Abstract: An electromechanical systems array includes a substrate and a plurality of electromechanical systems devices. Each electromechanical systems device includes a stationary electrode, a movable electrode, and an air gap defined between the stationary electrode and the movable electrode, where the air gap defines open and collapsed states. At least two different electromechanical systems device types correspond to finished devices having different sized air gaps when in the open state. Each electromechanical systems device further includes a primary mechanical layer of a common thickness along with one or more mechanical sub-layers with a different cumulative thickness for each of the at least two different electromechanical systems device types. The mechanical sub-layers can be deposited for use as etch stops during processing of the air gap. The different air gap sizes of each electromechanical systems device type can correspond to a different mechanical sub-layer thickness.