Abstract: Silicon and silica values are obtained from recycled organosilicon products such as silicones, by introducing a recycle feed containing the organosilicon products into an electric furnace while producing metallurgical grade silicon from a silica source and a carbon source.

Abstract: Chlorosilanes of the general formula HnSiCl4-n and/or HmCl6-mSi2, where n=1-4 and m=0-4, are produced in a fluidized bed reactor by reaction of a hydrogen chloride-containing reaction gas with a silicon contact mass granulation mixture composed of a coarse grain fraction and a fine grain fraction, wherein the average particle size of the fine grain fraction d50,fine is smaller than the average particle size of the coarse grain fraction d50,coarse.

Abstract: Organochlorosilanes are produced by reacting, in a fluidized bed reactor, a chloromethane-containing reactant gas with a particulate contact mass containing silicon and a catalyst, wherein the organochlorosilanes have the general formula (CH3)nHSiCl4-n-m where n=1 to 3 and m=0 or 1, wherein the process is characterized by three dimensions indices K1-K3, which are respectively associated with the reactor, the contact mass, and the reaction conditions, and which are maintained within specified bounds.

Abstract: Metallurgical silicon containing impurities of carbon and/or carbon-containing compounds is classified and subsequently used selectively for chlorosilane production. The process comprises the steps of: a) determining the free carbon proportion which reacts with oxygen up to a temperature of 700° C., b) directing metallurgical silicon in which the free carbon proportion is ?150 ppmw to a process for producing chlorosilanes and/or directing metallurgical silicon in which the free carbon proportion is >150 ppmw to a process for producing methylchlorosilanes. As a result of the process, metallurgical silicon having a total carbon content of up to 2500 ppmw can be used for producing chlorosilanes.

Abstract: Chlorosilanes are produced in exalted yield in a fluidized bed process when the reactor hydraulic diameter, Sauter particle diameter, and superficial gas velocity are used to define a parameter space as a function of Reynolds number and Archimedes number.

Abstract: Organochlorosilanes are produced by reacting, in a fluidized bed reactor, a chloromethane-containing reactant gas with a particulate contact mass containing silicon and a catalyst, wherein the organochlorosilanes have the general formula (CH3)nHSiCl4-n-m where n=1 to 3 and m=0 or 1, wherein the process is characterized by three dimensions indices K1-K3, which are respectively associated with the reactor, the contact mass, and the reaction conditions, and which are maintained within specified bounds.

Abstract: Chlorosilanes and methods of producing chlorosilanes. The process for producing chlorosilanes includes the step of selecting a chlorosilane having a general formulae (1) HnSiCl4-n and (2) HmCl6-mSi2 wherein n is 0 to 3 and m is from 0 to 4. The chlorosilane selected is then placed within a fluidized bed reactor. A hydrogen chloride-containing reaction gas is reacted with a particulate contact mass containing silicon at temperatures of 280° C. to 400° C. Where the operating granulation, understood as meaning the granulation or granulation mixture introduced into the fluidized bed reactor, contains at least 1% by mass of silicon-containing particles S described by a structural parameter S and wherein S has a value of at least 0 and is calculated as follows S = ( ? s - 0 . 7 ? 0 ) · ? S ? D ? F Wherein ?S is symmetry-weighted sphericity factor, ?SD is poured density [g/cm3], and ?F is average particle solids density [g/cm3].

Abstract: A process for refining crude molten silicon. The process includes oxidatively refining the crude molten silicon in the production of technical silicon. The crude molten silicon is admixed during the refining with a particulate mediator which has a minimum amount of metallic silicon of 8% by mass and also at least one or more of the elements H, C, O, F, Cl, Ca, Fe and Al. The particulate mediator is described by a characteristic number K which has a value of 0.03 to 6 mm?1 and is calculated using the formula K = 6 · ( 1 - ? m , M ) d 50 , M where d50,M is the particle size (diameter) at 50% of the mass undersize of the grading curve of the particulate mediator [mm] and the ?m,M is the mean effective porosity of the particulate mediator.

Abstract: A process for the oxidative refining of crude silicon melts during the production of technical-grade silicon. The process includes oxidative refining a crude silicon melt during the production of technical-grade silicon, where during the refining of the crude silicon melt, a finely divided mediator having a particle size parameter d50 of 1 to 200 ?m is added. The finely divided mediator contains a minimum content of metallic silicon of 8% by mass and also at least one or more of the elements H, C, O, F, Cl, Ca, Fe and Al. Additionally, the finely divided mediator is added to the crude silicon melt by means of pneumatic conveying with a gas.

Abstract: A process for for producing or preparing chlorosilanes. The process includes providing chlorosilanes having the general formula HnSiCl4-n wherein n is from 1 to 3. Once provided, the chlorosilanes are placed into a fluidized bed reactor where a hydrogen and silicon tetrachloride-containing reaction gas is reacted with a particulate contact mass containing silicon at temperatures of 350° C. to 800° C. The operating granulation is understood as meaning the granulation or granulation mixture introduced into the fluidized bed reactor contains at least 1% by mass of silicon-containing particles S described by a structural parameter S. Where the S has a value of at least 0 and is calculated as follows S=(?S?0.70)·?SD/?F where ?S is a symmetry-weighted sphericity factor; the ?SD is a poured density [g/cm3], and the ?F is an average particle solids density [g/cm3].

