Patents by Inventor Kathrin Van Teeffelen

Kathrin Van Teeffelen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8637945
    Abstract: A component having a robust, but acoustically sensitive microphone structure is provided and a simple and cost-effective method for its production. This microphone structure includes an acoustically active diaphragm, which functions as deflectable electrode of a microphone capacitor, a stationary, acoustically permeable counter element, which functions as counter electrode of the microphone capacitor, and an arrangement for detecting and analyzing the capacitance changes of the microphone capacitor. The diaphragm is realized in a diaphragm layer above the semiconductor substrate of the component and covers a sound opening in the substrate rear. The counter element is developed in a further layer above the diaphragm. This further layer generally extends across the entire component surface and compensates level differences, so that the entire component surface is largely planar according to this additional layer.
    Type: Grant
    Filed: April 7, 2010
    Date of Patent: January 28, 2014
    Assignee: Robert Bosch GmbH
    Inventors: Frank Reichenbach, Thomas Buck, Jochen Zoellin, Franz Laermer, Ulrike Scholz, Kathrin van Teeffelen, Christina Leinenbach
  • Patent number: 8466042
    Abstract: A method for manufacturing separated micromechanical components situated on a silicon substrate includes the following steps of a) providing separation trenches on the substrate via an anisotropic plasma deep etching method, b) irradiating the area of the silicon substrate which forms the base of the separation trenches using laser light, the silicon substrate being converted from a crystalline state into an at least partially amorphous state by the irradiation in this area, and c) inducing mechanical stresses in the substrate. In one specific embodiment, cavities are etched simultaneously with the etching of the separation trenches. The etching depths can be controlled via the RIE lag effect.
    Type: Grant
    Filed: April 3, 2009
    Date of Patent: June 18, 2013
    Assignee: Robert Bosch GmbH
    Inventors: Franz Laermer, Kathrin Van Teeffelen, Christina Leinenbach
  • Patent number: 8353213
    Abstract: A sensor element is provided for sensing accelerations in three spatial directions, which furnishes reliable measurement results and moreover can be implemented economically and with a small configuration. The sensor element encompasses at least one seismic mass deflectable in three spatial directions, a diaphragm structure that functions as a suspension mount for the seismic mass, and at least one stationary counterelectrode for capacitive sensing of the deflections of the diaphragm structure. According to the exemplary embodiments and/or exemplary methods of the present invention, the diaphragm structure encompasses at least four electrode regions, electrically separated from one another, that are mechanically coupled via the seismic mass.
    Type: Grant
    Filed: September 19, 2008
    Date of Patent: January 15, 2013
    Assignee: Robert Bosch GmbH
    Inventors: Jochen Zoellin, Axel Franke, Kathrin Van Teeffelen, Christina Leinenbach
  • Publication number: 20120091544
    Abstract: A component having a robust, but acoustically sensitive microphone structure is provided and a simple and cost-effective method for its production. This microphone structure includes an acoustically active diaphragm, which functions as deflectable electrode of a microphone capacitor, a stationary, acoustically permeable counter element, which functions as counter electrode of the microphone capacitor, and an arrangement for detecting and analyzing the capacitance changes of the microphone capacitor. The diaphragm is realized in a diaphragm layer above the semiconductor substrate of the component and covers a sound opening in the substrate rear. The counter element is developed in a further layer above the diaphragm. This further layer generally extends across the entire component surface and compensates level differences, so that the entire component surface is largely planar according to this additional layer.
    Type: Application
    Filed: April 7, 2010
    Publication date: April 19, 2012
    Inventors: Frank Reichenbach, Thomas Buck, Jochen Zoellin, Franz Laermer, Ulrike Scholz, Kathrin van Teeffelen, Christina Leinenbach
  • Publication number: 20110306930
    Abstract: A hypodermic needle, particularly for injecting a pharmaceutical substance into a human or animal body is disclosed. The needle provides a simple way of improving long-term use in a human or animal body. The hypodermic needle includes a tubular hollow body having a needle tip for introducing the hypodermic needle into the human or animal body, wherein the hollow body has a rigidity which is reducible by the influence of heat and/or moisture.
    Type: Application
    Filed: June 9, 2011
    Publication date: December 15, 2011
    Applicant: Robert Bosch GmbH
    Inventors: Gilbert Moersch, Franz Laermer, Kathrin van Teeffelen, Christian Dorrer
  • Publication number: 20110163398
    Abstract: A method for manufacturing separated micromechanical components situated on a silicon substrate includes the following steps of a) providing separation trenches on the substrate via an anisotropic plasma deep etching method, b) irradiating the area of the silicon substrate which forms the base of the separation trenches using laser light, the silicon substrate being converted from a crystalline state into an at least partially amorphous state by the irradiation in this area, and c) inducing mechanical stresses in the substrate. In one specific embodiment, cavities are etched simultaneously with the etching of the separation trenches. The etching depths can be controlled via the RIE lag effect.
    Type: Application
    Filed: April 3, 2009
    Publication date: July 7, 2011
    Inventors: Franz Laermer, Kathrin Van Teeffelen, Christina Leinenbach