Abstract: A shield encircles a sputtering target that faces a substrate support in a substrate processing chamber. The shield comprises an outer band having a diameter sized to encircle the sputtering target, the outer band having upper and bottom ends, and the upper end having a tapered surface extending radially outwardly and adjacent to the sputtering target. A base plate extends radially inward from the bottom end of the outer band. An inner band joined to the base plate at least partially surrounds a peripheral edge of a substrate support. The shield can also have a heat exchanger comprising a conduit with an inlet and outlet to flow heat exchange fluid therethrough.

Abstract: A method of operating a blender having a rotatable cutting blade in a food preparation chamber includes providing a sensing light assembly, generating at least one sensing light beam below the food preparation chamber, inserting a cup containing food to be blended into the food preparation chamber, generating an error signal if a foreign object crosses the sensing light beam, and preventing or stopping rotation of the cutting blade in response to the error signal.

Abstract: An easily assembled blender with an internal frame holding a cupholder elevator assembly, a mix motor assembly, a food preparation chamber, a water heater assembly and a steamer assembly. The water heater and steamer assemblies are preferably on modular trays that slide into the internal frame. The water heater preferably also serves as a hot water reservoir and, to avoid overheating, has its heating coil located near its bottom. To resist scale deposits, polytetrafluoroethylene (PTFE) tubing is preferably used to transport steam from the steamer to the food preparation chamber. To expedite manufacture, a spring-biased idler assembly with a drive belt for the cupholder elevator assembly preferably snaps into a lower receiving port on the internal frame. Crisscrossing infrared light beams are preferably placed at the entrance of the food preparation chamber to detect whether the cup entering the chamber is the correct size and detect whether any foreign object is below the food preparation chamber.

Abstract: A shield encircles a sputtering target that faces a substrate support in a substrate processing chamber. The shield comprises an outer band having a diameter sized to encircle the sputtering target, the outer band having upper and bottom ends, and the upper end having a tapered surface extending radially outwardly and adjacent to the sputtering target. A base plate extends radially inward from the bottom end of the outer band. An inner band joined to the base plate at least partially surrounds a peripheral edge of a substrate support. The shield can also have a heat exchanger comprising a conduit with an inlet and outlet to flow heat exchange fluid therethrough.

Abstract: A holding assembly for retaining a deposition ring about a periphery of a substrate support in a substrate processing chamber, the deposition ring comprising a peripheral recessed pocket with a holding post. The holding assembly comprises a restraint beam capable of being attached to the substrate support, the restraint beam comprising two ends, and an anti-lift bracket. The anti-lift bracket comprises a block comprising a through-channel to receive an end of a restraint beam, and a retaining hoop attached to the block, the retaining hoop sized to slide over and encircle the holding post in the peripheral recessed pocket of the deposition ring.

Abstract: An easily assembled blender with an internal frame holding a cupholder elevator assembly, a mix motor assembly, a food preparation chamber, a water heater assembly and a steamer assembly. The water heater and steamer assemblies are preferably on modular trays that slide into the internal frame. The water heater preferably also serves as a hot water reservoir and, to avoid overheating, has its heating coil located near its bottom. To resist scale deposits, polytetrafluoroethylene (PTFE) tubing is preferably used to transport steam from the steamer to the food preparation chamber. To expedite manufacture, a spring-biased idler assembly with a drive belt for the cupholder elevator assembly preferably snaps into a lower receiving port on the internal frame. Crisscrossing infrared light beams are preferably placed at the entrance of the food preparation chamber to detect whether the cup entering the chamber is the correct size and detect whether any foreign object is below the food preparation chamber.

Abstract: A holding assembly for retaining a deposition ring about a periphery of a substrate support in a substrate processing chamber, the deposition ring comprising a peripheral recessed pocket with a holding post. The holding assembly comprises a restraint beam capable of being attached to the substrate support, the restraint beam comprising two ends, and an anti-lift bracket. The anti-lift bracket comprises a block comprising a through-channel to receive an end of a restraint beam, and a retaining hoop attached to the block, the retaining hoop sized to slide over and encircle the holding post in the peripheral recessed pocket of the deposition ring.

Abstract: A process kit comprises a ring assembly that is placed about a substrate support in a substrate processing chamber to reduce deposition of process deposits on the chamber components and on an overhang edge of the substrate. The process kit includes a deposition ring, cover ring, and anti-lift bracket, and can also include a unitary shield. A target is also described.

Abstract: A process kit for a sputtering chamber comprises a deposition ring, cover ring, and a shield assembly, for placement about a substrate support in a sputtering chamber. The deposition ring comprising an annular band with an inner lip extending transversely, a raised ridge substantially parallel to the substrate support, an inner open channel, and a ledge radially outward of the raised ridge. A cover ring at least partially covers the deposition ring, the cover ring comprising an annular plate comprising a footing which rests on a surface about the substrate support, and downwardly extending first and second cylindrical walls.

Abstract: A sputtering chamber has a sputtering target comprising a backing plate and a sputtering plate. The backing plate has a groove. The sputtering plate comprises a cylindrical mesa having a plane, and an annular inclined rim surrounding the cylindrical mesa. In one version, the backing plate comprises a material having a high thermal conductivity and a low electrical resistivity. In another version, the backing plate comprises a backside surface with a single groove or a plurality of grooves.

Abstract: A process kit comprises an upper shield to encircle a sputtering target in a substrate processing chamber, to reduce deposition of process deposits on the chamber components and the overhanging edge of the substrate. The shield described is of unitary construction with a top ring, support ledge and cylindrical band having a plurality of steps.

Abstract: A process kit for a sputtering chamber comprises a deposition ring, cover ring, and a shield assembly, for placement about a substrate support in a sputtering chamber. The deposition ring comprising an annular band with an inner lip extending transversely, a raised ridge substantially parallel to the substrate support, an inner open channel, and a ledge radially outward of the raised ridge. A cover ring at least partially covers the deposition ring, the cover ring comprising an annular plate comprising a footing which rests on a surface about the substrate support, and downwardly extending first and second cylindrical walls.

Abstract: A sputtering chamber has a sputtering target comprising a backing plate and a sputtering plate. The backing plate has a groove. The sputtering plate comprises a cylindrical mesa having a plane, and an annular inclined rim surrounding the cylindrical mesa. In one version, the backing plate comprises a material having a high thermal conductivity and a low electrical resistivity. In another version, the backing plate comprises a backside surface with a single groove or a plurality of grooves.

Abstract: A sputtering target for a sputtering chamber comprises a backing plate and titanium sputtering plate mounted on the backing plate. The sputtering plate comprises a central cylindrical mesa having a plane, and a peripheral inclined annular rim surrounding the cylindrical mesa, the annular rim being inclined relative to the plane of the cylindrical mesa by an angle of at least about 8°.

Abstract: A process kit comprises a ring assembly that is placed about a substrate support in a substrate processing chamber to reduce deposition of process deposits on the chamber components and on an overhang edge of the substrate. The process kit includes a deposition ring, cover ring, and anti-lift bracket, and can also include a unitary shield. A target is also described.