Patents by Inventor Kathryn Mullins

Kathryn Mullins has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9751986
    Abstract: Disclosed is a low toxicity aprotic alkyl amide solvent system used for the manufacture and application of polyamideimide resins, and an efficient method for manufacturing the polyamideimide resins in a solvent system in a single reaction with distillation which allows recycling of intermediate streams. The solvent system can be used for either the manufacture or the dissolution of polyamideimide resins.
    Type: Grant
    Filed: December 17, 2012
    Date of Patent: September 5, 2017
    Assignee: FUJIFILM HUNT CHEMICALS US, INC.
    Inventors: John Sidenstick, David Noga, Kathryn Mullins, Mace Phillips
  • Publication number: 20160002408
    Abstract: Disclosed is a low toxicity aprotic alkyl amide solvent system used for the manufacture and application of polyamideimide resins, and an efficient method for manufacturing the polyamideimide resins in a solvent system in a single reaction with distillation which allows recycling of intermediate streams. The solvent system can be used for either the manufacture or the dissolution of polyamideimide resins.
    Type: Application
    Filed: December 17, 2012
    Publication date: January 7, 2016
    Inventors: John Sidenstick, David Noga, Kathryn Mullins, Mace Phillips
  • Patent number: 9029441
    Abstract: Disclosed is a low toxicity aprotic alkyl amide solvent system used for the dissolution and application of polyamideimide and polyamide amic acid polymer resins. The solvent system can be used for the dissolution of polyamideimide and polyamide amic acid resins as an efficient method for incorporating these resins into functional coating compositions with the use of the solvent system.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: May 12, 2015
    Assignee: Fujifilm Hunt Chemicals US, Inc.
    Inventors: John Sidenstick, Russell Scott Clouston, Kathryn Mullins
  • Publication number: 20130217812
    Abstract: Disclosed is a low toxicity aprotic alkyl amide solvent system used for the dissolution and application of polyamideimide and polyamide amic acid polymer resins. The solvent system can be used for the dissolution of polyamideimide and polyamide amic acid resins as an efficient method for incorporating these resins into functional coating compositions with the use of the solvent system.
    Type: Application
    Filed: March 15, 2013
    Publication date: August 22, 2013
    Inventors: John Sidenstick, Russell Scott Clouston, Kathryn Mullins
  • Publication number: 20070020411
    Abstract: Examination of the side edges of available polyimide show that they are cut or formed on the angle that forms tapered extensions. This invention minimizes such tapered extensions. In the embodiment the side edges are made to be generally perpendicular to the top and bottom surfaces. The perpendicular sides eliminate thin extensions from which cracks can originate.
    Type: Application
    Filed: July 18, 2005
    Publication date: January 25, 2007
    Inventors: Kathryn Mullins, Peter Pickett
  • Publication number: 20060118540
    Abstract: A semiconductive member has a polymer body filled with carbon black which is surface modified with azo linked organic molecules having an acid functional group. Control of conductivity is greatly improved and the strength of the member is improved by the reduced amount of filler required.
    Type: Application
    Filed: December 7, 2004
    Publication date: June 8, 2006
    Inventors: Bradley Beach, Donald Elbert, Matthew Houston, Joseph Johnson, Kathryn Mullins, Peter Pickett, John Ringo, Ronald Roe, Jing Sun, Kevin Trembath