Patents by Inventor Karl Heinz Bachem

Karl Heinz Bachem has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Reactor for coating flat substrates and process for manufacturing such substrates
    Patent number: 6506450
    Abstract: A reactor for coating flat substrates and particularly wafers is described which has a reaction vessel into which reaction gases can be introduced, and a substrate holder unit in which substrates are held in a holder such that the main surface of the substrates to be coated is oriented downward during the deposition operation and is aligned essentially in parallel to the flow direction of the reaction gases. The invention is characterized in that at least two spaces for substrates are provided on the substrate holder unit and in that the holder or holders is/are constructed in the manner of a template which has openings for the surfaces of the substrates to be coated.
    Type: Grant
    Filed: May 30, 2001
    Date of Patent: January 14, 2003
    Assignee: Aixtron AG
    Inventors: Holger Jürgensen, Karl Heinz Bachem
  • Reactor for coating flat substrates and process for manufacturing such substrates
    Publication number: 20010023234
    Abstract: A reactor for coating flat substrates and particularly wafers is described which has
    Type: Application
    Filed: May 30, 2001
    Publication date: September 20, 2001
    Inventors: Holger Jurgensen, Karl Heinz Bachem
  • Reactor for coating plane substrates and method for producing said substrates
    Patent number: 6279506
    Abstract: A reactor for coating flat substrates and particularly wafers is described which has a reaction vessel into which reaction gases can be introduced, and a substrate holder unit in which substrates are held in a holder such that the main surface of the substrates to be coated is oriented downward during the deposition operation and is aligned essentially in parallel to the flow direction of the reaction gases. The invention is characterized in that at least two spaces for substrates are provided on the substrate holder unit and in that the holder or holders is/are constructed in the manner of a template which has openings for the surfaces of the substrates to be coated.
    Type: Grant
    Filed: July 3, 1997
    Date of Patent: August 28, 2001
    Assignee: Aixtron AG
    Inventors: Holger Jürgensen, Karl Heinz Bachem
  • Quantum layer structure
    Patent number: 5767535
    Abstract: Disclosed is a quantum layer structure, in particular, for lasers or detectors, having at least four semiconductor layers (S1, S2, S3, S4), with at least two internal layers (S2, S3) being disposed between two external barrier layers (S1, S4). The present invention is distinguished in that, without the application of an electric voltage, the lower edge of the conduction band of one the internal layers has an absolute minimum and the lower edge of the valence band of another internal layer has an absolute maximum, and that at least two internal layers having the absolute minimum and the absolute maximum possess quantized hole states respectively electron states.
    Type: Grant
    Filed: December 18, 1996
    Date of Patent: June 16, 1998
    Assignee: Fraunhofer-Gesellschaft zur Foerderung der angewandten Forschung e.V.
    Inventors: Karl-Heinz Bachem, Dan Fekete