Abstract: The invention relates to a manipulation device for precision adjustment of plane pattern bearing substrates being provided with two adjustment marks which are at different distances relative to a reference mark, which is, for example, a graduation plate. Such a substrate can be, for example, an intermediate negative or the like which is required in the course of a photolithographic mask production of integrated circuits. The manipulation device is constructed in such a manner that the pattern bearing substrate is substantially aligned relative to a reference mark by two orthogonal displacements and one rotation. This is accomplished by three displacement members which act upon a slide. Said slide, upon which the pattern bearing substrate is disposed, permits displacements parallel to the plane of the latter. Said displacement members are so arranged that the vectors of the orthogonal displacement actions pass one of the two adjustment marks.