Abstract: The invention relates to a process for repairing coated substrate surfaces comprising the following successive steps:

Abstract: The invention relates to a process for repairing coated substrate surfaces comprising the following successive steps:

Abstract: Improved aqueous powder coat dispersion, comprising (a) a powder coating dispersed in (b) an aqueous phase, wherein the aqueous phase contains a silica compound selected from the group consisting of (i) 0.2 to 2% by weight, based on the weight of the powder coating, of finely divided silicic acid with large BET-surface; (ii) 0.1 to 1.5% by weight, based on the weight of the powder coating, of layered silicates; and (iii) combinations thereof, exhibit improved sedimentation properties and provide coatings with improved sag characteristics.

Abstract: A process for preparing a multi-layer coating on an electrically conductive automotive body or an electrically conductive automotive body part by applying a cathodic electrodeposition coating layer, optionally a further coating layer and an outer clear coating, in which the cathodic electrodeposition coating layer of a cathodic electrodeposition coating composition is applied which, as the cathodic electrodeposition binder, contains a seed polymer with an amine value of 30 to 100 mg KOH/g and a hydroxyl value of 50 to 200 mg KOH/g, which can be prepared by radical polymerisation of 70 to 97 wt-% of a monomer mixture comprising hydroxy-functional olefinically unsaturated monomer and amino-functional olefinically unsaturated monomer in the presence of 3 to 30 wt-% of an aminoepoxy resin.

Abstract: Clear lacquer coating media suitable for multi-layer coatings, containing self-crosslinking or externally crosslinkable binder vehicles, organic solvents, and in the case of externally-crosslinkable binder vehicles containing one or more crosslinking agents which are different from aldehyde condensation resins, and optionally also containing one or more reactive thinners and customary additives for clear lacquers, with an additional content of A) 0.1 to 3% by weight one or more urea compounds, and B) 0.05 to 10% by weight one or more substances which supply formaldehyde, with respect in each case to the resin solids content which is formed by the binder vehicles, reactive thinners and crosslinking agents.

Abstract: A process for lacquer coating substrates with a colored and/or effect base lacquer and a clear lacquer topcoat, in which a colored and/or effect base lacquer layer of a base lacquer coating composition is applied onto a substrate and is provided in a wet-on-wet process with a clear lacquer coating. Before being jointly stoved or jointly cured with the base lacquer layer, the uncured clear lacquer layer is exposed to high-energy radiation. In the clear lacquer coating composition, the resin solids content contains 50 to 98 wt. % of a system A) thermally curable by addition and/or condensation reactions, which system contains substantially no free-radically polymerisable double bonds and substantially no groups capable of reacting in another way with free-radically polymerisable double bonds of a system B). The resin solids content further contains 2 to 50 wt.

Abstract: Copolymers of olefinically unsaturated monomers, wherein at least one of the monomers is an isomer mixture of a cyclic or polycyclic olefinically unsaturated compound, which mixture contains a mass fraction from 8 to 50 per cent of at least one isomer of the main component in addition to this main component. The copolymers are useful, for example, in coating compositions.

Abstract: A magnetooptic layer made from rare-earth metals and transition metals exhibits a gradient in the alloy composition over the layer depth, and has a coercive field strength of more than 8 kOe in the temperature range of .DELTA.T=100.degree. C. around the compensation temperature T.sub.comp. The layer is fabricated with a dynamic sputter process, in which the substrates to be coated are led past one or a plurality of sputter targets, arranged in a common plane parallel to the track of the substrates. A mask is located between the sputter targets and the substrates.

Abstract: A positive radiation-sensitive mixture is disclosed comprising a compound which forms an acid under the action of high-energy radiation and an acid-cleavable compound, wherein the compound which forms an acid contains aromatically bound chlorine or bromine and has a pK.sub.a value of less than about 12 or is a derivative of a compound having such a pK.sub.a value. The mixture and the recording material produced therefrom have a relatively high-sensitivity and improved resolution and, in addition, exhibit no scumming after development.

Abstract: A radiation-curable composition which comprises a compound that forms an acid under the action of high-energy radiation and an acid-hardening substance, wherein the compound forming an acid contains aromatically linked chlorine or bromine and has a pK.sub.a value below 12. The composition and the recording material prepared therefrom display increased sensitivity, improved resolution and a high etch resistance after development.

