Patents by Inventor Karin Preissner

Karin Preissner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5648195
    Abstract: A radiation-sensitive resist composition for manufacturing highly resolved relief structures is characterized by the following components:a film-forming base polymer;a radiation-active component that releases an acid when irradiated;a radiation-sensitive ester-former; anda solvent.
    Type: Grant
    Filed: January 5, 1995
    Date of Patent: July 15, 1997
    Assignee: Siemens Aktiengesellschaft
    Inventors: Michael Sebald, Siegfried Birkle, Karin Preissner, Hans-Jurgen Bestmann