Patents by Inventor Karin Kurth

Karin Kurth has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for producing a mask layout avoiding imaging errors for a mask
    Publication number: 20060177744
    Abstract: A method for producing a final mask layout (20?) avoids imaging errors. A provisional auxiliary mask layout (110) is produced, in particular in accordance with a predefined electrical circuit diagram, and is converted into the final mask layout (20?) with the aid of an OPC method. A main structure (120, 130) of the provisional auxiliary mask layout (110) is assigned optically non-resolvable auxiliary structures (160, 320). Exclusively the optically non-resolvable auxiliary structures (160, 320) are altered in the context of the OPC method, and the main structure (120, 130) itself remains unaltered.
    Type: Application
    Filed: January 13, 2006
    Publication date: August 10, 2006
    Inventors: Christof Bodendorf, Karin Kurth, Christian Meyne, Eva Nash