Patents by Inventor Kars Zeger Troost
Kars Zeger Troost has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7538855Abstract: A system and method use a lithographic apparatus to direct a plurality of patterned beams onto a substrate supported on a substrate table. The patterned beams are projected onto target portions of the substrate and relative displacement between the substrate and the patterned beams causes the beams to be scanned across the substrate. A first projection device projects a first relatively large area patterned beam which extends across a substantial proportion of the substrate. At least one second relatively small area patterned beam is selectively positioned relative to the first projection device at least in a direction transverse to the predetermined direction. The second beam may be used to expose an elongate portion of the substrate which extends in the direction of relative displacement. At least one third patterned beam of relatively small area may be provided which is selectively displaceable relative to the substrate table during relative displacement between the substrate and the first beam.Type: GrantFiled: August 10, 2004Date of Patent: May 26, 2009Assignee: ASML Netherlands B.V.Inventors: Kars Zeger Troost, Johan Christiaan Gerard Hoefnagels, Pieter Willem Herman de Jager
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Patent number: 7500218Abstract: Grayscale Optical Proximity Correction device features are added to a mask pattern by convoluting the device features with a two-dimensional correction kernel or two one-dimensional correction kernels to generate grayscale OPC features. The resulting pattern may be used in a projection lithography apparatus having a programmable patterning means that is adapted to generate three or more intensity levels. An iterative process of simulating an aerial image that would be produced by the pattern, comparing the simulation to the desired pattern, and adjusting the OPC features may be used to generate an optimum pattern for projection.Type: GrantFiled: August 17, 2004Date of Patent: March 3, 2009Assignee: ASML Netherlands B.V.Inventors: Kars Zeger Troost, Johannes Jacobus Matheus Baselmans, Karel Diederick Van Der Mast
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Patent number: 7499146Abstract: The tilt and position of individually controllable element are simultaneously adjusted to allow a greater range of contrasts to be achieved. This can also be used to compensate for cupping of individually controllable elements. Simultaneous adjustment of both the position and tilt of the individually controllable elements can be achieved by two electrodes operable over a range of values.Type: GrantFiled: October 19, 2005Date of Patent: March 3, 2009Assignees: ASML Netherlands B.V., ASML Holding N.V., LSI Logic CorporationInventors: Kars Zeger Troost, Johannes Jacobus Matheus Baselmans, Arno Jan Bleeker, Louis Markoya, Neal Callan, Nicholas K. Eib
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Patent number: 7466394Abstract: A lithographic apparatus comprising an array of individually controllable elements that modulates a beam of radiation and a projection system that projects the modulated beam onto the substrate. The individually controllable elements are provided with a compensation feature that is arranged to provide compensation radiation that substantially or at least partially cancels out unwanted radiation, such that the unwanted radiation is not projected by the projection system onto the substrate.Type: GrantFiled: December 21, 2005Date of Patent: December 16, 2008Assignee: ASML Netherlands B.V.Inventors: Kars Zeger Troost, Johannes Jacobus Matheus Baselmans
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Publication number: 20080297747Abstract: One or more patterning arrays are mounted to a mounting plate via height adjustment structures that enable the flatness of the active surfaces of the patterning arrays to be controlled. The height adjustment structures may comprise an array of piezoelectric actuators or screws. Alternatively, the backside of the patterning means may be polished to optical flatness and bonded by crystal bonding to an optically flat surface of a rigid mounting body.Type: ApplicationFiled: July 9, 2008Publication date: December 4, 2008Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Arno Jan BLEEKER, Dominicus Jacobus Petrus Adrianus Franken, Peter C. Kochersperger, Kars Zeger Troost
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Publication number: 20080266538Abstract: A rework station and a metrology device(s) are incorporated into a lithographic processing cell so that a faulty substrate can be reworked directly and reprocessed without, for example, an overhead involved in changing masks, etc.Type: ApplicationFiled: June 18, 2008Publication date: October 30, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Stefan Geerte Kruijswijk, Rard Willem De Leeuw, Paul Frank Luehrmann, Wim Tjibbo Tel, Paul Jacques Van Wijnen, Kars Zeger Troost
