Abstract: A small-sized, portable enclosure protects a gas sensor against degradation due to environmental exposure and changes in atmospheric conditions. The protective enclosure includes an inlet for introduction of a gas into the enclosure, an outlet for release of the gas upon completion of a sensing run, and a number of in-line filters that remove from the inflowing gas sample analytes, contaminants, and other materials that can compromise the integrity of the sensor or cause the sensor to degrade over time. The enclosure does not include any filters during the measurement phase of the sensing run in order to allow the gas sensor to accurately measure an unmodified gas mixture and/or analyte.

Abstract: A small-sized, portable enclosure protects a gas sensor against degradation due to environmental exposure and changes in atmospheric conditions. The protective enclosure includes an inlet for introduction of a gas into the enclosure, an outlet for release of the gas upon completion of a sensing run, and a number of in-line filters that remove from the inflowing gas sample analytes, contaminants, and other materials that can compromise the integrity of the sensor or cause the sensor to degrade over time. The enclosure does not include any filters during the measurement phase of the sensing run in order to allow the gas sensor to accurately measure an unmodified gas mixture and/or analyte.

Abstract: A method of preparing electronically conductive polyaniline that forms a self-supporting dispersion in water is described. The binder-free dispersion was coated on a pair of interdigitated metal electrodes to form a gas sensing layer of a chemical sensor. The chemical sensor utilizes electrochemical impedance spectroscopy (EIS) to detect and characterize a chemical compound in a gaseous state in contact with the sensing layer. Impedance of the sensing layer is measured over a range of alternating current frequencies. The impedance data allows identification and concentration of the chemical compound to be determined when compared to reference impedance data. The analysis of the impedance measurements is adaptable to machine learning.

Abstract: Embodiments are disclosed for a method for generating a metal-oxide film. The method includes providing a metal ligand complex having a metal and a reactive moiety. The metal ligand complex is dissolved in a solvent that coats at least part of a substrate. Additionally, the method includes inducing a combustion process involving the metal ligand complex, in the absence of any additional fuel, to generate a film that is formed over at least part of the substrate. The film includes an oxide of the metal.

Abstract: A small-sized, portable enclosure protects a gas sensor against degradation due to environmental exposure and changes in atmospheric conditions. The protective enclosure includes an inlet for introduction of a gas into the enclosure, an outlet for release of the gas upon completion of a sensing run, and a number of in-line filters that remove from the inflowing gas sample analytes, contaminants, and other materials that can compromise the integrity of the sensor or cause the sensor to degrade over time. The enclosure does not include any filters during the measurement phase of the sensing run in order to allow the gas sensor to accurately measure an unmodified gas mixture and/or analyte.

Abstract: The present invention relates to a composition comprising a photoresist polymer and a fluoropolymer. In one embodiment, the fluoropolymer comprises a first monomer having a pendant group selected from alicyclic bis-hexafluoroisopropanol and aryl bis-hexafluoroisopropanol and preferably a second monomer selected from fluorinated styrene and fluorinated vinyl ether. The invention composition has improved receding contact angles with high refractive index hydrocarbon fluids used in immersion lithography and, thereby, provides improved performance in immersion lithography.

Abstract: Resist compositions that can be used in immersion lithography without the use of an additional topcoat are disclosed. The resist compositions comprise a photoresist polymer, at least one photoacid generator, a solvent; and a self-topcoating resist additive. A method of forming a patterned material layer on a substrate using the resist composition is also disclosed.

Abstract: A method of forming a layered structure comprising a domain pattern of a self-assembled material utilizes a negative-tone patterned photoresist layer comprising non-crosslinked developed photoresist. The developed photoresist is not soluble in an organic casting solvent for a material capable of self-assembly. The developed photoresist is soluble in an aqueous alkaline developer and/or a second organic solvent. A solution comprising the material capable of self-assembly and the organic casting solvent is casted on the patterned photoresist layer. Upon removal of the organic casting solvent, the material self-assembles, thereby forming the layered structure.

Abstract: A method of forming an image on a photoresist. The method includes: forming a photoresist over a substrate; applying a topcoat composition, the topcoat composition comprising at least one fluorine-containing polymer and a casting solvent, onto the photoresist; removing the casting solvent of the topcoat composition resulting in the formation of a topcoat material over the photoresist; exposing the photoresist to radiation, the radiation changing a chemical composition of the regions of the photoresist exposed to the radiation, forming exposed and unexposed regions in the photoresist; and removing i) the topcoat material and ii) the exposed regions of the photoresist or the unexposed regions of the photoresist.

Abstract: A water dispersible composition comprises a polyaniline copolymer having a weight average molecular weight of at least 30,000 and a polymeric acid comprising sulfonic acid groups. The polyaniline copolymer comprises i) about 10 mol % to about 15 mol % of a fluorine-containing first aniline repeat unit based on total moles of repeat units in the polyaniline copolymer, and ii) a second aniline repeat unit comprising no fluorine. The sulfonic acid groups of the polymeric acid are present in a molar amount greater than or equal to total moles of repeat units of the polyaniline copolymer. The composition has a conductivity of at least 0.0001 S/cm.

