Patents by Inventor Karl-Stefan Weissenrieder
Karl-Stefan Weissenrieder has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11194119Abstract: An optical assembly includes: an optical element, which is transmissive or reflective to radiation at a used wavelength and has an optically used region; and a thermally conductive component, which is arranged outside the optically used region of the optical element. The thermally conductive component can include a material having a thermal conductivity of more than 500 W m?1 K?1. Additionally or alternatively, the product of the thickness of the thermally conductive component in millimeters and the thermal conductivity of the material of the thermally conductive component is at least 1 W mm m?1 K?1.Type: GrantFiled: December 3, 2019Date of Patent: December 7, 2021Assignee: Carl Zeiss SMT GmbHInventors: Julian Kaller, Franz Sorg, Ralf Winter, Karl-Stefan Weissenrieder
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Publication number: 20200103771Abstract: An optical assembly includes: an optical element, which is transmissive or reflective to radiation at a used wavelength and has an optically used region; and a thermally conductive component, which is arranged outside the optically used region of the optical element. The thermally conductive component can include a material having a thermal conductivity of more than 500 W m?1 K?1. Additionally or alternatively, the product of the thickness of the thermally conductive component in millimeters and the thermal conductivity of the material of the thermally conductive component is at least 1 W mm m?1 K?1.Type: ApplicationFiled: December 3, 2019Publication date: April 2, 2020Inventors: Julian Kaller, Franz Sorg, Ralf Winter, Karl-Stefan Weissenrieder
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Patent number: 10509336Abstract: An optical assembly includes: an optical element, which is transmissive or reflective to radiation at a used wavelength and has an optically used region; and a thermally conductive component, which is arranged outside the optically used region of the optical element. The thermally conductive component can include a material having a thermal conductivity of more than 500 W m?1 K?1. Additionally or alternatively, the product of the thickness of the thermally conductive component in millimeters and the thermal conductivity of the material of the thermally conductive component is at least 1 W mm m?1 K?1.Type: GrantFiled: May 25, 2017Date of Patent: December 17, 2019Assignee: Carl Zeiss SMT GmbHInventors: Julian Kaller, Franz Sorg, Ralf Winter, Karl-Stefan Weissenrieder
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Publication number: 20170322343Abstract: The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.Type: ApplicationFiled: July 24, 2017Publication date: November 9, 2017Inventors: Vladimir Kamenov, Daniel Kraehmer, Toralf Gruner, Karl-Stefan Weissenrieder, Heiko Feldmann, Achim Zirkel, Alexandra Pazidis, Bruno Thome, Stephan Six
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Publication number: 20170261867Abstract: An optical assembly includes: an optical element, which is transmissive or reflective to radiation at a used wavelength and has an optically used region; and a thermally conductive component, which is arranged outside the optically used region of the optical element. The thermally conductive component can include a material having a thermal conductivity of more than 500 W m?1 K?1. Additionally or alternatively, the product of the thickness of the thermally conductive component in millimeters and the thermal conductivity of the material of the thermally conductive component is at least 1 W mm m?1 K?1.Type: ApplicationFiled: May 25, 2017Publication date: September 14, 2017Inventors: Julian Kaller, Franz Sorg, Ralf Winter, Karl-Stefan Weissenrieder
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Patent number: 9733395Abstract: The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.Type: GrantFiled: May 20, 2011Date of Patent: August 15, 2017Assignee: Carl Zeiss SMT GmbHInventors: Vladimir Kamenov, Daniel Kraehmer, Toralf Gruner, Karl-Stefan Weissenrieder, Heiko Feldmann, Achim Zirkel, Alexandra Pazidis, Bruno Thome, Stephan Six