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Patent number: 7440078Abstract: A lithographic system combining an interference exposure unit and a lithography unit. The lithography unit can comprise an array of individually controllable elements. The lithography system can be arranged such that a pitch of the lines exposed by the interference exposure unit is an integer multiple of a size of an exposure area of the lithography unit corresponding to a single individually controllable element.Type: GrantFiled: December 20, 2005Date of Patent: October 21, 2008Assignee: ASML Netherlands B.V.Inventors: Arno Jan Bleeker, Kars Zeger Troost
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Publication number: 20080224251Abstract: A lithographic system is provided in which an extent of overlap between pattern sections is adjusted in order to match a size of a pattern section to a size of a repeating portion of the pattern to be formed.Type: ApplicationFiled: March 14, 2007Publication date: September 18, 2008Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Kars Zeger Troost, Jason Douglas Hintersteiner, Minne Cuperus, Kamen Hristov Chilov, Richard Carl Zimmerman, Ronnie Florentius Van T. Westeinde
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Patent number: 7411652Abstract: One or more patterning arrays are mounted to a mounting plate via height adjustment structures that enable the flatness of the active surfaces of the patterning arrays to be controlled. The height adjustment structures may comprise an array of piezoelectric actuators or screws. Alternatively, the backside of the patterning means may be polished to optical flatness and bonded by crystal bonding to an optically flat surface of a rigid mounting body.Type: GrantFiled: September 22, 2004Date of Patent: August 12, 2008Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Arno Jan Bleeker, Dominicus Jacobus Petrus Adrianus Franken, Peter C. Kochersperger, Kars Zeger Troost
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Patent number: 7403259Abstract: A rework station and a metrology device(s) are incorporated into a lithographic processing cell so that a faulty substrate can be reworked directly and reprocessed without, for example, an overhead involved in changing masks, etc.Type: GrantFiled: October 15, 2004Date of Patent: July 22, 2008Assignee: ASML Netherlands B.V.Inventors: Stefan Geerte Kruijswijk, Rard Willem De Leeuw, Paul Frank Luehrmann, Wim Tjibbo Tel, Paul Jacques Van Wijnen, Kars Zeger Troost
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Patent number: 7400382Abstract: A light patterning system comprises an illumination system that supplies a beam of radiation having a certain wavelength (?). An array of reflective pixels patterns the beam, wherein the array includes pixels having at least a first tilting mirror that is logically coupled to a second tilting mirror. In an embodiment, the first and second tilting mirrors are (i) substantially adjacent to each other; and (ii) offset in height from each other by a first mirror displacement. A projection system is included that projects the patterned beam onto a target. In alternate embodiment, the array of reflective pixels includes pixels having first through fourth tilting mirrors that are logically coupled to each other. The first through fourth tilting mirrors are (i) respectively offset in height from a reference plane by first through fourth mirror displacements, and (ii) are respectively arranged clockwise in a substantially square pattern.Type: GrantFiled: April 28, 2005Date of Patent: July 15, 2008Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Nabila Baba-Ali, Arno Jan Bleeker, Kars Zeger Troost
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Publication number: 20080143982Abstract: An iterative method of producing optimized setpoint data for controlling the actuation of elements of an array of individually controllable elements in a maskless system and systems therefore. The optimization is based on estimation of a device structure that can utilizes one or more of the following factors: the low-pass characteristics of the projection system, the configuration of the illumination system, and the process window properties.Type: ApplicationFiled: December 14, 2006Publication date: June 19, 2008Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Kars Zeger Troost, Jason Douglas Hintersteiner, Patricius Aloysius Jacobus Tinnemans, Wenceslao A. Cebuhar, Ronald P. Albright, Bernardo Kastrup
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Publication number: 20080137053Abstract: A system and method are used to direct a radiation beam to illuminate non-perpendicularly a patterning array of individually controllable elements used for patterning the radiation beam. The individually controllable elements can change a telecentricity of the radiation beam. Projection of the radiation beam onto the individually controllable elements can be by a concave mirror or use a folding mirror placed in an object field of the individually controllable elements. Alternatively, the individually controllable elements can change the optical axis of the radiation beam.Type: ApplicationFiled: January 28, 2008Publication date: June 12, 2008Applicants: ASML Netherlands B.V, ASML Holding N.V.Inventors: Arno Jan BLEEKER, Johannes Jacobus Matheus Baselmans, Marce Mathijs Theodore Marie Dierichs, Stanislav Smirnov, Christian Wagner, Lev Ryzhikov, Kars Zeger Troost
