Patents by Inventor Katsuaki Ishimaru

Katsuaki Ishimaru has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6606145
    Abstract: An exposure apparatus exposes, for example, a substrate for production of a working reticle through a master reticle on which a pattern is formed. The apparatus is provided with three support members for supporting the substrate substantially horizontally at three locations outside illuminated areas of the substrate, e.g., a pattern area, alignment mark areas, and information mark areas.
    Type: Grant
    Filed: February 27, 2001
    Date of Patent: August 12, 2003
    Assignee: Nikon Corporation
    Inventors: Nobuyuki Irie, Katsuaki Ishimaru
  • Publication number: 20010019401
    Abstract: An exposure apparatus for exposing for example a substrate for production of a working reticle through a master reticle on which a pattern is formed, provided with three support members for supporting the substrate substantially horizontally at three locations outside illuminated areas of the substrate (pattern area, alignment mark areas, and information mark areas).
    Type: Application
    Filed: February 27, 2001
    Publication date: September 6, 2001
    Inventors: Nobuyuki Irie, Katsuaki Ishimaru
  • Patent number: 6137562
    Abstract: When a relatively thin substrate, such as a silicon wafer, is used in an exposure apparatus, a substrate adjuster is inserted between the thin substrate and the substrate holder in order to raise the position of the top surface of the thin wafer. The substrate adjuster is selected so that the sum of the thicknesses of the substrate adjuster and the thin substrate lies within the range of thicknesses of ordinarily used substrates. If a relatively thick substrate, for example, a ceramic substrate, is used, the substrate is directly held on the substrate holder without using the substrate adjuster. The substrate holder holds the substrate adjuster through vacuum adsorption, which also helps the substrate be adsorbed onto the substrate adjuster. In this manner, different substrates having different thicknesses can be used in the exposure apparatus without exchanging the substrate holder.
    Type: Grant
    Filed: April 14, 1999
    Date of Patent: October 24, 2000
    Assignee: Nikon Corporation
    Inventors: Takashi Masuyuki, Katsuaki Ishimaru
  • Patent number: 5263008
    Abstract: A magneto-optical disk device, in which data are written and read in and from a magneto-optical disk housed in a magneto-optical disk cartridge having a head window of a predetermined shape, comprises: first and second magneto-optical heads disposed so as to locate in the head window for accessing the magneto-optical disk; a center rail disposed substantially at the center of the window head along a diameter of the magneto-optical disk; a first side rail and a second side rail which are disposed parallelly with each other on both sides of the center rail; a first carriage slidably disposed between the center rail and the first side rail, and having at least a part of the first magneto-optical head mounted thereon; first driving means for driving the first carriage along the center rail; a second carriage slidably disposed between the center rail and the second side rail, and having at least a part of the second magneto-optical head mounted thereon; and second driving means for driving the second carriage alon
    Type: Grant
    Filed: August 30, 1991
    Date of Patent: November 16, 1993
    Assignee: Tosoh Corporation
    Inventors: Kazuyuki Fujio, Akira Kawai, Shuzo Mizutani, Katsuaki Ishimaru