Patents by Inventor Karin Schlicht

Karin Schlicht has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for the removal of an imaging layer from a semiconductor substrate stack
    Patent number: 7011935
    Abstract: Processes to overcome mistakes, such as, incorrect film thicknesses, poor coating quality, and incorrect feature dimensions made during the lithographic process in multilayer imaging systems are provided. To optimize manufacturing efficiency, it is desirable to be able to remove the top layer (an imaging layer) without having to remove, recoat, and usually cure the bottom layer (undercoat or underlayer). A rework process for removing an imaging layer from a substrate stack is such a process. The stack comprises a substrate, an underlayer adjacent to the substrate, and an imaging layer comprising silicon adjacent to the underlayer.
    Type: Grant
    Filed: September 18, 2003
    Date of Patent: March 14, 2006
    Assignee: Arch Specialty Chemicals, Inc.
    Inventors: Karin Schlicht, John Biafore, Mario Reybrouck
  • Method for the removal of an imaging layer from a semiconductor substrate stack
    Publication number: 20040116312
    Abstract: Processes to overcome mistakes, such as, incorrect film thicknesses, poor coating quality, and incorrect feature dimensions made during the lithographic process in multilayer imaging systems are provided. To optimize manufacturing efficiency, it is desirable to be able to remove the top layer (an imaging layer) without having to remove, recoat, and usually cure the bottom layer (undercoat or underlayer). A rework process for removing an imaging layer from a substrate stack is such a process. The stack comprises a substrate, an underlayer adjacent to the substrate, and an imaging layer comprising silicon adjacent to the underlayer.
    Type: Application
    Filed: September 18, 2003
    Publication date: June 17, 2004
    Applicant: Arch Specialty Chemicals, Inc.
    Inventors: Karin Schlicht, John Biafore, Mario Reybrouck
  • Wet etch compatible deep UV photoresist compositions
    Publication number: 20020164548
    Abstract: Wet etch processes utilize compatible deep UV photoresist compositions having binder resins that are either:
    Type: Application
    Filed: February 15, 2002
    Publication date: November 7, 2002
    Applicant: ARCH SPECIALTY CHEMICALS, INC.
    Inventors: Sanjay Malik, Karin Schlicht, Michelle Elderkin, Stefano Volpi