Abstract: The present invention relates to a photo-curable polymer composition comprising (a) a first block copolymer comprising at least two blocks A of polymerised monovinyl aromatic monomer, at least one internal block B of polymerised conjugated diene monomer, and at least one tapered or random block C of polymerised monovinyl aromatic monomer and polymerised conjugated diene monomer and/or at least one block D which may be a block of polymerised conjugated diene monomer or a tapered or random block of polymerised monovinyl aromatic monomer and polymerised conjugated diene monomer, wherein block C is an internal polymer block adjacent a terminal block A or an internal block A which is adjacent to a terminal block D, and block D is a terminal block adjacent an internal block A, and, optionally, a residue of a coupling agent, wherein the residue, if present, is derived from a coupling agent containing alkoxy or epoxy functional groups; and (b) a photo-initiator.

Abstract: Radiation sensitive block copolymers to be used in hot melt adhesive composition characterized in that they have the general formula (AB).sub.p (B.sup.1).sub.q X, wherein A is poly(vinylaromatic) block and B and B.sup.1 are poly(butadiene) blocks, wherein X is the residue of a hexavalent coupling agent, wherein p and q both have a number average value in the range from 1.5 to 4.5, whereas the sum of p and q values being 6, wherein the block copolymers have an average bound vinyl aromatic content in the range of from 10 to 50 wt %, preferably in the range of from 10 to 30 wt %, a total apparent molecular weight in the range of from 100,000 to 500,000, and a vinyl content in the poly(butadiene) blocks in the range of from 35 to 70 wt %.

Abstract: Block copolymers suitable for hot melt adhesive composition characterized in that they have the general formula (AB).sub.p (B.sup.1).sub.q X, wherein A is poly(vinylaromatic) block and B and B.sup.1 are the same or different poly(butadiene) blocks, wherein the 1,2 addition (vinyl) content is in the range of from 25 to 70% by weight, wherein X is the residue of a multivalent coupling agent having a maximum of active sites (m) in the range of from 3 to 6, wherein p and q both are integers of from 0 to m, provided that the sum of p and q values is less than m and the coupling efficiency is less than 90%, said block copolymer having an average total vinyl aromatic content in the range of from 10 to 50 wt % and preferably in the range of from 10 to 30 wt %, and having a total apparent molecular weight in the range of from 100,000 to 500,000.