Patents by Inventor Kathleen Meehan

Kathleen Meehan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7193719
    Abstract: The invention related to devices and methods wherein the conditions, under which surface plasmon resonance is established, are modified by altering the balance between orientations of the spins of charge carriers in an SPR layer. The embodiments of this invention may be used as logical gates, optical filters and absorbers, optoelectronic mixers, and tunable surface plasmon sensors.
    Type: Grant
    Filed: May 17, 2005
    Date of Patent: March 20, 2007
    Assignee: Virginia Tech Intellectual Properties, Inc.
    Inventors: Kathleen Meehan, Raymond E. Dessy
  • Publication number: 20050270538
    Abstract: The invention related to devices and methods wherein the conditions, under which surface plasmon resonance is established, are modified by altering the balance between orientations of the spins of charge carriers in an SPR layer. The embodiments of this invention may be used as logical gates, optical filters and absorbers, optoelectronic mixers, and tunable surface plasmon sensors.
    Type: Application
    Filed: May 17, 2005
    Publication date: December 8, 2005
    Applicant: Virginia Tech Intellectual Properties, Inc.
    Inventors: Kathleen Meehan, Raymond Dessy
  • Patent number: 5063174
    Abstract: An improved alloyed ohmic contact to n-type GaAs is provided utilizing a Si-based metallization of Si/Au/Ni and exhibiting low contact resistivity and high thermal stability. An improved process for fabricating the inventive contact is also provided comprising the step of first depositing the Si film on the GaAs substrate, thereby simplifying the fabrication of monolithically integrated devices, particularly advanced electro-optic devices, by incorporating self-aligned Si-based contacts in the process. A further improvement is provided in the use of a lift-off-defined Si layer as a reactive-ion etch mask to serve as the self-aligned contact in the process, thereby eliminating a critical photolithographic step of aligning the contact metallization.
    Type: Grant
    Filed: September 18, 1990
    Date of Patent: November 5, 1991
    Assignee: Polaroid Corporation
    Inventors: Dana M. Beyea, Kathleen Meehan
  • Patent number: 4797179
    Abstract: Integrated lenses are fabricated on LED devices by chemical etching mesas through mask openings which are non-circular. The mask is removed and the mesas are then etched to form spherical lenses.
    Type: Grant
    Filed: June 9, 1987
    Date of Patent: January 10, 1989
    Assignee: Lytel Corporation
    Inventors: George P. Watson, Kathleen Meehan