Abstract: A method for depositing, under vacuum, an amorphous layer primarily containing fluorine and carbon onto a substrate (9), characterized in that it comprises a step for depositing this layer with an ion gun (1) for ejecting ions in the form of a beam of accelerated ions that is created from at least one compound containing fluorine and carbon in a gaseous form or saturated vapor supplied to the ion canon. A method of this type makes it possible, in particular, to improve the adherence of an outer layer having a low index of refraction to the underlying layer of an anti-reflective stack. A device suited for carrying out the method is also described.

Abstract: The invention relates to an article comprising a substrate having at least one main surface coated with a multilayer interference coating, said coating containing a layer A having a refractive index less than or equal to 1.55. The article is characterised in that: layer A forms either the outer interference coating layer or an intermediate layer that is in direct contact with the outer interference coating layer, said outer interference coating layer being a layer B having a refractive index less than or equal to 1.55; layer A is obtained by ion beam deposition of activated species from at least one compound C in gaseous form and containing in its structure at least one silicon atom, at least one carbon atom, at least one hydrogen atom and, optionally, at least one nitrogen atom and/or at least one oxygen atom, layer A being deposited in the presence of nitrogen and/or oxygen when compound A does not contain nitrogen and/or oxygen; and layer A is not formed from inorganic precursor compounds.

Abstract: Process for manufacturing of an optical article which comprises: making available an organic substrate based on an organic polymer having a degree of water uptake of greater than or equal to 0.6% by weight, with respect to the total weight of the substrate, the degree of water uptake being equal to the weight of water absorbed by the material after drying and then storing for 800 hours in a chamber at 50° C. under a relative humidity of 100% and at atmospheric pressure; forming a hard abrasion-resistant coating on the substrate by heating the substrate at a temperature of greater than or equal to 90° C. for a period of time of at least 20 minutes; exposing the substrate covered with the hard abrasion-resistant coating to a humid atmosphere, so as to restore, to the organic substrate, the water evaporated during stage; and depositing of a water-impermeable inorganic coating by vacuum evaporation.

Abstract: This invention relates to an optical article having antistatic and antireflection or reflective properties, comprising a substrate having at least one main surface coated with an antireflection or reflective coating, said coating comprising at least one electrically conductive layer comprising at least 30% tin oxide (SnO2) by weight relative to the total weight of the electrically conductive layer, said electrically conductive layer having been deposited by ion-assisted deposition, and said substrate having a water uptake rate equal to or greater than 0.6% by weight relative to the total weight of said substrate, the water uptake rate being measured after predrying said substrate and then storing it for 800 hours in a chamber at 50° C. under 100% relative humidity and at atmospheric pressure.

Abstract: Process for manufacturing of an optical article which comprises: making available an organic substrate based on an organic polymer having a degree of water uptake of greater than or equal to 0.6% by weight, with respect to the total weight of the substrate, the degree of water uptake being equal to the weight of water absorbed by the material after drying and then storing for 800 hours in a chamber at 50° C. under a relative humidity of 100% and at atmospheric pressure; forming a hard abrasion-resistant coating on the substrate by heating the substrate at a temperature of greater than or equal to 90° C. for a period of time of at least 20 minutes; exposing the substrate covered with the hard abrasion-resistant coating to a humid atmosphere, so as to restore, to the organic substrate, the water evaporated during stage; and depositing of a water-impermeable inorganic coating by vacuum evaporation.

Abstract: This invention relates to an optical article having antistatic and antireflection or reflective properties, comprising a substrate having at least one main surface coated with an antireflection or reflective coating, said coating comprising at least one electrically conductive layer comprising at least 30% tin oxide (SnO2) by weight relative to the total weight of the electrically conductive layer, said electrically conductive layer having been deposited by ion-assisted deposition, and said substrate having a water uptake rate equal to or greater than 0.6% by weight relative to the total weight of said substrate, the water uptake rate being measured after predrying said substrate and then storing it for 800 hours in a chamber at 50° C. under 100% relative humidity and at atmospheric pressure.

Abstract: The invention relates to an optical article provided with antireflection properties, comprising a substrate having at least one main surface coated with an antireflection coating comprising, starting from the substrate: a sub-layer comprising two adjacent layers formed from the same material, the sum of the thicknesses of the two adjacent layers being greater than or equal to 75 nm; and a multilayered antireflection stack comprising at least one high refractive index layer and at least one low refractive index layer, the deposition of the first of said two adjacent layers of the sub-layer having been carried out without ion assistance and the deposition of the second of said two adjacent layers of the sub-layer having been carried out under ion assistance. The invention also relates to a process for manufacturing such an optical article.

Abstract: A method for depositing, under vacuum, an amorphous layer primarily containing fluorine and carbon onto a substrate (9), characterized in that it comprises a step for depositing this layer with an ion gun (1) for ejecting ions in the form of a beam of accelerated ions that is created from at least one compound containing fluorine and carbon in a gaseous form or saturated vapor supplied to the ion canon. A method of this type makes it possible, in particular, to improve the adherence of an outer layer having a low index of refraction to the underlying layer of an anti-reflective stack. A device suited for carrying out the method is also described.

Abstract: Method for treating antireflection coatings on an optical substrate (17) involves a stage for carrying out the physical vacuum-deposit of a fluorinated polymer-containing layer having a low refractive index and is characterised in that the stage includes in deposing a silicium or magnesium fluoride/fluorinated polymer hybrid layer (21d) by simultaneous vacuum evaporation of silicium or magnesium fluoride and the fluorinated polymer, In a preferred embodiment, the fluorinated polymer is embodied in the form of a polymer or tetrafluorethylen polymer and the components are evaporated by a Joule effect or by electron bombardment. The method is advantageously used for improving the adherence of a low refractive index layer to a subjacent layer of a pile of antireflection coatings which is deposited on any optical substrate or the inventive substrate. The substrate produced by the method and a device for carrying out the method are also disclosed.

Abstract: The method according to the invention comprises forming on a SiOxFy layer a silica SiO2 and/or metal oxide protective layer obtained through ion beam-assisted vapor phase deposition, comprising bombarding the layer being formed with a beam of positive ions formed from a rare gas, oxygen or a mixture of two or more of such gases, or through cathodic sputtering of a silicon or metal layer followed by an oxidation step of the silicon or the metal layer. Application to the production of antireflection coatings.

Abstract: The invention concerns a method comprising evaporating silicon and/or SiOx, wherein said evaporating is further defined as occurring in the presenceof oxygen if silicon or SiOx with x less than two is being evaporated, to form a silicon oxide film at the surface of a substrate and in bombarding said silicon film, while it is being formed, with a beam of positive ions derived from both a polyfluorocarbon compound and a rare gas. The invention is useful for producing low-index antiglare films.

Abstract: The invention concerns a method which consists in evaporating silicon oxide to form a silicon oxide film at the surface of a substrate and in bombarding said silicon film, while it is being formed, with a beam of positive ions derived from both a polyfluorocarbon compound and a rare gas. The invention is useful for producing low-index antiglare films.