorporationInventors: Marie Angelopoulos, Wu-Song Huang, Ranee Wai-Ling Kwong, David Robert Medeiros, Wayne Martin Moreau, Karen Elizabeth Petrillo, Herman Russell Wendt, Christopher Karl Magg
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Publication number: 20030019782Abstract: The present invention includes a packaged coated workpiece. The packaged coated workpiece has: (1) a workpiece coated with a resist film sensitive to optical radiation, particulates or chemical contaminants; (2) an inner barrier sealed to enclose the coated workpiece and optionally a first getter agent, to produce a sealed first enclosure; and (3) an outer barrier sealed to enclose the sealed first enclosure and optionally a second getter agent, provided that the packaged coated workpiece has at least one getter agent, to produce a packaged coated workpiece suitable for storage for a period of at least one week without substantial loss of sensitvity, resolution or performance. The present invention also includes a process for preparing a packaged coated workpiece and a method of increasing the storage time of a coated workpiece to at least one week without substantial loss of sensitivity, resolution or performance.Type: ApplicationFiled: March 9, 2001Publication date: January 30, 2003Applicant: IBM CorporationInventors: Marie Angelopoulos, Wu-Song Huang, Ranee Wai-Ling Kwong, David Robert Medeiros, Wayne Martin Moreau, Karen Elizabeth Petrillo, Herman Russell Wendt, Christopher Karl Magg
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Patent number: 6221568Abstract: The present invention is directed to developer compositions for poly-alpha-acrylate or methacrylate based resists giving high contrast and whose components are closely matched in boiling points. The use of the present developer improved the critical dimensional uniformity of images developed in a positive electron beam resist. More particularly, the present invention is directed to developer formulations whose compositions are directed to enhanced printed linearity, better across the plate uniformity, and improved contrast of the imaged positive resists. Such a improved developer can be used for the positive resist exposed by photons, electrons, ions, or X-rays.Type: GrantFiled: October 20, 1999Date of Patent: April 24, 2001Assignee: International Business Machines CorporationInventors: Marie Angelopoulos, Wayne Martin Moreau, Karen Elizabeth Petrillo
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Patent number: 5908732Abstract: Positive lithographic patterns are produced by imagewise exposing to actinic light, x-ray or e-beam copolymers of 2-hydroxyalkyl methacrylate and/or 2-hydroxyalkyl acrylate with alkylmethacrylate and/or alkylacrylate, and then developing the polymer in a developer.Type: GrantFiled: September 23, 1996Date of Patent: June 1, 1999Assignee: International Business Machines CorporationInventors: Ari Aviram, Karen Elizabeth Petrillo, Andrew T. S. Pomerene, David Earle Seeger
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Patent number: 5770345Abstract: The sensitivity of a photoresist to actinic light is improved by the addition of certain dyes. The photoresist includes a polymer matrix, a photosensitive acid generator and at least one compound selected from the group consisting of dyes containing at least one heterosulphur atom such as 2,2.sup.1,5.sup.1,2"-terthiophene and its derivatives; thianthrene and its derivatives, and 4,6-diphenylthieno(3,4-d)-1,3-dioxol-2-one-5,5-dioxide; phenylsulfone and its derivatives; and 4,5-diphenyl-1,3-dioxol-2-one; 3,4-bis(acetoxymethyl)furan; chelidonic acid and its derivatives; and 5,7,12,14-pentacenetetrone. Resist images on a substrate are formed from the compositions.Type: GrantFiled: July 16, 1996Date of Patent: June 23, 1998Assignee: International Business Machines CorporationInventors: Edward Darko Babich, Karen Elizabeth Petrillo, John Patrick Simons, David Earle Seeger
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Patent number: 5753412Abstract: The sensitivity of a photoresist to actinic light is improved by the addition of certain dyes. The photoresist includes a polymer matrix, a photosensitive acid generator and at least one compound selected from the group consisting of dyes containing at least one heterosulphur atom such as 2,2.sup.1,5.sup.1,2"-terthiophene and its derivatives; thianthrene and its derivatives, and 4,6-diphenylthieno(3,4-d)-1,3-dioxol-2-one-5,5-dioxide; phenylsulfone and its derivatives; and 4,5-diphenyl-l,3-dioxol-2-one; 3,4-bis(acetoxymethyl)furan; chelidonic acid and its derivatives; and 5,7,12,14-pentacenetetrone. Resist images on a substrate are formed from the compositions.Type: GrantFiled: June 5, 1996Date of Patent: May 19, 1998Assignee: International Business Machines CorporationInventors: Edward Darko Babich, Karen Elizabeth Petrillo, John Patrick Simons, David Earle Seeger