Abstract: In the case of a lens system (1), in particular in the case of a projection lens system for semiconductor lithography, it is possible to exchange at least one optical element, in particular the final optical element in the beam direction in the form of an end plate (3). For adjusting the exchangeable optical element (3), an optical quality fit with a fitting surface (6) is set between the optical element (3) and a mount (5) or a part connected to a mount (5).

Abstract: There is provided a grating apparatus for filtering wavelengths ?100 nm. The grating apparatus includes multiple individual grating elements having grating lines. The individual grating elements are positioned one behind another on a curved support surface in relation to a plane spanned by the grating apparatus in a direction of beans of a light bundle that is incident on the grating apparatus.

Abstract: A device for mounting an optical element (1), for example for a lens element in a lens, especially in an exposure lens (2) in micro lithography, is provided with the following features: the optical element (1) is provided in its edge zone with support points (8, 9, 10). Counterbearing points (11) are disposed opposite the support points (8, 9, 10) of the optical element (1) in an outer mounting (3). Bearing members (12) are disposed between the support points (8, 9, 10) and the counterbearing points (11). The bearing members (12) are provided with spherical surfaces directed toward the support points (8, 9, 10).

Abstract: In the case of a lens system (1), in particular in the case of a projection lens system for semiconductor lithography, it is possible to exchange at least one optical element, in particular the final optical element in the beam direction in the form of an end plate (3). For adjusting the exchangeable optical element (3), an optical quality fit with a fitting surface (6) is set between the optical element (3) and a mount (5) or a part connected to a mount (5).

Abstract: In the case of a lens system, in particular a projection lens system in semiconductor lithography, with a plurality of optical elements, such as lenses, which are mounted in mounts, the mounts being connected to one another, if appropriate by means of adjusting rings, at least one inner mount of an optical element which is intended for removal and/or later fitting is connected to an outer mount by means of a three-point mounting.

Abstract: A device for mounting an optical element (1), for example for a lens element in a lens, especially in an exposure lens (2) in micro lithography, is provided with the following features:

Abstract: In the case of a lens system, in particular a projection lens system in semiconductor lithography, with a plurality of optical elements, such as lenses, which are mounted in mounts, the mounts being connected to one another, if appropriate by means of adjusting rings, at least one inner mount of an optical element which is intended for removal and/or later fitting is connected to an outer mount by means of a three-point mounting.