Patents by Inventor Katsuaki NISHIKORI

Katsuaki NISHIKORI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190285983
    Abstract: A radiation-sensitive resin composition includes a resin including a structural unit having an acid-dissociable group, an onium salt compound represented by formula (1), and a solvent. R1 is a hydrogen atom or a monovalent group provided that the monovalent group is not a fluoro group or a monovalent organic group containing a fluorine atom. X1 and X2 are each independently a single bond, —O—, —S— or —NR?— wherein R? is a hydrogen atom or a monovalent hydrocarbon group. In a case where X1 is —NR?—, R2 is a monovalent organic group or a hydrogen atom. In a case where X2 is —NR?—, R3 is a monovalent organic group or a hydrogen atom. In a case where neither X1 nor X2 is —NR?—, R2 and R3 are each independently a monovalent organic group.
    Type: Application
    Filed: May 29, 2019
    Publication date: September 19, 2019
    Applicant: JSR CORPORATION
    Inventor: Katsuaki NISHIKORI
  • Publication number: 20180329298
    Abstract: A radiation-sensitive resin composition includes a first compound represented by formula (1), a first polymer comprising an acid-labile group, and a radiation-sensitive acid generator other than the first compound. The radiation-sensitive acid generator includes an onium salt compound. In the formula (1), n is 2 or 3; m is 1 or 2; Y+ represents a monovalent radiation-sensitive onium cation; and L represents a single bond or an organic group having a valency of n. L includes linking moieties each linking two of the carboxylate groups in formula (1). Number of atom(s) included in a linking moiety having a minimum number of bonds among the linking moieties is 0 to 10. In a case where L represents a single bond, n is 2, and in a case where n is 2, m is 1.
    Type: Application
    Filed: July 24, 2018
    Publication date: November 15, 2018
    Applicant: JSR CORPORATION
    Inventors: Katsuaki NISHIKORI, Hayato Namai
  • Publication number: 20180319740
    Abstract: A radiation-sensitive resin composition includes a first polymer including a first structural unit that includes a first acid-labile group; a radiation-sensitive acid generator; and a compound represented by formula (1). n is 1 or 2. R1 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms in a case in which n is 1. R1 represents a divalent organic group having 1 to 20 carbon atoms in a case in which n is 2. R2 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. E represents a group represented by formula (i). R2 and E may taken together represent a ring structure having 3 to 20 ring atoms together with the nitrogen atom. X represents a divalent organic group having 1 to 20 carbon atoms. R3 represents a second acid-labile group.
    Type: Application
    Filed: July 11, 2018
    Publication date: November 8, 2018
    Applicant: JSR CORPORATION
    Inventors: Natsuko KINOSHITA, Katsuaki NISHIKORI, Kouta FURUICHI