Patents by Inventor Katie Pentas

Katie Pentas has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma Enhanced Deposited, Fully Oxidized PSG Film
    Publication number: 20070187803
    Abstract: A method of forming a plasma enhanced deposited oxide film on a substrate includes introducing into a chamber containing the substrate silane gas and a dopant gas such as phosphine. The chamber is pressurized and energy is applied to create a plasma. The energy may be a dual frequency energy. The gas rates and pressure are selected to produce a plasma enhanced deposited oxide film on a substrate having a Si—O—Si bond peak absorbance in the IR spectrum of at least 1092 cm?1.
    Type: Application
    Filed: April 25, 2007
    Publication date: August 16, 2007
    Applicant: INTERSIL AMERICAS INC.
    Inventors: Katie Pentas, Mark Bordelon, Jack Linn
  • Plasma enhanced deposited, fully oxidized PSG film
    Publication number: 20060001127
    Abstract: A method of forming a plasma enhanced deposited oxide film on a substrate includes introducing into a chamber containing the substrate silane gas and a dopant gas such as phosphine. The chamber is pressurized and energy is applied to create a plasma. The energy may be a dual frequency energy. The gas rates and pressure are selected to porduce a plasma enhanced deposited oxide film on a substrate having a Si—O—Si bond peak absorbance in the IR spectrum of at least 1092 cm?1.
    Type: Application
    Filed: September 30, 2004
    Publication date: January 5, 2006
    Inventors: Katie Pentas, Mark Bordelon, Jack Linn