Abstract: 3-substituted-4-hydroxy- and 4-acetoxystyrene compounds, especially 3,5-di(methyl, bromo or chloro)-4-acetoxystyrene as well as a process for its preparation. 2,6-dimethylphenol is acylated with acetic anhydride and HF catalyzed to produce 3,5-dimethyl-4-hydroxy-acetophenone. After subsequent esterification with acetic anhydride and catalyzed hydrogenation to form 1-(3',5'-dimethyl-4'-acetoxyphenyl)ethanol, this intermediate is then dehydrated with an acid and a polymerization inhibitor to produce 3,5-dimethyl-4-acetoxystyrene.

Abstract: A positive radiation-sensitive mixture is disclosed containing a compound which forms an acid under the influence of actinic radiation, and an acid-cleavable compound, wherein the acid-cleavable compound is monomeric and contains an acetal group whose aldehyde or ketone component has a developer solubility of about 0.1 to 100 g/l and a boiling point above about 150.degree. C. The mixture does not exhibit different development properties, even at different "holding times", and therefore exhibits a wide processing latitude and makes possible a high structural resolution.

Abstract: 3-substituted-4-hydroxy- and 4-acetoxystyrene compounds, especially 3,5-di(methyl, bromo or chloro)-4-acetoxystyrene as well as a process for its preparation. 2,6-dimethylphenol is acylated with acetic anhydride and HF catalyzed to produce 3,5-dimethyl-4-hydroxy-acetophenone. After subsequent esterification with acetic anhydride and catalyzed hydrogenation to form 1-(3',5'-dimethyl-4'-acetoxyphenyl)ethanol, this intermediate is then dehydrated with an acid and a polymerization inhibitor to produce 3,5-dimethyl-4-acetoxystyrene.

Abstract: A positive radiation-sensitive mixture is disclosed comprising a compound which forms an acid under the action of actinic radiation, and an acid-cleavable compound, the acid-cleavable compound producing, as cleavage product, an aromatically-substituted alcohol of the general formula I. The radiation-sensitive mixture according to the inventionexhibits a wide processing latitude since different holding times do not cause any changes with respect to the development times.

Abstract: The present invention relates to a process for the production of 3-mono or 3,5-disubstituted-4-acetoxystyrene wherein the 3- or 3,5-substitution is independently C.sub.1 to C.sub.10 alkyl, chlorine, bromine, iodine, --NO.sub.2, --NH.sub.2, or --SO.sub.3 H, a process for its polymerization, hydrolysis, and use in a variety of compositions.

Abstract: 3-substituted-4-hydroxy- and 4-acetoxystyrene compounds, especially 3,5-di(methyl, bromo or chloro)-4-acetoxystyrene as well as a process for its preparation. 2,6-dimethylphenol is acylated with acetic anhydride and HF catalyzed to produce 3,5-dimethyl-4-hydroxy-acetophenone. After subsequent esterification with acetic anhydride and catalyzed hydrogenation to form 1-(3',5'-dimethyl-4'-acetoxyphenyl)ethanol, this intermediate is then dehydrated with an acid and a polymerization inhibitor to produce 3,5-dimethyl-4-acetoxystyrene.

Abstract: The invention relates to a positive radiation-sensitive mixture containing a compound which forms an acid under the action of actinic radiation, an acid-cleavable compound, and a binder, wherein the acid-cleavable compound comprises a monomeric silylenol ether. The radiation-sensitive mixture described has a better shelf life than the prior art products and a high structural resolution.

Abstract: The present invention relates to a process for the production of 3-mono or 3,5-disubstituted-4-acetoxystyrene wherein the 3- or 3,5-substitution is independently C.sub.1 to C.sub.10 alkyl, chlorine, bromine, iodine, --NO.sub.2, --NH.sub.2, or --SO.sub.3 H, a process for its polymerization, hydrolysis, and use in a variety of compositions.

Abstract: The present invention relates to a process for the production of 3-mono or 3,5-disubstituted-4-acetoxystyrene wherein the 3- or 3,5-substitution is independently C.sub.1 to C.sub.10 alkyl, chlorine, bromine, iodine, --NO.sub.2, --NH.sub.2, or --SO.sub.3 H, a process for its polymerization, hydrolysis, and use in a variety of compositions.

Abstract: Disclosed is an electrophotographic recording material comprising a photoconductive double layer disposed on an electrically conductive support, which double layer comprises a precoat layer and a photoconductor-containing topcoat layer. The interface region of the precoat and topcoat layers defines a mixing zone into which one or more of the constituents of the separate layers have diffused. A process for producing the electrophotographic recording material is also disclosed.