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Patent number: 8928980Abstract: A micromirror arrangement (1) having: at least one micromirror (3) having a reflective surface (11) formed at a mirror substrate (2), and an antireflective coating (7) formed at the mirror substrate (2) outside the reflective surface (11). A reflective coating (8) is formed within the reflective surface (11) and has at least two layer subsystems, wherein the first layer subsystem has layers (8e, 8f) composed of a periodic sequence of alternate high and low refractive index layers composed of a nonmetallic material and is optimized with regard to the reflectivity in respect of a used wavelength of the micromirror arrangement, and wherein the second layer subsystem is optimized with regard to the reflectivity in respect of a measurement wavelength of the micromirror arrangement, said measurement wavelength deviating from the used wavelength.Type: GrantFiled: January 13, 2012Date of Patent: January 6, 2015Assignee: Carl Zeiss SMT GmbHInventors: Karl-Stefan Weissenrieder, Roland Loercher, Alexandra Pazidis
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Publication number: 20140320955Abstract: The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.Type: ApplicationFiled: July 15, 2014Publication date: October 30, 2014Inventors: Vladimir Kamenov, Daniel Kraehmer, Toralf Gruner, Karl-Stefan Weissenrieder, Heiko Feldmann, Achim Zirkel, Alexandra Pazidis, Bruno Thome, Stephan Six
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Publication number: 20120182606Abstract: A micromirror arrangement (1)having: at least one micromirror (3) having a reflective surface (11) formed at a mirror substrate (2), and an antireflective coating (7) formed at the mirror substrate (2) outside the reflective surface (11). A reflective coating (8) is formed within the reflective surface (11) and has at least two layer subsystems, wherein the first layer subsystem has layers (8e, 8f) composed of a periodic sequence of alternate high and low refractive index layers composed of a nonmetallic material and is optimized with regard to the reflectivity in respect of a used wavelength of the micromirror arrangement, and wherein the second layer subsystem is optimized with regard to the reflectivity in respect of a measurement wavelength of the micromirror arrangement, said measurement wavelength deviating from the used wavelength.Type: ApplicationFiled: January 13, 2012Publication date: July 19, 2012Applicant: CARL ZEISS SMT GMBHInventors: Karl-Stefan WEISSENRIEDER, Roland LOERCHER, Alexandra PAZIDIS
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Publication number: 20110222043Abstract: The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.Type: ApplicationFiled: May 20, 2011Publication date: September 15, 2011Applicant: CARL ZEISS SMT GMBHInventors: Vladimir Kamenov, Daniel Kraehmer, Toralf Gruner, Karl-Stefan Weissenrieder, Heiko Feldmann, Achim Zirkel, Alexandra Pazidis, Bruno Thome, Stephan Six
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Publication number: 20080297745Abstract: In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.Type: ApplicationFiled: August 6, 2008Publication date: December 4, 2008Inventors: Karl-Stefan WEISSENRIEDER, Alexander HIRNET, Alexander PAZIDIS, Karl-Heinz SCHUSTER, Christoph ZACZEK, Michael LILL, Patrick SCHEIBLE, Guenter SCHEIBLE, Sigrid SCHEIBLE, Harald SCHINK, Markus BROTSACK, Ulrich LOERING, Toralf GRUNER
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Publication number: 20080297754Abstract: The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.Type: ApplicationFiled: February 14, 2008Publication date: December 4, 2008Applicant: CARL ZEISS SMT AGInventors: Vladimir Kamenov, Daniel Kraehmer, Toralf Gruner, Karl-Stefan Weissenrieder, Heiko Feldmann, Achim Zirkel, Alexandra Pazidis, Bruno Thome, Stephan Six
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Patent number: 7460206Abstract: In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.Type: GrantFiled: December 20, 2004Date of Patent: December 2, 2008Assignee: Carl Zeiss SMT AGInventors: Karl-Stefan Weissenrieder, Alexander Hirnet, Alexandra Pazidis, Karl-Heinz Schuster, Christoph Zaczek, Michael Lill, Guenter Scheible, legal representative, Harald Schink, Markus Brotsack, Ulrich Loering, Toralf Gruner, Patrick Scheible
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Publication number: 20080291419Abstract: In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.Type: ApplicationFiled: August 6, 2008Publication date: November 27, 2008Inventors: Karl-Stefan Weissenrieder, Alexander Hirnet, Alexandra Pazidis, Karl-Heinz Schuster, Christoph Zaczek, Michael Lill, Patrick Scheible, Guenter Scheible, Harald Schink, Markus Brotsack, Ulrich Loering, Toralf Gruner, Sigrid Scheible
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Publication number: 20050225737Abstract: In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.Type: ApplicationFiled: December 20, 2004Publication date: October 13, 2005Inventors: Karl-Stefan Weissenrieder, Alexander Hirnet, Alexandra Pazidis, Karl-Heinz Schuster, Christoph Zaczek, Michael Lill, Patrick Scheible, Harald Schink, Markus Brotsack, Ulrich Loering, Toralf Gruner, Guenter Scheible