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Patent number: 7362415Abstract: A system and method are used to allow for compensation of a thermal output of an array of individually controllable elements. This can be done by inputting control signals to the array when it is not being used to pattern a projection beam in order to maintain the temperature of the array. A heating element can be provided to maintain the temperature of the array. A thermal reservoir can be provided to maintain the temperature of the array or a cooling element can be provided to reduce the temperature of the array during use.Type: GrantFiled: December 7, 2004Date of Patent: April 22, 2008Assignee: ASML Netherlands B.V.Inventors: Dominicus Jacobus Petrus Adrianus Franken, Arno Jano Bleeker, Wilhelmus Josephus Box, Martinus Hendricus Hendricus Hoeks, Henricus Gerardus Tegenbosch, Kars Zeger Troost, Lambertus Gerardus Maria Kessels
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Patent number: 7349068Abstract: A system and method are provided including different moveable lenses within a projection system that can be placed in the path of a radiation beam to change a magnification of the projection system. By changing the magnification of the projection system an area of a substrate exposed per pixel can be adjusted, and a throughput of the system optimized.Type: GrantFiled: December 17, 2004Date of Patent: March 25, 2008Assignee: ASML Netherlands B.V.Inventors: Karel Diederick Van Der Mast, Kars Zeger Troost
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Patent number: 7304718Abstract: An array of individually controllable elements, comprising a plurality of control areas consisting of a plurality of rows of reflectors. Alternate rows of reflectors are actuated in a common manner such that the control areas function as a grating to provide a control element that can be used as a diffractive optical element.Type: GrantFiled: August 17, 2004Date of Patent: December 4, 2007Assignee: ASML Netherlands B.V.Inventors: Johannes Jacobus Matheus Baselmans, Arno Jan Bleeker, Pieter Willem Herman De Jager, Kars Zeger Troost
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Patent number: 7209217Abstract: A lithographic apparatus includes an illumination system, a patterning system, a projection system, and a combining system. The illumination system supplies a beam of radiation. The patterning system patterns the beam. The patterning system includes at least two arrays of individually controllable elements arranged to be illuminated by respective portions of the beam, each of the arrays pattering the respective portion of the beam. The combining system combines the patterned portions into the patterned beam. The projection system projects the patterned beam onto a target portion of a substrate.Type: GrantFiled: April 8, 2005Date of Patent: April 24, 2007Assignee: ASML Netherlands B.V.Inventor: Kars Zeger Troost
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Patent number: 7177012Abstract: Lithographic apparatus using an array of individually controllable elements in which a fraction of the intensity of the beam of radiation patterned by the array of individually controllable elements is diverted to an image sensor for verifying the quality of the image generated.Type: GrantFiled: October 18, 2004Date of Patent: February 13, 2007Assignee: ASML Netherlands B.V.Inventors: Arno Jan Bleeker, Kars Zeger Troost
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Patent number: 7123348Abstract: A system and method are used to manufacture a device using at least one exposure step. Each exposure step projects a patterned beam of radiation onto a substrate. The patterned beam includes a plurality of pixels. Each pixel delivers a radiation dose no greater than a predetermined normal maximum dose to the target portion in the exposure step and/or at least one selected pixel delivers an increased radiation dose, greater than the normal maximum dose. The increased dose may be delivered to compensate for the effect of a defective element at a known position in the array on a pixel adjacent a selected pixel or compensate for underexposure of the target portion at the location of a selected pixel resulting from exposure of that location to a pixel affected by a known defective element in another exposure step.Type: GrantFiled: June 8, 2004Date of Patent: October 17, 2006Assignee: ASML Netherlands B.VInventors: Kars Zeger Troost, Arno Jan Bleeker
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Patent number: 7116403Abstract: Lithographic apparatus providing a patterned beam of radiation in which radiation that is linearly polarized in a first direction has a first pattern and radiation that is linearly polarized in an orthogonal direction has a second pattern.Type: GrantFiled: June 28, 2004Date of Patent: October 3, 2006Assignee: ASML Netherlands B.VInventors: Kars Zeger Troost, Karel Diederick Van Der Mast