Abstract: The targets for cathodic sputtering according to this invention are formed of hot-pressed or hot isostatic-pressed indium oxide/tin oxide powder with a minimum density of 95% of the theoretical density and with a sub-stoichiometric oxygen content are known. In order to provide the improvement of high stability and, simultaneously, high sputtering rate, it is proposed according to the invention that the target have a crystalline phase which is formed as a solid solution of indium oxide and tin oxide with a minimum of 90% by weight, preferably a minimum of 97%, of the solid solution, and which has an average grain size ranging from 2 .mu.m to 20 .mu.m.

Abstract: Methods are known for producing a body from a material susceptible to thermal cracking, in particular from an alloy, by casting a melt of the material in a mold with thermally insulated side walls and a bottom of material with good thermal conducting properties and cooling the melt in the casting mold, where the solid-liquid interface forming as the border between the melt and the already solidified material essentially extends parallel to the bottom and, in the course of the solidification of the melt, moves from the bottom in the direction of the exposed surface of the melt.