Abstract: A dual-curable sealant composition includes a polysulfide having an —SH group, a metal oxide catalyst, and an alkylborane amine catalyst. A cured sealant is also formed from the dual-curable sealant composition. Moreover, a dual-cured sealant is formed that includes the polymerization product of the polysulfide reacted in the presence of the metal oxide catalyst and the alkylborane amine catalyst. Further, a dual-curable sealant system includes a first component including the polysulfide and the alkylborane amine catalyst and a second component including the metal oxide catalyst. An article is formed that includes a substrate and the cured sealant disposed on the substrate. Even further, a method of forming the dual-curable sealant composition includes the steps of providing the polysulfide, the alkylborane amine catalyst, and the metal oxide catalyst, and combining the polysulfide, the alkylborane amine catalyst, and the metal oxide catalyst to form the dual-curable composition.

Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. It relates to a process for preparing metal films comprising (a) depositing a metal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate with the deposited metal-containing compound in contact with a reducing agent in the gaseous state, wherein the reducing agent is or at least partially forms at the surface of the solid substrate a carbene, a silylene or a phosphor radical.

Abstract: A dual-curable sealant composition includes a polysulfide having an —SH group, a metal oxide catalyst, and an alkyl-borane amine catalyst. A cured sealant is also formed from the dual-curable sealant composition. Moreover, a dual-cured sealant is formed that includes the polymerization product of the polysulfide reacted in the presence of the metal oxide catalyst and the alkylborane amine catalyst. Further, a dual-curable sealant system includes a first component including the polysulfide and the alkylborane amine catalyst and a second component including the metal oxide catalyst. An article is formed that includes a substrate and the cured sealant disposed on the substrate. Even further, a method of forming the dual-curable sealant composition includes the steps of providing the polysulfide, the alkylborane amine catalyst, and the metal oxide catalyst, and combining the polysulfide, the alkylborane amine catalyst, and the metal oxide catalyst to form the dual-curable composition.

Abstract: A curable sealant composition includes a polysulfide having an —SH group, a compound having at least one carbon-carbon double bond, and an alkylborane amine catalyst. A cured sealant is formed from the curable sealant composition, wherein the cured sealant includes the polymerization product of the polysulfide and the compound having the at least one carbon-carbon double bond reacted in the presence of the alkylborane amine catalyst. Furthermore, a curable sealant system includes a first component including the polysulfide and the alkylborane amine catalyst and a second component including the compound having the at least one carbon-carbon double bond. Moreover, an article includes a substrate and the cured sealant disposed on the substrate. The curable sealant composition is formed using a method including the steps of providing and combining the polysulfide, the alkylborane amine catalyst, and the compound having the at least one carbon-carbon double bond, to form the curable composition.

Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. It relates to a process for preparing metal films comprising (a) depositing a metal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate with the deposited metal-containing compound in contact with a reducing agent in the gaseous state, wherein the reducing agent is or at least partially forms at the surface of the solid substrate a carbene, a silylene or a phosphor radical.

Abstract: The present invention provides a process for preparing triorgano borates with low alcohol content.

Abstract: The present invention relates to a process for the modification of a polymer surface. The polymer surface is treated with (i) an organoborane-amine complex and subsequently with (ii) a radically polymerizable monomer compound and optionally a deblocking agent.

Abstract: The present invention provides a process for preparing triorgano borates with low alcohol content.

Abstract: In a process for the accelerated reduction of organic substrates, selected from the group consisting of esters, amides, nitriles, acids, ketones, imines or mixtures thereof, they are reacted with an amine borane, sulfide borane or ether borane complex as a borane source in the presence of organic accelerator compounds containing either Lewis acidic or Lewis basic sites in their structure, of which the Lewis acidic site can coordinate with the carbonyl or nitrile or imine group of the substrate or the Lewis basic site can coordinate with the borane.

Abstract: A process for producing a 1,3,2-dioxaborinane compound of the general formula (I) in which each R individually is selected from the group consisting of H and C1-8-alkyl, by reacting a diol of the general formula (II) HO—CRR—CRR—CRR—OH ??(II) with diborane is performed without using a solvent.

Abstract: In a process for the accelerated reduction of organic substrates, selected from the group consisting of esters, amides, nitriles, acids, ketones, imines or mixtures thereof, they are reacted with an amine borane, sulfide borane or ether borane complex as a borane source in the presence of organic accelerator compounds containing either Lewis acidic or Lewis basic sites in their structure, of which the Lewis acidic site can coordinate with the carbonyl or nitrile or imine group of the substrate or the Lewis basic site can coordinate with the borane.

Abstract: A method of increasing enantioselectivity in a reduction reaction of a prochiral substrate with a borane reagent including a borohydride species (for example, a borohydride stabilized borane-tetrahydrofuran complex) catalyzed by a chiral catalyst includes the step of maintaining the concentration of borohydride species in the borane reagent below approximately 0.005 M during the reduction of the prochiral substrate. A method of increasing enantioselectivity in a reduction reaction of a prochiral substrate with a borane reagent including a borohydride species that is catalyzed by a chiral catalyst includes the step of reducing the detrimental effect the borohydride species has on enantioselectivity by adding a Lewis acid. For example, the prochiral substrate can be a ketone and the chiral catalyst can be a chiral oxazaborolidine.

Abstract: A method of increasing enantioselectivity in a reduction reaction of a prochiral substrate with a borane reagent including a borohydride species (for example, a borohydride stabilized borane-tetrahydrofuran complex) catalyzed by a chiral catalyst includes the step of maintaining the concentration of borohydride species in the borane reagent below approximately 0.005 M during the reduction of the prochiral substrate. A method of increasing enantioselectivity in a reduction reaction of a prochiral substrate with a borane reagent including a borohydride species that is catalyzed by a chiral catalyst includes the step of reducing the detrimental effect the borohydride species has on enantioselectivity by adding a Lewis acid. For example, the prochiral substrate can be a ketone and the chiral catalyst can be a chiral oxazaborolidine.

Abstract: A method of increasing enantioselectivity in a reduction reaction of a prochiral substrate with a borane reagent including a borohydride species (for example, a borohydride stabilized borane-tetrahydrofuran complex) catalyzed by a chiral catalyst includes the step of maintaining the concentration of borohydride species in the borane reagent below approximately 0.005 M during the reduction of the prochiral substrate. A method of increasing enantioselectivity in a reduction reaction of a prochiral substrate with a borane reagent including a borohydride species that is catalyzed by a chiral catalyst includes the step of reducing the detrimental effect the borohydride species has on enantioselectivity by adding a Lewis acid. For example, the prochiral substrate can be a ketone and the chiral catalyst can be a chiral oxazaborolidine.