Patents by Inventor Karl F. Smayling

Karl F. Smayling has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Internally generated DFT stepped hysteresis sweep for electrostatic MEMS
    Patent number: 10029914
    Abstract: The present invention generally relates to a mechanism for testing a MEMS hysteresis. A power management circuit may be coupled to the electrodes that cause the movable plate that is disposed between the electrodes in a MEMS device to move. The power management circuit may utilize a charge pump, a comparator and a resistor ladder.
    Type: Grant
    Filed: April 23, 2015
    Date of Patent: July 24, 2018
    Assignee: CAVENDISH KINETICS, INC.
    Inventors: James Douglas Huffman, Cong Quoc Khieu, Robertus Petrus Van Kampen, Karl F. Smayling, Vikram Joshi
  • INTERNALLY GENERATED DFT STEPPED HYSTERESIS SWEEP FOR ELECTROSTATIC MEMS
    Publication number: 20160297677
    Abstract: The present invention generally relates to a mechanism for testing a MEMS hysteresis. A power management circuit may be coupled to the electrodes that cause the movable plate that is disposed between the electrodes in a MEMS device to move. The power management circuit may utilize a charge pump, a comparator and a resistor ladder.
    Type: Application
    Filed: April 23, 2015
    Publication date: October 13, 2016
    Inventors: James Douglas HUFFMAN, Cong Quoc KHIEU, Robertus Petrus VAN KAMPEN, Karl F. SMAYLING, Vikram JOSHI
  • Methods and apparatus for detecting defects in interconnect structures
    Patent number: 7901953
    Abstract: In some aspects, a method is provided for detecting a void in a test structure that comprises (a) measuring a resistance of the test structure; (b) applying a stress to the test structure at increasing levels until at least one of: (i) the measured resistance of the test structure exceeds a predetermined resistance threshold; and (ii) the stress level reaches a predetermined stress maximum; (c) detecting a void if the measured resistance of the test structure exceeds the predetermined resistance threshold; and (d) determining that the test structure is void free if the stress level reaches the predetermined stress maximum without the measured resistance of the test structure exceeding the predetermined resistance threshold. Numerous other aspects are provided.
    Type: Grant
    Filed: September 6, 2008
    Date of Patent: March 8, 2011
    Assignee: Applied Materials, Inc.
    Inventors: Michael C. Smayling, Shiany Oemardani, Karl F. Smayling
  • METHODS AND APPARATUS FOR DETECTING DEFECTS IN INTERCONNECT STRUCTURES
    Publication number: 20090066358
    Abstract: In some aspects, a method is provided for detecting a void in a test structure that comprises (a) measuring a resistance of the test structure; (b) applying a stress to the test structure at increasing levels until at least one of: (i) the measured resistance of the test structure exceeds a predetermined resistance threshold; and (ii) the stress level reaches a predetermined stress maximum; (c) detecting a void if the measured resistance of the test structure exceeds the predetermined resistance threshold; and (d) determining that the test structure is void free if the stress level reaches the predetermined stress maximum without the measured resistance of the test structure exceeding the predetermined resistance threshold. Numerous other aspects are provided.
    Type: Application
    Filed: September 6, 2008
    Publication date: March 12, 2009
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Michael C. Smayling, Shiany Oemardani, Karl F. Smayling