Patents by Inventor Karthik Venkataraman

Karthik Venkataraman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130100724
    Abstract: A memory element is provided that includes a ferromagnetic (FM) layer having one or more ferromagnetic materials. One or more first molecule layers are positioned on the FM layer where charge transfer and interface chemistry between the one or more first molecule layers and FM layer induces a magnetic moment in the one or more first molecule layers. The magnetic moment is stored in the one or more first molecule layers acting as bit information that is retained or written into the one or more first molecule layers. One or more spin-filter layers are positioned on the one or more first molecule layers. The one or more spin-filter layers are positioned on the one or more spin-filter layers to form a physical or a chemical ?-dimer layer structure.
    Type: Application
    Filed: March 19, 2012
    Publication date: April 25, 2013
    Applicant: MASSACHUSETTS INSTITUTE OF TECHNOLOGY
    Inventors: Karthik Venkataraman, Jagadeesh S. Moodera
  • Patent number: 8080671
    Abstract: The production of low color polyetherimides, including its intermediates, such as bisimides and diaryl diether dianhydrides, may be affected by producing an improved purity intermediate of 4-nitro-N-alkylphthalimide. A salt, such as alkali metal carbonate or alkali metal hydrogen carbonate, is added to an aqueous mixture of 4-nitro-N-alkylphthalimide and 3-nitro-N-alkylphthalimide to selectively hydrolyze the imide linkage of 3-nitro-N-alkylphthalimide forming a water-soluble acid-amide salt. An organic solvent is added to this salt mixture to phase separate 4-nitro-N-alkylphthalimide having dissolved in the organic solvent from acid-amide salt of 3-nitro-N-alkylphthalimide having dissolved in water.
    Type: Grant
    Filed: August 22, 2008
    Date of Patent: December 20, 2011
    Assignee: SABIC Innovative Plastics IP B.V.
    Inventors: Thomas L. Guggenheim, Roy Ray Odle, Karthik Venkataraman
  • Publication number: 20090292128
    Abstract: The production of low color polyetherimides, including its intermediates, such as bisimides and diaryl diether dianhydrides, may be affected by producing an improved purity intermediate of 4-nitro-N-alkylphthalimide. A salt, such as alkali metal carbonate or alkali metal hydrogen carbonate, is added to an aqueous mixture of 4-nitro-N-alkylphthalimide and 3-nitro-N-alkylphthalimide to selectively hydrolyze the imide linkage of 3-nitro-N-alkylphthalimide forming a water-soluble acid-amide salt. An organic solvent is added to this salt mixture to phase separate 4-nitro-N-alkylphthalimide having dissolved in the organic solvent from acid-amide salt of 3-nitro-N-alkylphthalimide having dissolved in water.
    Type: Application
    Filed: August 22, 2008
    Publication date: November 26, 2009
    Applicant: SABIC Innovative Plastics IP B.V.
    Inventors: THOMAS Link GUGGENHEIM, Roy Ray Odle, Karthik Venkataraman
  • Publication number: 20090029615
    Abstract: A composition is described, which comprises a crystallizable polyetherimide derived from the polymerization of: (a) a dianhydride component, comprising more than 96.8 mole % of 4,4?-bisphenol A dianhydride or a chemical equivalent thereof; and (b) a diamine component comprising a diamine or a chemical equivalent thereof, wherein the crystallizable polyetherimide has a Tm ranging from 250° C. to 400° C. and the difference between the Tm and Tg of the composition is more than 50° C. Further described are articles, such as fibers, made from the composition, methods for making the composition, methods for making the articles, and methods for using the articles.
    Type: Application
    Filed: July 28, 2008
    Publication date: January 29, 2009
    Applicant: SABIC INNOVATIVE PLASTICS IP B.V.
    Inventors: Prameela Susarla, Amitabh Bansal, Xiaolan Wei, Ganesh Kailasam, Thomas Link Guggenheim, Karthik Venkataraman, Erik C. Hagberg, Roy Ray Odle