Patents by Inventor Katrin Pietsch

Katrin Pietsch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for determining positions of structures on a substrate
    Patent number: 7948635
    Abstract: A system for determining positions of structures on a substrate is disclosed. The system includes a plurality of stations enclosed by a housing. At least one of the stations inside the housing is designed to be movable. The housing is provided with a filter fan unit generating an air flow in the housing. Air-directing elements are provided in the housing so that an invariable flow may be achieved irrespective of the at least one movable station.
    Type: Grant
    Filed: October 27, 2008
    Date of Patent: May 24, 2011
    Assignee: Vistec Semiconductor Systems GmbH
    Inventors: Katrin Pietsch, Klaus-Dieter Adam, Tillmann Ehrenberg
  • Device for measuring the position of at least one structure on a substrate
    Patent number: 7872763
    Abstract: A device for measuring the position of at least one structure on a substrate is disclosed. The substrate to be measured is positioned in a mirror body. A flat insert is provided in the mirror body and is formed such that the substrate and the insert together always have the same optical thickness, irrespective of the mechanical thickness of the substrate.
    Type: Grant
    Filed: September 30, 2008
    Date of Patent: January 18, 2011
    Assignee: Vistec Semiconductor Systems GmbH
    Inventors: Katrin Pietsch, Klaus-Dieter Adam, Tillmann Ehrenberg
  • Device for measuring the position of at least one structure on a substrate
    Publication number: 20090128828
    Abstract: A device for measuring the position of at least one structure on a substrate is disclosed. The substrate to be measured is positioned in a mirror body. A flat insert is provided in the mirror body and is formed such that the substrate and the insert together always have the same optical thickness, irrespective of the mechanical thickness of the substrate.
    Type: Application
    Filed: September 30, 2008
    Publication date: May 21, 2009
    Applicant: Vistec Semiconductor Systems GmbH
    Inventors: Katrin Pietsch, Klaus-Dieter Adam, Tillmann Ehrenberg
  • Apparatus and method for supporting a substrate at a position with high precision
    Publication number: 20090126525
    Abstract: An apparatus and a method are disclosed for supporting a substrate at a position with high precision. The substrate is placed on a stage which is configured to be traversable in a plane in two spatial directions oriented perpendicular to each other. The substrate is supported on three point-like support elements. At least one of the support elements is configured to be moveable in the plane.
    Type: Application
    Filed: September 30, 2008
    Publication date: May 21, 2009
    Applicant: Vistec Semiconductor Systems GmbH
    Inventors: Katrin Pietsch, Klaus-Dieter Adam, Tillmann Ehrenberg
  • Method for determining positions of structures on a substrate
    Publication number: 20090109443
    Abstract: A system for determining positions of structures on a substrate is disclosed. The system includes a plurality of stations enclosed by a housing. At least one of the stations inside the housing is designed to be movable. The housing is provided with a filter fan unit generating an air flow in the housing. Air-directing elements are provided in the housing so that an invariable flow may be achieved irrespective of the at least one movable station.
    Type: Application
    Filed: October 27, 2008
    Publication date: April 30, 2009
    Applicant: VISTEC Semiconductor Systems GmbH
    Inventors: Katrin Pietsch, Klaus-Dieter Adam, Tillmann Ehrenberg