Abstract: Compositions are disclosed having the formula (3): [C?]k[Ta(O2)x(L?)y]??(3), wherein x is an integer of 1 to 4, y is an integer of 1 to 4, Ta(O2)x(L?)y has a charge of 0 to ?3, C? is a counterion having a charge of +1 to +3, k is an integer of 0 to 3, L? is an oxidatively stable organic ligand having a charge of 0 to ?4, and L? comprises an electron donating functional group selected from the group consisting of carboxylates, alkoxides, amines, amine oxides, phosphines, phosphine oxides, arsine oxides, and combinations thereof. The compositions have utility as high resolution photoresists.

Abstract: A water dispersible composition comprises a polyaniline copolymer having a weight average molecular weight of at least 30,000 and a polymeric acid comprising sulfonic acid groups. The polyaniline copolymer comprises i) about 10 mol % to about 15 mol % of a fluorine-containing first aniline repeat unit based on total moles of repeat units in the polyaniline copolymer, and ii) a second aniline repeat unit comprising no fluorine. The sulfonic acid groups of the polymeric acid are present in a molar amount greater than or equal to total moles of repeat units of the polyaniline copolymer. The composition has a conductivity of at least 0.0001 S/cm.

Abstract: Compositions are disclosed having the formula (3): [C?]k[Ta(O2)x(L?)y]??(3), wherein x is an integer of 1 to 4, y is an integer of 1 to 4, Ta(O2)x(L?)y has a charge of 0 to ?3, C? is a counterion having a charge of +1 to +3, k is an integer of 0 to 3, L? is an oxidatively stable organic ligand having a charge of 0 to ?4, and L? comprises an electron donating functional group selected from the group consisting of carboxylates, alkoxides, amines, amine oxides, phosphines, phosphine oxides, arsine oxides, and combinations thereof. The compositions have utility as high resolution photoresists.

Abstract: The present invention provides chemically amplified silsesquioxane polymers for preparing masks using e-beam lithography. The silsesquioxane polymers have reactive sidechains that in the presence of an acid undergo acid catalyzed rearrangement to generate reactive functionalities that crosslink to form Si—O—Si bonds. The reactive side-chains comprise ?- and ?-substituted alkyl groups bound to the silicon of the silsesquioxane polymer. The substituent of the ?- and ?-substituted alkyl group is an electron withdrawing group. Resists generated with the chemically amplified silsesquioxane polymers of the present invention and imaged with e-beams have resolution of ?60 nm line/space.

Abstract: The present invention relates to a composition comprising a photoresist polymer and a fluoropolymer. In one embodiment, the fluoropolymer comprises a first monomer having a pendant group selected from alicyclic bis-hexafluoroisopropanol and aryl bis-hexafluoroisopropanol and preferably a second monomer selected from fluorinated styrene and fluorinated vinyl ether. The invention composition has improved receding contact angles with high refractive index hydrocarbon fluids used in immersion lithography and, thereby, provides improved performance in immersion lithography.

Abstract: A method of forming an image on a photoresist. The method includes: forming a photoresist over a substrate; applying a topcoat composition, the topcoat composition comprising at least one fluorine-containing polymer and a casting solvent, onto the photoresist; removing the casting solvent of the topcoat composition resulting in the formation of a topcoat material over the photoresist; exposing the photoresist to radiation, the radiation changing a chemical composition of the regions of the photoresist exposed to the radiation, forming exposed and unexposed regions in the photoresist; and removing i) the topcoat material and ii) the exposed regions of the photoresist or the unexposed regions of the photoresist.

Abstract: The present invention provides chemically amplified silsesquioxane polymers for preparing masks using e-beam lithography. The silsesquioxane polymers have reactive sidechains that in the presence of an acid undergo acid catalyzed rearrangement to generate reactive functionalities that crosslink to form Si—O—Si bonds. The reactive side-chains comprise ?- and ?-substituted alkyl groups bound to the silicon of the silsesquioxane polymer. The substituent of the ?- and ?-substituted alkyl group is an electron withdrawing group. Resists generated with the chemically amplified silsesquioxane polymers of the present invention and imaged with e-beams have resolution of ?60 nm line/space.

Abstract: A topcoat composition. The topcoat composition includes a fluorine-containing polymer and a casting solvent that includes an alcohol.

Abstract: A method of forming an image on a photoresist. The method includes: forming a photoresist over a substrate; applying a topcoat composition, the topcoat composition comprising at least one fluorine-containing polymer and a casting solvent, onto the photoresist; removing the casting solvent of the topcoat composition resulting in the formation of a topcoat material over the photoresist; exposing the photoresist to radiation, the radiation changing a chemical composition of the regions of the photoresist exposed to the radiation, forming exposed and unexposed regions in the photoresist; and removing i) the topcoat material and ii) the exposed regions of the photoresist or the unexposed regions of the photoresist.

Abstract: A topcoat material for application on top of a photoresist material is disclosed. The topcoat material comprises an acid-inert compound. The topcoat material also comprises a polymer or an oligomer or a cage structure which shows negligible intermixing with the imaging layer and is soluble in aqueous base developer. A method of forming a patterned material layer on a substrate and a coated substrate comprising the topcoat material is also disclosed.