Abstract: A method for coating a substrate having a cavity structure, in particular a cooling structure, inside the substrate, wherein the cavity structure includes openings in the surface of the substrate. At least one bonding layer, in particular a diffusion layer, or at least one metallic layer is applied onto the substrate, in particular onto the surface of the substrate, and subsequently at least one thermal protection layer is applied onto the at least one diffusion layer by using a plasma spray physical vapour deposition (PS-PVD) method, a hollow cathode sputtering method or a suspension plasma spray (SPS) method.

Abstract: A method for producing a self-healing heat-insulating layer on a substrate by atmospheric plasma spraying (APS) of a heat-insulating-layer powder. The method includes introducing MoSi2 powder containing aluminum into a heat-insulating layer. The MoSi2 powder contains aluminum in a content of from 2 to 15 wt. %. The MoSi2 powder is used in a mass fraction of between 0.5 and 5 wt. % based on the heat-insulating layer. The method further includes injecting the heat-insulating-layer powder at a first point that is at a distance from a gun in the axial direction and injecting the MoSi2 powder into a plasma jet at a second point that is at a greater distance from the gun in the axial direction. An injection distance (I) of between 20 and 60 mm is set between the first and the second point.

Abstract: To apply a thermal barrier coating (10), a plasma jet (5) is generated by a plasma torch in a work chamber (2) and is directed to the surface of a substrate (3) introduced into the work chamber, and a ceramic coating material is applied to the substrate surface by means of PS-PVD, wherein the coating material is injected into the plasma jet as a powder and is partly or completely vaporized there. On applying the thermal barrier coating, in a first workstep the feed rate of the injected powder is set so that a large part of the injected powder vaporizes, wherein the coating material condenses from the vapor phase on the substrate surface and forms mixed phases with the material of the substrate surface.