Abstract: Silicon metal-containing agglomerates are produced by agglomerating a mixture of finely divided silicon metal-containing particles having a particle size parameter d50 of not more than 250 ?m and in the dry state a silicon metal content of at least 10% by mass, at least one binder containing 90% to 98% by mass of silicon dioxide and having a specific surface area of 15 to 35 m2/g, and water, wherein the mass ratio between finely divided silicon metal-containing particles and binder in the mixture is from 80/20 to 99/1, and the resulting moist agglomerates have a water content of 5% to 15% by mass, and drying the agglomerates.

Abstract: Technical-grade silicon is produced by reacting a raw material mixture containing silicon dioxide and carbon in an electric furnace with a particulate mediator containing at least one of the elements C, O, Al and Si is reacted in an electric furnace, wherein the mixture is described by a dimensionless index K, K having a value of from 0 to 745 and being calculated as follows: K = ? M · ? R ? M · ? C ? ? where ? : equation ? ? ( 1 ) ? M = 6 · ( 1 - ? m , M ) d 50 , M equation ? ? ( 2 ) ? R ? M = d 9 ? 0 , R ? M - d 1 ? 0 , R ? M equation ? ? ( 3 ) ? C = 3 2 - m M m R ? M equation ? ? ( 4 ) where the meanings of ?M, ?m,M, ?RM, ?c, d50,M, d90,RM, mM and mRM are explained in claim 1.

Abstract: Technical silicon is produced by heating a raw material mixture comprising particulate silicon metal-containing material and a particulate mediator containing at least one of C, O, Al, Ca and Si, to at least 1490° C., forming a liquid silicon phase, and solidifying this phase, wherein the raw material mixture a characteristic number K of from 0.000 to 60, calculated as follows: K = m ? ( SiM ) · d ? ? 50 ? ( SiM ) + m ? ( Med ) · d ? ? 50 ? ( Med ) m ? ( SiM ) + m ? ( Med ) · ? ( equation ? ? 1 ) where m (SiM) is the mass of the silicon metal-containing material in the batch m (Med) is the mass of the mediator d50,SiM is the mean particle size of the silicon metal-containing material, d50,Med is the mean particle size of the mediator, and ? is the mean porosity of the silicon metal-containing material.

Abstract: A process for producing methylchlorosilanes of general formula 1, (CH3)nHmSiCl4-n-m, in which n represents values from 1 to 3 and m represents values of 0 or 1 in a fluidized bed reactor is provided. A chloromethane-containing reaction gas is reacted with a particulate contact mass containing silicon in the presence of copper catalyst. An operating granulation contains at least 1% by mass of silicon-containing particles S described by a structural parameter S. S has a value of at least 0 and is calculated according to equation (1), S = ( ? s - 0.70 ) · ? SD ? F , wherein ?S is symmetry-weighted sphericity factor, ?SD is poured density [g/cm3], and ?F is average particle solids density [g/cm3].

Abstract: The present disclosure relates to a process for producing chlorosilanes by reaction of a reaction gas containing hydrogen, tetrachlorosilane and optionally at least one further chlorosilane in a reactor and optionally in the presence of a catalyst. The chlorosilanes have the general formula HnSiCl4-n, and the reactor design is described by an index K1, the composition of the reaction gas before entry into the reactor is described by an index K2, and the reaction conditions are described by an index K3.

Abstract: The present disclosure relates to a process for producing chlorosilanes in a fluidized bed reactor by reaction of a hydrogen and silicon tetrachloride-containing reaction gas with a particulate contact mass containing silicon and a catalyst. The chlorosilanes have the general formula HnSiCl4?n and/or HmCl6?mSi2. The reactor design is described by an index K1, the constitution of the contact mass is described by an index K2 and the reaction conditions are described by an index K3.

Abstract: The present disclosure relates to a process for producing chlorosilanes in a fluidized bed reactor by reacting a hydrogen chloride-containing reaction gas with a particulate contact mass containing silicon and optionally a catalyst. The chlorosilanes have the general formula HnSiCl4-n and/or HmCl6-mSi2. The reactor design is described by an index K1, the constitution of the contact mass without catalyst is described by an index K2uncat, the constitution of the contact mass with catalyst is described by an index K2cat, and the reaction conditions are described by an index K3.

Abstract: The content of boron compounds in a composition containing at least one halosilane is reduced by bringing the composition into contact with at least one phenylsilane and removing the at least one halosilane. The invention further relates to the use of phenylsilanes for removing boron compounds from halosilane-containing compositions.

Abstract: Generally unusable or difficultly useable dusts of ultrahigh purity silicon can be used to produce chlorosilanes under reasonable reaction conditions by employing a catalyst containing one or more of Co, Mo, W. The process may be incorporated into an integral plant for the production of polycrystalline silicon.

Abstract: Chlorosilanes of the general formula HnSiCl4-n and/or HmCl6-mSi2, where n=1-4 and m=0-4, are produced in a fluidized bed reactor by reaction of a hydrogen chloride-containing reaction gas with a silicon contact mass granulation mixture composed of a coarse grain fraction and a fine grain fraction, wherein the average particle size of the fine grain fraction d50,fine is smaller than the average particle size of the coarse grain fraction d50,coarse.