Abstract: Devices including multiple undercut profiles in a single material are disclosed. A resist pattern is applied over a work piece and a wet etch is performed to produce an undercut in the material. This first wet etch is followed by a polymerizing dry etch that produces a polymer film in the undercut created by the first wet etch. The polymer film prevents further etching of the undercut portion during a second wet etch. Thus, an undercut profile can be obtained having a larger undercut in an underlying portion of the work piece, utilizing only a single resist application step. The work piece may be a multi-layer work piece having different layers formed of the same material, or it may be a single layer of material.

Abstract: A process for producing multiple undercut profiles in a single material. A resist pattern is applied over a work piece and a wet etch is performed to produce an undercut in the material. This first wet etch is followed by a polymerizing dry etch that produces a polymer film in the undercut created by the first wet etch. The polymer film prevents further etching of the undercut portion during a second wet etch. Thus, an undercut profile can be obtained having a larger undercut in an underlying portion of the work piece, utilizing only a single resist application step. The work piece may be a multi-layer work piece having different layers formed of the same material, or it may be a single layer of material.

Abstract: A method and apparatus for cleaning and sealing components of a display utilizes continuous isolation of the components between the cleaning step and the sealing step. This limits exposure of the components to contaminants and isolates the components from oxidizing agents which can cause an oxide to form on the surface of one or more of the components. In one embodiment, a high vacuum transfer station couples a cleaning station and a sealing station to allow a component to be transferred from the cleaning station to the sealing station without leaving the high vacuum. In another embodiment, the apparatus includes a conveyor transferring the components from the cleaning station at a high vacuum to the sealing station at a similarly high vacuum without exposure to the atmosphere.

Abstract: A method and apparatus for cleaning and sealing components of a display utilizes continuous isolation of the components between the cleaning step and the sealing step. This limits exposure of the components to contaminants and isolates the components from oxidizing agents which can cause an oxide to form on the surface of one or more of the components. In one embodiment, a high vacuum transfer station couples a cleaning station and a sealing station to allow a component to be transferred from the cleaning station to the sealing station without leaving the high vacuum. In another embodiment, the apparatus includes a conveyor transferring the components from the cleaning station at a high vacuum to the sealing station at a similarly high vacuum without exposure to the atmosphere.

Abstract: A process for producing multiple undercut profiles in a single material. A resist pattern is applied over a work piece and a wet etch is performed to produce an undercut in the material. This first wet etch is followed by a polymerizing dry etch that produces a polymer film in the undercut created by the first wet etch. The polymer film prevents further etching of the undercut portion during a second wet etch. Thus, an undercut profile can be obtained having a larger undercut in an underlying portion of the work piece, utilizing only a single resist application step. The work piece may be a multi-layer work piece having different layers formed of the same material, or it may be a single layer of material.

Abstract: A method and apparatus for cleaning and sealing components of a display utilizes continuous isolation of the components between the cleaning step and the sealing step. This limits exposure of the components to contaminants and isolates the components from oxidizing agents which can cause an oxide to form on the surface of one or more of the components. In one embodiment, a high vacuum transfer station couples a cleaning station and a sealing station to allow a component to be transferred from the cleaning station to the sealing station without leaving the high vacuum. In another embodiment, the apparatus includes a conveyor transferring the components from the cleaning station at a high vacuum to the sealing station at a similarly high vacuum without exposure to the atmosphere.

Abstract: A process for producing multiple undercut profiles in a single material. A resist pattern is applied over a work piece and a wet etch is performed to produce an undercut in the material. This first wet etch is followed by a polymerizing dry etch which produces a polymer film in the undercut created by the first wet etch. The polymer film prevents further etching of the undercut portion during a second wet etch. Thus, an undercut profile can be obtained having a larger undercut in an underlying portion of the work piece, utilizing only a single resist application step. The work piece may be a multi-layer work piece having different layers formed of the same material, or it may be a single layer of material.

Abstract: A process for producing multiple undercut profiles in a single material. A resist pattern is applied over a work piece and a wet etch is performed to produce an undercut in the material. This first wet etch is followed by a polymerizing dry etch which produces a polymer film in the undercut created by the first wet etch. The polymer film prevents further etching of the undercut portion during a second wet etch. Thus, an undercut profile can be obtained having a larger undercut in an underlying portion of the work piece, utilizing only a single resist application step. The work piece may be a multilayer work piece having different layers formed of the same material, or it may be a single layer of material. The process can be used to manufacture a base structure for a conical cathode emitter tip.

Abstract: A process for producing multiple undercut profiles in a single material. A resist pattern is applied over a work piece and a wet etch is performed to produce an undercut in the material. This first wet etch is followed by a polymerizing dry etch which produces a polymer film in the undercut created by the first wet etch. The polymer film prevents further etching of the undercut portion during a second wet etch. Thus, an undercut profile can be obtained having a larger undercut in an underlying portion of the work piece, utilizing only a single resist application step. The work piece may be a multi-layer work piece having different layers formed of the same material, or it may be a single layer of material.

Abstract: A process for producing multiple undercut profiles in a single material. A resist pattern is applied over a work piece and a wet etch is performed to produce an undercut in the material. This first wet etch is followed by a polymerizing dry etch which produces a polymer film in the undercut created by the first wet etch. The polymer film prevents further etching of the undercut portion during a second wet etch. Thus, an undercut profile can be obtained having a larger undercut in an underlying portion of the work piece, utilizing only a single resist application step. The work piece may be a multi-layer work piece having different layers formed of the same material, or it may be a single layer of material.

Abstract: An application specific field emission display includes one or more extended emitters. The emitters are patterned according to a selected image where the selected image depends upon the application. In one embodiment, an emitter is patterned in a serpentine pattern to provide a single block of illumination. In another application, emitters are grouped in threes and the emitters are driven respectively by the red, green, and blue components of an image signal to produce a multicolor display. In a display assembly according to the invention, application specific emitters are incorporated in subdisplays on a common substrate with a conventional matrix addressable array. The array provides video, graphical or textual information and the subdisplays provide textual, fixed-shaped graphical, numerical or colorized information.